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31. |
Compact high‐voltage vacuum feedthrough |
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Review of Scientific Instruments,
Volume 47,
Issue 12,
1976,
Page 1555-1556
J. D. Stein,
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PDF (102KB)
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摘要:
A vacuum feedthrough has been designed at this laboratory to operate at 40 kV and 10−9Torr. It is small in size, 3.81 cm in diameter and extending 4.45 cm into the vacuum chamber. A selection of commercial connectors is available. The re‐entrant design fully shields the conductor for safety, prevention of noise pickup, and protection from environmental effects.
ISSN:0034-6748
DOI:10.1063/1.1134549
出版商:AIP
年代:1976
数据来源: AIP
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32. |
Pressure control of rf bias for sputtering |
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Review of Scientific Instruments,
Volume 47,
Issue 12,
1976,
Page 1556-1557
L. J. Kochel,
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PDF (106KB)
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摘要:
A method of simultaneously controlling vacuum pressure and substrate bias using only a pressure controller is described for an rf bias sputtering system in which the bias is developed through substrate tuning.
ISSN:0034-6748
DOI:10.1063/1.1134550
出版商:AIP
年代:1976
数据来源: AIP
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33. |
Simple, rapid slit alignment procedure |
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Review of Scientific Instruments,
Volume 47,
Issue 12,
1976,
Page 1558-1559
Moshe Deutsch,
Isaac Freund,
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PDF (125KB)
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摘要:
A simple, rapid means of accurately aligning a slit parallel to the line focus of an x‐ray tube is described.
ISSN:0034-6748
DOI:10.1063/1.1134551
出版商:AIP
年代:1976
数据来源: AIP
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