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1. |
Nonlinear Effects of a Gaussian Laser Beam on Megagauss Magnetic Field Generation in Laser Produced Plasma |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 201-206
M. V. H. V. Prabhakar,
M. P. Srivastava,
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摘要:
AbstractThe generation of megagauss magnetic field due to the time dependent part of the ponderomotive force of a self‐focused Gaussian laser beam indicent on a plasma has been studied. Defocusing of the laser beam becomes possible due to diffraction divergence in the case of a weakly nonlinear medium. The influence of defocusing of a laser beam on magnetic field generation has also been investigated. It is found that the magnitude of the magnetic field due to self focusing of the beam is enhanced and is comparable with the observed values, while there is a reduction in the magnitude of the magnetic field when the beam defocuses due to diffraction divergence in the presence of weak nonlinearit
ISSN:0863-1042
DOI:10.1002/ctpp.2150280302
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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2. |
Generalized Susceptibilities for a Wall‐Stabilized Electric Are Displacement |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 207-213
J. R. Ramos‐Barrado,
P. Galán‐Montenegro,
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摘要:
AbstractComplex susceptibilities for are displacement produced by an intermittent HF irradiation or by a time‐dependent transverse magnetic field, are defined. The analytical character of these susceptibilities is established from the development of its Kramers‐Kronig relations. Some experimental results for an are in a transverse magnetic field are sh
ISSN:0863-1042
DOI:10.1002/ctpp.2150280303
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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3. |
Hollow Cathode Effect with Double Axial Electron Injection |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 215-220
G. G. Bratescu,
D. Ciobotaru,
G. Dima,
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摘要:
AbstractThe paper presents a new type of HCE glow discharge obtained with double plane‐conical cathodes. The two identical cathodes are tronconical and screened with 1 mm2mailed wire net with a 3.5 mm diameter central washer each. The discharge is obtained between the two cathodes and a ring shaped anode equally distant from both. Optimum intercathodic span is 4 mm, allowing for maximum amplifications at the optimum pressure values for the two gases. Employed helium and argon are spectral pure. At the given distance and depending on voltage and gas pressure, a double axial electron self injection cathode effect is obtained between the electrodes, consisting of very large increase of current and radiation
ISSN:0863-1042
DOI:10.1002/ctpp.2150280304
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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4. |
Experience with Measuring of the Spectral Line Profile by Means of the Fabry‐Perot Interferometer |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 221-228
A. Brablec,
V. Kapicka,
F. Stastny,
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摘要:
AbstractResults of plasma diagnostics by means of the Fabry‐Perot interferometer are very sensitive to a right adjustment, a choice of both the working diaphragm and exposition time, etc. Furthermore, a choice of adequate methods applied to the calculation of plasma parameters from experimental data is very important. As it is very difficult to verify the validity of measured results in this case, a sufficient attention was not given to these problems and at present we find only few really useful information in literature, which would correspond with conterporary level of technique. In this paper there is summarized our experience obtained during many years use of the Fabry‐Perot interferometer in plasma diagnost
ISSN:0863-1042
DOI:10.1002/ctpp.2150280305
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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5. |
The HβLine Dip Shift |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 229-231
S. Djurović,
Z. Mijatović,
R. Kobilarov,
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摘要:
AbstractThe Hβline dip shift was measured and compared with experimental and theoretical results of the other authors. Our results are in a good agreement with the experimental results but in a disagreement or even discrepancy with GRIEM'S theory. Plasmas were produced in the wall stsbilized arc
ISSN:0863-1042
DOI:10.1002/ctpp.2150280306
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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6. |
Plasma Properties and Neutral Gas Densities in Hg‐Rare Gas Discharges |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 233-247
J. Kreher,
W. Stern,
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摘要:
AbstractThe density of the neutral gases in Hg‐rare gas discharges and their spatial distribution is controlled by the discharge parameters as well as by the externally adjustable partial pressures. Essential quantities in this context are the gas temperature produced by elastic collisions, the ion transport by the discharge current, the processes governing the wall temperature, and ambipolar diffusion. Despite equal partial pressures different densities may occur, which, in turn, will influence the parameters of the discharge. This has effects on the assessment of the methods of Hgvapour pressure adjustment and on the evaluation of the measured values. These effects are demonstrated, especially by field strength measurements, for a wide parameter rang
ISSN:0863-1042
DOI:10.1002/ctpp.2150280307
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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7. |
Ignition Processes in ac Plasma Displays |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 249-263
J. Röpcke,
R.‐J. Zahn,
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摘要:
AbstractThe ignition behaviour of discharge cells in ac plasma displays, their ignition statistics and interaction processes occurring between several ignited cells are described and interpreted with a view to basic problems of gas discharge and solid state physics. Ac plasma displays of three different sizes were investigated: PAF 58, 90 and PAF 128.
ISSN:0863-1042
DOI:10.1002/ctpp.2150280308
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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8. |
Influence of the Basic Process Parameters on the Ion/Atom Arrival Rate Ratio during Magnetron Sputter Deposition of Thin Carbon Films |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 265-273
I. Petrov,
V. Orlinov,
I. Ivanov,
J. Kourtev,
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摘要:
AbstractThe behaviour of the ratio of the argon ion flux and the sputtered atom flux to the substrate with the variation of the basic process parameters was studied in a planar magnetron sputtering system. Finding ways to control this ratio is important with respect to carrying out ion‐assisted thin film growth by magnetron sputtering under well‐defined conditions. Combined deposition rate measurements and plasma probe measurements were carried out in order to determine the ion/atom arrival rate ratio. In addition calculations of the neutral atom flux were performed on the basis of a simple model and the results compared with the measured values. A considerable change in the values of the ion/atom arrival rate ratio with the variation of the argon pressure and the discharge power was found under operating conditions, at which the back diffusion of the sputtered material is pronounced. The distribution of the ion flux over the substrate surface was found to become more homogeneous with the increase of the working pressure or the target‐to‐substrate d
ISSN:0863-1042
DOI:10.1002/ctpp.2150280309
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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9. |
Plasma Processes in Activated Thin Film Deposition |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page 275-292
A. Lunk,
M. Schmidt,
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摘要:
AbstractThis paper deals with plasma aspects in physical and chemical vapour deposition processes. A systematic representation of deposition methods is given and possibilities of plasma diagnostic are summerized. Characteristic parameters of electron kinetics (mean free paths, collision frequencies, energy distribution functions) and rate equations for calculation of particle densities are discussed for a plasma in plasma activated physical vapour deposition device. Theoretical results are compared with measurements (Te,Ne,Ez) in the plasma of a TiNx‐deposition device with hollow cathode arc evaporator. Mechanism of plasma polymerisation is discussed. Results of experimental investigations of the plasma in an Ar‐hexamethyldisiloxane D.C. low pressure glow discharge are presented and compared with results of modelling of this plasma taking into account direct‐, stepwise‐ and Penning‐ionization. The necessivity of knowledge of reactive cross sections for understanding of plasma assisted thin film formation processes is ac
ISSN:0863-1042
DOI:10.1002/ctpp.2150280310
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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10. |
Masthead |
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Contributions to Plasma Physics,
Volume 28,
Issue 3,
1988,
Page -
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ISSN:0863-1042
DOI:10.1002/ctpp.2150280301
出版商:WILEY‐VCH Verlag
年代:1988
数据来源: WILEY
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