11. |
Lateral quantum well wires fabricated by selective metalorganic chemical vapor deposition |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1209-1211
Takashi Fukui,
Seigo Ando,
Yoshino K. Fukai,
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摘要:
GaAs quantum wires of a new type are fabricated on {1¯10} crystallographic facets perpendicular to the (1¯1¯1¯)Bsubstrates by selective area growth using metalorganic chemical vapor deposition. First, rectangular‐shaped AlGaAs layers are grown on a SiO2stripe‐masked GaAs (1¯1¯1¯)Bsubstrate at a high growth temperature. Next,n‐AlGaAs/GaAs modulation‐doped structures are laterally grown on {1¯10} sidewalls at a low growth temperature. The channel width of the one‐dimensional electron gas can be exactly controlled by the thickness of the first rectangular AlGaAs layer. The existence of the quasi‐one‐dimensional electron gas on {1¯10} sidewalls is confirmed by the orientation dependence of the Shubnikov‐de Hass oscillations. The advantage of this quantum wire structure is that there is no size fluctuation which is usually present when dry etching processes are used. Other applications of this selective growth on masked substrates, such as lateral superlattices, are also discussed.
ISSN:0003-6951
DOI:10.1063/1.103487
出版商:AIP
年代:1990
数据来源: AIP
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12. |
Fabrication of ultrafine gratings on GaAs by electron beam lithography and two‐step wet chemical etching |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1212-1214
T. Katoh,
Y. Nagamune,
G. P. Li,
S. Fukatsu,
Y. Shiraki,
R. Ito,
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摘要:
50 nm period gratings were produced on thick GaAs substrates by using electron beam lithography and two‐step wet chemical etching. The size was very close to the theoretical limit of the electron beam lithography. For transferring such a fine grating onto GaAs, a two‐step wet chemical etching method was developed, where a H2SO4‐H2O2‐H2O system is first used to roughly etch the oxygen and carbon‐contaminated GaAs surface, followed by surface planarization with a Br‐CH3OH system.
ISSN:0003-6951
DOI:10.1063/1.103488
出版商:AIP
年代:1990
数据来源: AIP
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13. |
Studies of picosecond carrier dynamics in polysilane alloys: Evidence for geminate recombination in small hydrogenated amorphous silicon clusters |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1215-1217
S. G. Han,
B. C. Hess,
G. S. Kanner,
Z. V. Vardeny,
S. Nitta,
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摘要:
The ultrafast photocarrier dynamics in polysilane alloys, amorphous (SiH2)n, has been studied using the picosecond photoinduced absorption (PA) technique. For excitation below the optical gap, the PA response decays exponentially and is faster at low temperatures. This is interpreted in terms ofe‐hgeminate recombination in the small clusters (∼10 A˚) ofa‐Si:H embedded in the polysilane matrix. The PA response with above‐gap excitation is similar to that of conventionala‐Si:H; it decays much slower in the form of a power lawt−&bgr;(&bgr;<1), independent of spectral range between 1.4 and 2.2 eV. This shows that thee‐hdistance after above‐gap photogeneration is larger than the size of thea‐Si:H clusters.
ISSN:0003-6951
DOI:10.1063/1.104228
出版商:AIP
年代:1990
数据来源: AIP
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14. |
Electron focusing with multiparallel GaAs‐AlGaAs wires defined by damageless processing |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1218-1220
F. Nihey,
K. Nakamura,
M. Kuzuhara,
N. Samoto,
T. Itoh,
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摘要:
Magnetoresistance modulation, resulting from electron focusing, is investigated with multiparallel GaAs‐AlGaAs wires, which are defined by electron beam lithography and damageless wet‐chemical etching. Distinct focusing peaks in magnetoresistance are observed, although the samples have wires longer than a ballistic mean free path, which is derived from the focusing peak intensity. Specularity coefficientpfor the etched region boundary is also obtained asp≊1 from the focusing peak ratio. The mechanism limiting ballistic transport in the electron focusing condition is discussed, based on the temperature and the electron density dependence of the peak intensity.
ISSN:0003-6951
DOI:10.1063/1.103489
出版商:AIP
年代:1990
数据来源: AIP
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15. |
Complete planarization of via holes with aluminum by selective and nonselective chemical vapor deposition |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1221-1223
Kazuo Tsubouchi,
Kazuya Masu,
Nobuyuki Shigeeda,
Tatsuya Matano,
Yohei Hiura,
Nobuo Mikoshiba,
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摘要:
We have developed a new controllable method of selective and nonselective deposition of high quality aluminum by low‐pressure chemical vapor deposition using dimethylaluminum hydride with hydrogen. At first, silicon dioxide via holes on silicon substrate were selectively filled with aluminum by thermal decomposition. Then, adding the plasma excitation for 1 min, the aluminum film began to deposit nonselectively on the silicon dioxide as well as the selectively deposited aluminum. Silicon dioxide via holes were completely planarized by the selective and nonselective deposition. The single‐crystal structure of aluminum deposited selectively on silicon was observed with a new scanning microreflection high‐energy electron diffraction microscope.
