Characteristics of Rotationally Stabilized Long Plasma Arcs in a Chamber
作者:
Hsu‐Chieh Yeh,
Wen‐Jei Yang,
期刊:
Journal of Applied Physics
(AIP Available online 1969)
卷期:
Volume 40,
issue 9
页码: 3687-3693
ISSN:0021-8979
年代: 1969
DOI:10.1063/1.1658258
出版商: AIP
数据来源: AIP
摘要:
An analytical method is developed to determine the gas temperature distribution and the electric field strength‐arc length characteristics of a rotationally stabilized long plasma arc in a cylindrical chamber. The application of the method was demonstrated by numerical computations which were carried out for a monatomic hydrogen arc stabilized in a very large chamber. The relationships among the electric field strength, current, arc length, and arc‐axis temperature are disclosed.
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