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11. |
Solid phase diffusivity effect on nonequilibrium dopant segregation |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1023-1025
Salvatore Ugo Campisano,
Pietro Baeri,
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摘要:
The profile distribution and lattice location of Zn atoms after laser irradiation of ion implanted Si and Ge substrates have been determined by ion beam analysis techniques. In Si the implanted Zn is completely zone refined to the surface whilst in Ge considerable trapping and supersaturation are obtained. Zn is a fast interstitial diffuser in Si and a slow substitutional diffuser in Ge. This result confirms the kinetic trapping model in which the solid phase diffusivity of the considered dopant plays an important role in determining the velocity at which the interfacial segregation coefficient deviates from the equilibrium value.
ISSN:0003-6951
DOI:10.1063/1.93828
出版商:AIP
年代:1983
数据来源: AIP
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12. |
Crystal growth in amorphous silicon thin films induced by incoherent light flashes |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1026-1028
B. Y. Tong,
K. Ebihara,
P. K. John,
S. K. Wong,
K. P. Chik,
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摘要:
Amorphous silicon thin films on glass substrates were crystallized by a 4‐&mgr;s light pulse from a plasma arc. Explosive crystal growth from nucleation centers was observed at 4.6 J/cm2. Large silver‐shaped streaks (0.7 mm×50 &mgr;m) were produced. Conductivity changed by six orders of magnitude and the flashed samples gave high photoconductivity. Growth patterns were different near the threshold value of 3.1 J/cm2.
ISSN:0003-6951
DOI:10.1063/1.93829
出版商:AIP
年代:1983
数据来源: AIP
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13. |
High performance hydrogenated amorphous silicon solar cells made at a high deposition rate by glow discharge of disilane |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1028-1030
Yutaka Ohashi,
Jean Kenne,
Makoto Konagai,
Kiyoshi Takahashi,
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摘要:
The deposition rate, electronic and optical properties of hydrogenated amorphous silicon films prepared from rf glow discharge decomposition of disilane (Si2H6) diluted in helium have been measured. These films show excellent electrical and optical properties and, most importantly, a high deposition rate coupled with satisfactory solar cell application was realized for the first time. At a deposition rate of 11 A˚/s, 5.47% and 6.5% conversion efficiencies were obtained with a first trial ofn‐i‐ptype solar cells deposited on SnO2/ITO glass and metal substrates, respectively.
ISSN:0003-6951
DOI:10.1063/1.93830
出版商:AIP
年代:1983
数据来源: AIP
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14. |
Degradation of 1.3‐&mgr;m InP/InGaAsP light‐emitting diodes with misfit dislocations |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1031-1033
A. K. Chin,
C. L. Zipfel,
B. H. Chin,
M. A. DiGiuseppe,
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摘要:
The degradation of 1.3‐&mgr;m InP/InGaAsP light‐emitting diodes (LED’s) with misfit dislocations was investigated. Initially, the misfit dislocations were found to be present only in thep‐InP confining layer and they thus showed weak (∼1%) contrast in the electroluminescence (EL) image of the light‐emitting region. Without bias, no degradation of the LED’s was measured after 103h at 200 °C. After 103h at 20 °C and 8 kA/cm2, a previous study found that InP/InGaAsP LED’s containing misfit dislocations did not degrade. However, our study showed that the lifetime of the LED’s varied inversely with the third power of the current density. In the degraded LED’s, the misfit dislocations showed stronger (∼50%) contrast in the EL image, suggesting that they played a significant role in the device degradation. In these devices, misfit dislocations were found not only in thep‐InP confining layer but also in the light‐emitting region of the active layer. The degradation of InP/InGaAsP LED’s with misfit dislocations is thus consistent with the mechanism of nonradiative recombination enhanced growth of the misfit dislocations into the active layer. For our device structure, wafers with &Dgr;a/a≲0.05% lattice mismatch are free of misfit dislocations and thus ensure reliable device operation at high current densities.
ISSN:0003-6951
DOI:10.1063/1.93831
出版商:AIP
年代:1983
数据来源: AIP
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15. |
Bifurcation of deep levels in metastable (GaAs)1−xGe2xalloys |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1033-1035
Kathie E. Newman,
John D. Dow,
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摘要:
Deep impurity levels in metastable (GaAs)1−xGe2xalloys are predicted to bifurcate as functions ofxat the alloy order‐disorder transition composition.