ISSN:0003-6951
DOI:10.1063/1.103490
出版商:AIP
年代:1990
数据来源: AIP
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16. |
Tight‐binding analysis of the conduction‐band structure in quantum wires |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1224-1226
T. Yamauchi,
Y. Arakawa,
J. N. Schulman,
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摘要:
The tight‐binding method is applied, for the first time, to the analysis of the conduction‐band structure of GaAs‐Al0.4Ga0.6As quantum wires which are parallel to the [110] orientation. The results indicate that the effective mass of electrons parallel to the quantum wires is about 1.45 times as large as that of bulk GaAs. This increased effective mass reduces the electron mobility of the quantum wire at low temperature compared to the value which has been expected.
ISSN:0003-6951
DOI:10.1063/1.103491
出版商:AIP
年代:1990
数据来源: AIP
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17. |
Optically induced restructuring of a hydrogenated amorphous silicon thin‐film surface |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1227-1229
Joydeep Dutta,
Gautam Ganguly,
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摘要:
Hydrogenated amorphous silicon thin films have been characterized using specular reflectance spectra. An ultraviolet light‐induced irreversible increase in reflectance has been attributed to changes in surface microstructure. These changes have been explained as being caused by phonons emitted during photocarrier thermalization. An irreversible increase of photoconductivity substantiates these observations.
ISSN:0003-6951
DOI:10.1063/1.103492
出版商:AIP
年代:1990
数据来源: AIP
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18. |
Defect states of amorphous Si probed by the diffusion and solubility of Cu |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1230-1232
A. Polman,
D. C. Jacobson,
S. Coffa,
J. M. Poate,
S. Roorda,
W. C. Sinke,
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摘要:
The diffusivity and solubility of Cu impurities have been measured in different structural states of amorphous Si (a‐Si) formed by MeV Si implantation. The 2.2‐&mgr;m‐thicka‐Si layers were first annealed (structurally relaxed) at 500 °C and then implanted with 200 keV Cu ions, returning a 300‐nm‐thick surface layer to the as‐implanted state. After diffusion at temperatures in the range 150–270 °C, we observe solute partitioning at a sharp phase boundary between the annealed and Cu‐implanted layers, the partition coefficient being as large as 8.2±1.3. The diffusion coefficient in annealeda‐Si is 2–5 times larger than in as‐implanteda‐Si, with activation energies of 1.39±0.15 and 1.25±0.04 eV, respectively. The data show quite strikingly the role which defects can play in thea‐Si structure.
ISSN:0003-6951
DOI:10.1063/1.103493
出版商:AIP
年代:1990
数据来源: AIP
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19. |
Does the two‐dimensional electron gas effect contribute to high‐frequency and high‐speed performance of field‐effect transistors? |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1233-1235
M. Feng,
C. L. Lau,
V. Eu,
C. Ito,
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摘要:
We present experimental evidence that current gain cutoff frequency (ft) values equal to or greater than those achieved with high electron mobility transistors (HEMTs) and pseudomorphic HEMTs can also be achieved by ion‐implanted GaAs and InGaAs metal‐semiconductor field‐effect transistors. These measuredftresults clearly suggest that the average electron velocity under the gate is determined primarily by the high‐field electron velocity rather than the low‐field electron mobility. Hence, we conclude that the transport properties of the two‐dimensional electron gas in HEMTs and pseudomorphic HEMTs do not make a significant contribution to the high‐frequency and high‐speed performance of these devices.
ISSN:0003-6951
DOI:10.1063/1.103494
出版商:AIP
年代:1990
数据来源: AIP
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20. |
Monte Carlo simulation of mode‐locked semiconductor diode lasers |
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Applied Physics Letters,
Volume 57,
Issue 12,
1990,
Page 1236-1238
J. Werner,
T. P. Lee,
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摘要:
We report on results of a Monte Carlo simulation that uses traveling‐wave equations for the optical field of mode‐locked diode lasers. The model includes effects of the spontaneous emission, the linewidth enhancement factor, and nonlinear gain. The results of the simulation agree with experimental observations such as the sublinear power versus current characteristics. According to this model the reduced power is a result of combined large‐signal effects. We propose to incorporate a frequency shifter into the cavity to improve the pulse energy and the use of available bandwidth.
ISSN:0003-6951
DOI:10.1063/1.103495
出版商:AIP
年代:1990
数据来源: AIP
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