11. |
Rastered, uniformly separated wavelengths emitted from a two‐dimensional vertical‐cavity surface‐emitting laser array |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 31-33
C. J. Chang‐Hasnain,
J. R. Wullert,
J. P. Harbison,
L. T. Florez,
N. G. Stoffel,
M. W. Maeda,
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摘要:
We report the first two‐dimensional vertical‐cavity surface‐emitting laser (VCSEL) array with each laser emitting a unique, nonredundant wavelength. This was achieved by implementing spatially chirped layers in the VCSEL structure and obliquely aligning the array axes to the direction of the thickness chirp. We obtained 77 wavelengths from a 7×11 VCSEL array with all the lasers emitting single mode. Uniform wavelength separation between neighboring lasers is achieved with the direction of increasing wavelength rastering through the array. All the lasers exhibit nearly the same optical and electrical properties, in spite of the intentionally implemented difference in the emission wavelengths.
ISSN:0003-6951
DOI:10.1063/1.104428
出版商:AIP
年代:1991
数据来源: AIP
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12. |
Composition dependence of the second‐harmonic phase‐matching temperature in LiNbO3 |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 34-35
N. Schmidt,
K. Betzler,
B. C. Grabmaier,
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摘要:
Phase‐matching temperatures for 90° phase matching of Nd:YAG laser light have been measured in LiNbO3crystals with different Li/Nb ratios. Their melt and solid composition had been determined chemically with an accuracy of about 0.2%. Our results contrast to earlier work, no linear dependence of the phase‐matching temperature versus the Li/Nb ratio was found. The measured dependence shows that the phase‐matching temperature can be used as an excellent probe for the composition of LiNbO3.
ISSN:0003-6951
DOI:10.1063/1.105216
出版商:AIP
年代:1991
数据来源: AIP
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13. |
Epitaxial growth and crystallographic analyses of (Pb, La)TiO3thin films by a multi‐ion‐beam reactive cosputtering technique |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 36-38
Dingquan Xiao,
Zhili Xiao,
Jumu Zhu,
Derui Wan,
Huachong Guo,
Bizheng Xie,
Hong Yuan,
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摘要:
Epitaxial thin films of lead titanate(PbTiO3) and lanthanium‐modified lead titanate [(Pb, La)TiO3] have been successfully grown on (0001) sapphire substrates for the first time by the recently developed multi‐ion‐beam reactive cosputtering (MIBRECS) technique. The deposition processes and the thin‐film analyses studied by x‐ray diffraction (XRD), electron probe x‐ray microanalyzer (EPMA), and reflection high‐energy electron diffraction (RHEED) are reported. The experiments show that the multi‐ion‐beam reactive cosputtering process is very suitable for deposition of multicomponent oxide thin films with high reproducibility.
ISSN:0003-6951
DOI:10.1063/1.104429
出版商:AIP
年代:1991
数据来源: AIP
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14. |
Hydrogen effusion from hydrogenated amorphous silicon caused by the deposition of a silicon nitride overlayer |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 39-41
T. Matsumoto,
J. Watanabe,
T. Tanaka,
Y. Mishima,
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摘要:
The effect of silicon nitride (SiN) deposition on hydrogenated amorphous silicon (a‐Si:H) has been investigated to find the origin of the difference ofa‐Si:H/SiN interface properties caused by the order of deposition. Sheet conductance of the on‐state in inverted staggered (a‐Si:H on SiN) thin‐film transistors (TFTs) increases gradually with the substrate temperature (Tsub) of SiN, but decreases rapidly with theTsubof SiN in staggered TFTs (SiN ona‐Si:H). Photoluminescence experiments indicated that the degradation in staggered TFTs was due to the creation of defects ina‐Si:H by the deposition of the SiN overlayer. It was shown by Fourier transform infrared attenuated total reflection that the origin of the defects was hydrogen effusion froma‐Si:H.
ISSN:0003-6951
DOI:10.1063/1.104430
出版商:AIP
年代:1991
数据来源: AIP
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15. |
Electromigration in a single crystalline submicron width aluminum interconnection |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 42-44
Shoso Shingubara,
Yasushi Nakasaki,
Hisashi Kaneko,
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摘要:
Electromigration properties in a single crystalline submicron width aluminum interconnection formed on Si(111) have been examined by resistance change measurements andinsituobservations using scanning electron microscopy. It was observed that single crystalline aluminum has an extremely high resistance to electromigration‐induced open circuit failures, when compared to polycrystalline copper and aluminum. The mechanism for the high resistance is considered to be a large activation energy, resulting from lattice diffusion. A tendency for void formation to become parallel to the longitudinal direction of the interconnection assisted the life time prolongation.