ISSN:0003-6951
DOI:10.1063/1.93832
出版商:AIP
年代:1983
数据来源: AIP
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16. |
Photoelectrocatalysis on silicon in solar light |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1035-1036
Marek Szklarczyk,
John O’M. Bockris,
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摘要:
Photoelectrochemical measurements have been carried out onp‐Si electrodes which contained islands of Pb, Cd, Au, Ni, Co, and Pt. These islands cause the photocurrent density of some of the Si systems to increase greatly (10×) in the middle region of the photocurrent potential curve. A plot of the change in potential observed for this region against log i0for the dark hydrogen evolution on the metals concerned is linear with a slope close to that expected for a rate determining step at themetal‐solution interface.
ISSN:0003-6951
DOI:10.1063/1.93833
出版商:AIP
年代:1983
数据来源: AIP
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17. |
Silicon molecular beam epitaxy on gallium phosphide |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1037-1039
T. de Jong,
W. A. S. Douma,
J. F. van der Veen,
F. W. Saris,
J. Haisma,
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摘要:
Si overlayers have been grown under ultrahigh vacuum conditions on GaP(100) single crystals by means of molecular beam epitaxy. For growth temperatures of 300 °C and higher (2×1) low‐energy electron diffraction patterns of the Si overlayers were seen at all overlayer thicknesses produced (8–10 000 A˚). By means of Auger electron spectroscopy segregation of P and Ga on top of the grown Si surface was measured. With Rutherford backscattering using ion channeling we found Si minimum channeling yields of 3% in the GaP:Si(100) heterostructures, which corresponds well to the yield of pure monocrystalline (100) Si. Two methods are described to eliminate the Ga and P segregation.
ISSN:0003-6951
DOI:10.1063/1.93834
出版商:AIP
年代:1983
数据来源: AIP
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18. |
Ultrahigh speed modulation‐doped heterostructure field‐effect photodetectors |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1040-1042
C. Y. Chen,
A. Y. Cho,
C. G. Bethea,
P. A. Garbinski,
Y. M. Pang,
B. F. Levine,
K. Ogawa,
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摘要:
We have developed a sensitive, ultrahigh speed photodetector which has a structure of a modulation‐doped AlxGa1−xAs/GaAs field‐effect transistor. In spite of a large gate‐drain spacing of >8 &mgr;m and a gate length of >20 &mgr;m, this detector exhibited a rise time of 12 ps and a full width at half‐maximum of 27 ps. When tested by a 8200‐A˚ GaAs injection laser, the detector showed an ac (>20 MHz) external quantum efficiency of >630%, i.e., 9 times more sensitive than apinphotodiode. In view of its high sensitivity, ultrahigh speed, and compatibility with modulation‐doped field‐effect transistors, this detector has promise for a variety of high‐speed optical applications.
ISSN:0003-6951
DOI:10.1063/1.93835
出版商:AIP
年代:1983
数据来源: AIP
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19. |
Diffusion of arsenic in silicon: Validity of the percolation model |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1043-1044
D. Mathiot,
J. C. Pfister,
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摘要:
It is shown that the percolation model previously proposed to explain the high concentration diffusion of phosphorus in Si holds also in the case of arsenic. Suitable numerical values of the parameters are derived, and it is shown that the model allows the simulation of arsenic diffusion in a wide range of experimental conditions.
ISSN:0003-6951
DOI:10.1063/1.93836
出版商:AIP
年代:1983
数据来源: AIP
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20. |
Shot noise effect on the nonzero voltage state of the hysteretic Josephson junction |
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Applied Physics Letters,
Volume 42,
Issue 12,
1983,
Page 1045-1047
E. Ben‐Jacob,
D. J. Bergman,
Y. Imry,
B. J. Matkowsky,
Z. Schuss,
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摘要:
We consider the combined effect of shot and thermal noise on (i) the stationary distribution of fluctuations about the nonzero voltage state of an underdamped hysteretic Josephson junction, and (ii) the noise induced transition rate from the nonzero voltage to the zero voltage state. We find that the distribution is nonsymmetric in that the positive voltage fluctuations are more probable than the negative ones. We also find that the transition rates are larger than those due to thermal noise alone.
ISSN:0003-6951
DOI:10.1063/1.93837
出版商:AIP
年代:1983
数据来源: AIP
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