1. |
Quantum theory of radiation of the above-barrier electrons and positrons at axial channeling |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 129-134
V.A. Bazylev,
A.V. Demura,
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摘要:
Quantum theory of incoherent radiation of the above-barrier electrons and positrons in the continuum axes potential approximated by the model Coulomb potential has been developed. Analytical expression has been obtained for the spectral-angular distribution of radiation intensity.
ISSN:0033-7579
DOI:10.1080/00337578208229924
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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2. |
Thermal and electrical stability of gamma-ray induced defects in germanium |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 135-141
S.J. Pearton,
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摘要:
Data are presented on the long-term room temperature stability of γ-Ray induced defects in Ge and the response of these centres to thermal annealing. Carrier capture models involving excited states for donor and acceptor centres are also discussed.
ISSN:0033-7579
DOI:10.1080/00337578208229925
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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3. |
On the rate of reactions of point defects very close to a crystal surface |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 143-149
R.H. J. Fastenau,
A.Van Veen,
L.M. Caspers,
M.R. Ypma,
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摘要:
The rate constant of the reaction of point defects with traps located very close to a crystal surface is studied using Monte Carlo and lattice relaxation simulations. Three effects due to the crystal surface are taken into account: the semi-infinite character of the random walk, changes in defect migration energies and changes in the trapping volume.
ISSN:0033-7579
DOI:10.1080/00337578208229926
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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4. |
Fission fragment scattering measurements using solid state nuclear track detectors |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 151-158
NaeemAhmad Khan,
HameedAhmed Khan,
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摘要:
A combination of Muscovite Mica, Phosphate Glass, and CR-39 plastic track detectors has been successfully employed in studying the phenomena of forward-, and back-scattering of fission fragments from Perspex, AI, Cu, Ho, Au, Pb, Bi, and U targets of varying thicknesses. Two different geometries were used in these studies. It was found that the fraction of the scattered-out particles increases with the increasing“Z”of the target material and that only the top 600 Å or so thick layer of Bismuth is important for the scattering of Cf-252 fission fragments. Angular distribution measurements show that the scattered-out fraction decreases with the increasing angle of scattering. It has also been found that the evenness (on microscopic scale) of the target surface affects the fraction of the scattered-out fission fragments.
ISSN:0033-7579
DOI:10.1080/00337578208229927
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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5. |
Studies of radiation defects in hydrogen implanted silicon by deep level transient spectroscopy |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 159-163
B.N. Mukashev,
N. Fukuoka,
H. Saito,
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摘要:
Defect levels produced inp-type silicon by 30 MeV ion implantation and their isochronal annealing behavior were studied by DLTS. Three hole traps located atEv+ 0.18 eV,Ev+ 0.28 eV andEv+ 0.33 eV were introduced at the track end of ions. From comparison with other published data we attribute these levels to single positively charged divacancy (Ev+ 0.18 eV), to Si-B3 (⟨100⟩ split-interstitialEv+ 0.28 eV), and to Si-A14 (divacancy-oxygen complexEv+ 0.33 eV). It was found that the introduction rate of observed defects shows a peak at the fluence of 5 × 1013implanted ions and then decreases at higher fluence.
ISSN:0033-7579
DOI:10.1080/00337578208229928
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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6. |
Thein situannealing of self-ion implanted molybdenum |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 165-173
I.W. Hall,
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摘要:
Self-ion implanted molybdenum has been annealedin situin the transmission electron microscope at temperatures up to 1000°C. At low temperatures, ∼500°C, microcrystallites are nucleated on the heavily damaged surface of the foil. The microcrystallites undergo limited growth before being consumed by growth of the underlying matrix. The later stages of annealing consist of the annihilation of point and line defects by normal, thermally-activated mechanisms. Grain boundary re-orientation has also been observed.
ISSN:0033-7579
DOI:10.1080/00337578208229929
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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7. |
Migration energy of single vacancies in gold |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 175-178
K. Sonnenberg,
U. Dedek,
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摘要:
Systematic measurements of the activation energy for stage III recovery for gold doped with a high concentration of vacancy sinks, are presented. The obtained activation energy of 0.71 ± 0.04 eV must be interpreted as the migration energy of single vacancies.
ISSN:0033-7579
DOI:10.1080/00337578208229930
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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8. |
The velocity dependence of fast heavy-ion induced desorption of biomolecules |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 179-193
P. Håkansson,
B. Sundqvist,
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摘要:
Heavy-ion beams from the Uppsala EN-tandem have been used to induce desorption of ions from samples of glycylglycine, ergosterol and cesium iodide. The experimental technique, involving time-of-flight mass spectroscopy, and the apparatus are described. Secondary ion yields of (M + H)+, M+and Cs+, where M denotes the molecule, have been measured as a function of the atomic number and velocity of the fast primary ions. The results show that the desorption process is connected to the electronic part of the energy loss of the primary ion. A thermal spike model earlier presented to describe sputtering yields from uranium tetrafiuoride1induced by MeV fluorine beams is shown to reproduce some general features of the measured yield distributions.
ISSN:0033-7579
DOI:10.1080/00337578208229931
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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9. |
Reduction of crystalline defects in sos by room temperature Si ion implantation |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 195-200
Jun Amano,
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摘要:
Room temperature Si ion implantation and solid-phase epitaxial regrowth are used to improve the crystalline quality of SOS wafers. Several thickness (0.3 μm to 0.67 μm) SOS wafers are used for the investigation of the mechanism and kinetics of solid-phase epitaxial regrowth after amorphization of the Si layer. MeV helium backscattering with channeling technique, X-ray rocking curve and TEM analysis indicate that a significant reduction in the defect density is obtained for thinner SOS wafers. An annealing time of 2 hrs at 950°C is found to be sufficient to regrow the amorphous region created by Si ion implantation and to produce good crystalline quality SOS layers. From these regrowth investigations, some alternative processess to produce low-defect-density SOS are proposed.
ISSN:0033-7579
DOI:10.1080/00337578208229932
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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10. |
SIMS studies on anomalous behavior of phosphorus and other implants in silicon |
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Radiation Effects,
Volume 61,
Issue 3-4,
1982,
Page 201-205
PaulK. Chu,
Dachang Zhu,
G.H. Morrison,
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摘要:
A phosphorus implant inp-type silicon was analyzed by SIMS, and both the implant profile and the matrix signal were observed to exhibit some anomalous behavior. Further studies revealed the same behavior in other implants. This phenomenon was observed when ann-type dopant was implanted into ap-type matrix, or vice versa. However, some exceptions arose, making the interpretation difficult. The use of matrix signal normalization was adopted and found to improve the results.
ISSN:0033-7579
DOI:10.1080/00337578208229933
出版商:Taylor & Francis Group
年代:1982
数据来源: Taylor
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