Journal of Modern Optics


ISSN: 0950-0340        年代:1999
当前卷期:Volume 46  issue 8     [ 查看所有卷期 ]

年代:1999
 
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1. Direct sampling of density matrix in displaced Fock-state basis from quadrature distributions and reconstruction of quasiprobability distributions
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1167-1175

Th Richter,  

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2. Specific gaussian beams propagating inside logarithmically saturable nonlinear media
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1177-1183

Yonglin Tang,   Jianguo Chen,   Dayi Li,   Jun Kang,   Yan Li,  

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3. Validity of the cylindrical localized approximation for arbitrary shaped beams in generalized Lorenz-Mie theory for circular cylinders
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1185-1200

G. Gouesbet,  

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4. A wide angle beam propagation method for the analysis of tilted nematic liquid crystal structures
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1201-1212

EmmanouilE. Kriezis,   SteveJ. Elston,  

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5. Statistics of the hottest spot of speckle patterns generated by smoothing techniques
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1213-1232

J. Garnier,   C. Gouédard,   A. Migus,  

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6. Fluorescence quenching and spectral narrowing from a two-level atom driven by a weak, narrowband, light field
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1233-1250

W.S. Smyth,   S. Swain,  

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7. Temporal evolution of amplitude restoration and thresholding in an all-optical regenerative memory
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1251-1254

A.J. Poustie,   K.J. Blow,   A.E. Kelly,   R.J. Manning,  

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8. Raman and Brillouin couplers with losses and phase mismatch
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1255-1276

JaromÍR Fiurášek,   Jan Peřina,  

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9. Quantum correlation coefficient for position and momentum
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1277-1294

RichardA. Campos,  

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10. Multilevel diffractive elements in SiO2by electron beam lithography and proportional etching with analogue negative resist
  Journal of Modern Optics,   Volume  46,   Issue  8,   1999,   Page  1295-1307

Pasi Laakkonen,   Jari Lautanen,   Ville Kettunen,   Jari Turunen,   Matthias Schirmer,  

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