摘要:

An existing Princeton Applied Research Model 131 data acquisition system was modified by adding an inexpensive IMSAI 8048 microcomputer to increase the data transmission speed by a factor of fifty. The system was then interfaced to a PDP 11 minicomputer. The system, microcomputer, minicomputer, interfaces, and communication programs are described. The network enables on‐line data acquisition and analysis, facilitating the work in experiments in which large amounts of accurate data are needed.

ISSN:0034-6748    

DOI:10.1063/1.1136103

出版商:AIP    

年代:1980

数据来源: AIP

摘要:

An improved version of the ball and ball seat method using the plastic Kapton is presented for sealing electrical leads in hydrostatic 1 GPa vessels. Tools and method for the manufacture of such seals are presented. The seals may be exposed to nonambient temperatures ranging from 80–400 K according to the experimental needs.

ISSN:0034-6748    

DOI:10.1063/1.1136104

出版商:AIP    

年代:1980

数据来源: AIP

摘要:

A method is described for the preparation of stable and uniformly thick solid specimens with properties suitable for x‐ray absorption fine structure studies. A known amount of finely powdered solid material is dispersed in an appropriate solvent and filtered through a polycarbonate membrane filter. A solution of rubber cement is drawn through the solid, which is then covered with a second filter disc. By appropriate choice of the amount of solid to be filtered, specimens can be produced with a range of thicknesses, including those useful for examination of extended x‐ray absorption fine structure and near‐edge absorption fine structure.

ISSN:0034-6748    

DOI:10.1063/1.1136105

出版商:AIP    

年代:1980

数据来源: AIP

摘要:

Microlithography, using computer‐controlled electron‐beam exposure of radiation‐sensitive polymer films called photoresist, is a technique widely used in industry. However, the resolution of existing systems is severely limited by scattering of electrons from the substrate supporting the resist and within the resist film itself. We have developed several techniques for producing and processing free‐standing films of photoresist which eliminate the solid substrate and thus the electron scattering from it. These films are also thin enough to reduce scattering within the photoresist significantly. We present some special techniques using free‐standing photoresist films which may be utilized to improve the resolution of electron‐lithography systems by minimizing the effects of electron scattering in photoresists.

ISSN:0034-6748    

DOI:10.1063/1.1136106

出版商:AIP    

年代:1980

数据来源: AIP

ISSN:0034-6748    

DOI:10.1063/1.1136421

出版商:AIP    

年代:1980

数据来源: AIP