摘要:

AbstractInhomogene Magnetfelder bilden die Grundlage des Teilcheneinschlusses in Speicherringen und Fusionsanlagen. Eine Diskussion der Teilchenbewegung in diesen Feldern fördert neben typenspezifischen Eigenheiten manche Gemeinsamkeit, wie den störenden Einfluß der Arnold‐Diffusion zu

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320602

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY

摘要:

AbstractWe report a period‐doubling route to chaos in a modulated unmagnetized low pressure thermionic argon discharge. The bifurcation cascade has many similarities to a noisy logistic map. The non‐modulated discharge shows strong hysteresis in the current voltage characteristic. Two distinct discharge states are identified by spatial plasma potential measurements and compared with the classification for higher pressu

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320603

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY

摘要:

AbstractThe pressure dependence of the mean electron energy 〈ϵ〉 was investigated in discharges in Ar experimentally by sampling the plasma potential with an ion mass spectrometer, and theoretically by solving the electron Boltzmann equation for the bulk plasma. Both results show a decrease in 〈ϵ〉 with increasing pressure in the regime between 0.2 and 40 Pa although this behaviour is much more pronounced in the experimental results. The results are compared to those of single‐probe measurements of other authors. In one case they are in good agreement [10], while there is a discrepancy in another case [11]. Possible reasons for this behaviour are discussed. The advantage of the mass spectrometric sampling method is, that it is absolutely non‐invasive, so that also in sensitive processes no contaminati

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320604

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY

摘要:

AbstractThis paper deals with the influence of process parameters, especially of argon pressure, power, and target‐substrate spacing on impurity content and properties of Cr‐Si thin films deposited by dc magnetron sputtering in a non‐heated high vacuum apparatus. The results confirm the well‐known fact that in such a unit by means of a magnetron pure films can be produced without any difficulties. However, this has proved to be possible only in the case of low argon pressure being preferentially employed in magnetron sputtering. Boosting the argon pressure yields drastic film contaminations by oxygen and hydrogen, which are caused by a reinforced release of adsorbats from the apparatus walls under these operating conditions. A high argon pressure effects simultaneously a change in the film microstructure resulting together with the contaminants in modified electrical pro

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320605

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY

摘要:

AbstractThe present study focusses on the conspicuous properties of the temporal and spatial K‐dV solitary waves obtainable by the use of different stretching co‐ordinates. Singularities are observed in solitary waves which are due to the presence of negative ions and multiple electron‐temperatures in the plasmas. It is discussed how those situations are tackled by the derivation of modified K‐dV equations to describe the evolution of propagating solitons. Moreover, the soliton profiles admit the interactions of negative ions and multiple electron‐temperatures, which are playing the role of creating the steepness in soliton profiles. Simultaneously more solitary waves follow therein resembling the evolution of experimentally observed soliton characteristics and finally indicating the possible interest to put forth for experimental plasma inves

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320606

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320608

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY

ISSN:0863-1042    

DOI:10.1002/ctpp.2150320601

出版商:WILEY‐VCH Verlag    

年代:1992

数据来源: WILEY