ISSN:0947-076X    

DOI:10.1002/vipr.19930050302

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

ISSN:0947-076X    

DOI:10.1002/vipr.19930050303

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

ISSN:0947-076X    

DOI:10.1002/vipr.19930050304

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

摘要:

AbstractOne of the most growing and spreading application of thin film techniques are the hard coatings. The Institute of microstructure‐technology and optoelectronics (IMO) in Wetzlar as technology service institution is active also in the development of coating processes. Investigations of the surface coating of polymers by SiO2‐like films as well as the development of problem‐oriented TiN coatings have been performed. Recently, the diamond coating from the gas phase has attracted high interest. The article describes the status of diamand coating know‐how in

ISSN:0947-076X    

DOI:10.1002/vipr.19930050305

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

摘要:

AbstractThe use of vacuum or vacuum pumps can be found in almost every branch of manufacturing.This is also true for the automobile industry, where the employment of vacuum as a positive solution for the problems associated with the correct and precise filling of the various fluid systems, without having any adverse effect on the environment or operating personnel.In addition to this, the use of vacuum as a technical process in the fluid filling procedure has had a marked improvement in the vehicles safety.

ISSN:0947-076X    

DOI:10.1002/vipr.19930050306

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

摘要:

AbstractThe modern diaphragm pump has become a proven device for generating coarse and fine vacuum. The article describes disigns and functions of various construction types as well as state‐of‐the art development and manufacturing. Physical and technical demands have resulted in diaphragm pumps with typical ultimate pressures of 70 to 0,1 mbar and a pumping speed of several m3/h. As an almost chemically resistant pump, the diaphragm pump is used in the chemical laboratory. Combining a diaphragm pump with an oil‐free, not against atmosphere compressing pump, a contamination‐free pump assembly for (ultra‐)high vacuum is obtained which is well suited for coating technology, vacuum metallurgy and semiconductor industry due to its oilfree

ISSN:0947-076X    

DOI:10.1002/vipr.19930050307

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

摘要:

AbstractThe hot filament supported high current discharge can be used with various process steps. During the heating cycle, intense electron bombardment provides a soft and efficient energy source. In triode etching the high plasma density improves the throwing power and reduces the arcing problem on oxide inclusions from preceding grinding steps.For the coating cycle the high current density can be fitted into different deposition processes. Activated reactive ion plating is done with a high voltage electron beam gun. But one can also combine the high current density plasma with a magnetron to produce a high plasma density on the substrate and solve the problems of reactivity of this vapor source. Alternatively the high current density plasma can also be used to drive a CVD‐reaction. Several of these processes can be combined to hybrid deposition technologies. A few examples of coating realisations and performance in the different processes will be give

ISSN:0947-076X    

DOI:10.1002/vipr.19930050308

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

ISSN:0947-076X    

DOI:10.1002/vipr.19930050309

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

摘要:

AbstractThe possibilities for surface and depth profile analysis of dielectric samples with partially modified electron and mass spectrometric methods are described. The respective techniques have been employed for the quantitative characterization of electron and ion beam induced stoichiometry effects at glass surfaces.

ISSN:0947-076X    

DOI:10.1002/vipr.19930050310

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY

ISSN:0947-076X    

DOI:10.1002/vipr.19930050311

出版商:WILEY‐VCH Verlag    

年代:1993

数据来源: WILEY