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Characteristics of Rotationally Stabilized Long Plasma Arcs in a Chamber

 

作者: Hsu‐Chieh Yeh,   Wen‐Jei Yang,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 9  

页码: 3687-3693

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1658258

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An analytical method is developed to determine the gas temperature distribution and the electric field strength‐arc length characteristics of a rotationally stabilized long plasma arc in a cylindrical chamber. The application of the method was demonstrated by numerical computations which were carried out for a monatomic hydrogen arc stabilized in a very large chamber. The relationships among the electric field strength, current, arc length, and arc‐axis temperature are disclosed.

 

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