ISSN:0003-6951
DOI:10.1063/1.104431
出版商:AIP
年代:1991
数据来源: AIP
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16. |
Formation of amorphous interlayers by solid‐state diffusion in ultrahigh‐vacuum‐deposited polycrystalline Nb and Ta thin films on (111)Si |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 45-47
J. Y. Cheng,
L. J. Chen,
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摘要:
The formation of amorphous interlayers (a‐interlayers) in ultrahigh‐vacuum‐deposited polycrystalline Nb and Ta thin films on (111)Si has been studied by cross‐sectional transmission electron microscopy. The growth ofainterlayers was found to follow a linear growth law initially in samples annealed at 450–500 °C and 550–625 °C for Nb/Si and Ta/Si, respectively. The growth then slows down and deviates from a linear growth behavior as a critical thickness of theainterlayer was reached. Theainterlayer/crystalline Si interface was found to be rather smooth. The roughness of the interface between the Nb layer andainterlayer was observed to decrease with annealing temperature and time. The observation suggested that the growth of theainterlayer was interface reaction controlled initially.
ISSN:0003-6951
DOI:10.1063/1.104438
出版商:AIP
年代:1991
数据来源: AIP
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17. |
Dislocation velocity in indium phosphide |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 48-50
Ichiro Yonenaga,
Koji Sumino,
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摘要:
Velocities of &agr;, &bgr;, and screw dislocations in InP crystals generated from surface scratches were measured as a function of stress and temperature by means of the etch pit technique. Effects of Zn and S impurities, acting as acceptor and donor, respectively, on the dislocation velocity were also investigated. lt was found that Zn impurity strongly retards the motion of all types of dislocations. On the other hand, S impurity is found to reduce the mobilities of &bgr; and screw dislocations while it enhances the mobility of &agr; dislocations.
ISSN:0003-6951
DOI:10.1063/1.104439
出版商:AIP
年代:1991
数据来源: AIP
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18. |
Metal/semiconductive polymer Schottky device |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 51-52
Rajiv Gupta,
S. C. K. Misra,
B. D. Malhotra,
N. N. Beladakere,
Subhas Chandra,
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摘要:
Development of a metal/organic‐semiconductor Schottky junction as an alternative to the metal/inorganic‐semiconductor junction is reported. Metal/polypyrrole (PP) junctions have been prepared with electrochemically deposited doped PP films of different thickness and various metals (In, Sn, Ti, and Al) as electrodes. The electrical characteristics of the junction depend upon the work functions of PP and the metal. It has been possible to prepare Schottky barriers on the PP films with a metal electrode having a work function lower than that of the polymer. Various physical characteristics of the polymer, work function, Fermi level, and carrier concentration have been estimated.
ISSN:0003-6951
DOI:10.1063/1.104441
出版商:AIP
年代:1991
数据来源: AIP
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19. |
Disorder of ZnSe/ZnS strained‐layer superlattices by N+or Li+ion implantation and low‐temperature annealing |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 53-55
Toshiya Yokogawa,
Tohru Saitoh,
Tadashi Narusawa,
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摘要:
We demonstrate layer disordering of ZnSe/ZnS strained‐layer superlattices (SLSs) induced by low‐damage N+or Li+ion implantation and low‐temperature annealing. The interdiffusion of Se and S atoms was observed by secondary‐ion mass spectrometry analyses. By reflectance measurements, a significant decrease in the refractive index, which is useful for waveguiding applications, was measured in the disordered SLS. In photoluminescence (PL) spectra, strong excitonic emission around 400 nm was observed in the disordered SLS corresponding to a damage recovery. A slight red shift of the PL peak observed in the early stages of annealing is interpreted as the relaxation of misfit strain by interdiffusion. For longer annealing times, the PL peak for an implanted SLS shifted towards the higher energy side, which clearly indicates layer disordering of the SLSs. This low‐temperature planar process will be very useful for the fabrication of II‐VI semiconductor optoelectronic devices.
ISSN:0003-6951
DOI:10.1063/1.104442
出版商:AIP
年代:1991
数据来源: AIP
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20. |
Controlled sublimation growth of single crystalline 4H‐SiC and 6H‐SiC and identification of polytypes by x‐ray diffraction |
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Applied Physics Letters,
Volume 58,
Issue 1,
1991,
Page 56-58
Masatoshi Kanaya,
Jun Takahashi,
Yuichiro Fujiwara,
Akihiro Moritani,
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摘要:
Polytype‐controlled crystal growth of SiC was carried out by using a sublimation method. Production yields as high as 80% and 85% for 4H and 6H single crystals were obtained, respectively. We observed in x‐ray diffraction pattern of SiC that space‐group‐forbidden peaks appear periodically among (000l) peaks. Their intensity is strong enough to be distinguished. These peaks represent the periodicity along thecaxis of each polytypic modification of SiC. X‐ray diffractometry using these peaks is quite useful and easy for a clear identification of the SiC polytypes.
ISSN:0003-6951
DOI:10.1063/1.104443
出版商:AIP
年代:1991
数据来源: AIP
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