11. |
29Si hyperfine structure of unpaired spins at the Si/SiO2interface |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1111-1113
K. L. Brower,
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摘要:
The hyperfine spectrum associated with unpaired electrons at the (111) Si/SiO2interface (Pbcenters) is reported for the first time. Electron paramagnetic resonance measurements indicate that the hyperfine interactionS&drarr;⋅A¯⋅I&drarr; arises from the29Si isotope and is characterized byA∥=146.(±5.)×10−4cm−1andA⊥=85.(±8.)×10−4cm−1. An analysis of this hyperfine interaction firmly establishes many of the details in the structure of this interface defect.
ISSN:0003-6951
DOI:10.1063/1.94244
出版商:AIP
年代:1983
数据来源: AIP
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12. |
Optical absorption tail in InP:Mn from surface photovoltage measurements |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1113-1115
C. L. Chiang,
S. Wagner,
A. A. Ballman,
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摘要:
The steady‐state surface photovoltage technique was used to determine the optical absorption tail of InP:Mn, by extrapolation from the above‐band‐gap absorption spectrum. Reabsorbed recombination radiation is shown to have no effect on this procedure although it does raise the effective minority‐carrier diffusion length. The tail absorption coefficient of InP:Mn increases with hole density in the range of 4.1×1014cm to 5.3×1016cm−3. In the 1016cm−3range, the absorption coefficient appears to rise also with the density of dislocations.
ISSN:0003-6951
DOI:10.1063/1.94245
出版商:AIP
年代:1983
数据来源: AIP
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13. |
New minority hole sinked photoconductive detector |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1115-1117
C. Y. Chen,
Y. M. Pang,
A. Y. Cho,
P. A. Garbinski,
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摘要:
We demonstrate a new photoconductive device called minority hole sinked photoconductive detector. This detector has a back gate electrode for removing slow minority holes, resulting in an improvement of the detector’s fall time from 1 ns to 450 ps down to 80 ps. This represents nearly an order of magnitude improvement in the gain‐bandwidth product. Furthermore, the back gate bias can reduce the noise power by 1 dB at 100 MHz and 0.25 dB at 800 MHz at 1.2‐MHz noise bandwidth.
ISSN:0003-6951
DOI:10.1063/1.94246
出版商:AIP
年代:1983
数据来源: AIP
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14. |
Platinum diffusion into silicon from PtSi |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1118-1120
A. Prabhakar,
T. C. McGill,
M‐A. Nicolet,
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摘要:
We have observed platinum diffusion into the silicon underlying a PtSi film. Silicon substrates covered with platinum films were annealed at temperatures from 300 to 800 °C to form the silicide. Backscattering spectrometry spectra show no degradation of the silicide in the samples treated below 700 °C. Deep level transient spectroscopy (DLTS) was used to measure diffused platinum electron traps. Electron trap concentrations in samples treated below 700 °C are below the DLTS detection limit of 5×1011/cm3. Trap concentration profiles for the samples annealed at higher temperatures were obtained. These profiles cannot in general be explained by simple diffusion from an infinite source of platinum at the surface.
ISSN:0003-6951
DOI:10.1063/1.94247
出版商:AIP
年代:1983
数据来源: AIP
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15. |
Local oxidation induced dislocation generation near [100] Si3N4film edges |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1120-1122
J. Vanhellemont,
J. Van Landuyt,
S. Amelinckx,
C. Claeys,
G. Declerck,
R. Van Overstraeten,
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摘要:
The generation of dislocations at [100] nitride film edges on (001)Czochralski silicon wafers is studied by means of high voltage electron microscopy. After local oxidation 90° (edge) dislocations forming triangular half‐loops with sides lying in [211¯] and [21¯1] directions in a (011) plane are found. It is observed that the shape of the surface stacking faults is also influenced by the mask orientation and that a denuded zone free from bulk defects is formed at the silicon surface. A novel model to explain the dislocation generation and movement under the influence of the stresses near the Si3N4film edges is discussed.
ISSN:0003-6951
DOI:10.1063/1.94248
出版商:AIP
年代:1983
数据来源: AIP
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16. |
Al‐Si contacts formed by ion irradiation and post‐annealing |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1123-1125
L. S. Hung,
J. W. Mayer,
M. Zhang,
E. D. Wolf,
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摘要:
Al‐Si contacts have been formed by implantation of As ions through Al‐Si interfaces followed by heat treatment at 400–500 °C for 10 min. The erosion of Si proceeds uniformly in contact areas at the sintering temperatures. Diodes using Al‐Si contacts produced by this technique have been fabricated on thinn+layers inp‐type Si substrates with junction depths of 0.35 &mgr;m and contact areas of 5 &mgr;m2. The average leakage current per diode (with an approximate junction area of 14×26 &mgr;m2) is about 10−8A, as compared to the leakage current of 10−5A for diodes with Al‐Si contacts prepared by sintering of Al on Si at 420 °C. We attribute the improvement to the uniformity of Si erosion after the interfacial oxide has been dispersed by ion irradiation.
ISSN:0003-6951
DOI:10.1063/1.94249
出版商:AIP
年代:1983
数据来源: AIP
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17. |
Orientation filtering by growth‐velocity competition in zone‐melting recrystallization of silicon on SiO2 |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1126-1128
H. A. Atwater,
C. V. Thompson,
Henry I. Smith,
M. W. Geis,
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摘要:
We describe a method of controlling the in‐plane 〈100〉 directions of grains in (100)‐textured silicon films produced by zone‐melting recrystallization over amorphous SiO2. Grains having in‐plane orientation within a narrow range are able to grow through an orientation filter consisting of a pattern of crystallization barriers, while grains having other orientations are occluded. The results of experiments using an orientation filter, and the parameters which optimize filter performance, are reported.
ISSN:0003-6951
DOI:10.1063/1.94255
出版商:AIP
年代:1983
数据来源: AIP
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18. |
Improvement in high‐field critical currents ofinsituprocessed Nb3Sn by titanium addition |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1129-1131
Y. Yoshida,
K. Togano,
K. Tachikawa,
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摘要:
The effects of the addition of a small amount of Ti toinsituprocessed Nb3Sn tape superconductors have been studied. It has been found that Ti addition significantly improves the critical current densityJcat high magnetic fields above 12 T. AJcvalue of 3×104A/cm2at a magnetic field of 15 T parallel to the tape surface was obtained for the Cu‐40 (Nb‐1.6 wt. % Ti) tape reacted with Sn at 650 °C for 100 h. This enhancement in high‐field performance can be associated with the incorporation of Ti into the A15 Nb3Sn.
ISSN:0003-6951
DOI:10.1063/1.94256
出版商:AIP
年代:1983
数据来源: AIP
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19. |
Effect of chemical doping on the radiation‐induced conductivity of polyethylene terephthalate |
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Applied Physics Letters,
Volume 43,
Issue 12,
1983,
Page 1132-1134
S. R. Kurtz,
C. Arnold,
R. C. Hughes,
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摘要:
A large decrease in the radiation‐induced conductivity of polyethylene terephthalate was produced upon doping films with an electron acceptor molecule. Transient x‐ray photoconductivity data verify that this impurity acts as a deep trap. Charge transfer occurs in the doped dielectric which may be associated with this trapping process.
ISSN:0003-6951
DOI:10.1063/1.94257
出版商:AIP
年代:1983
数据来源: AIP
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