11. |
A new optoacoustic cell with improved performance |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 578-579
C. K. N. Patel,
R. J. Kerl,
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摘要:
We report a novel optoacoustic (OA) cell construction which has improved small absorption measurement capability from 10−9cm−1to 10−10cm−1. The new OA cell is ideally suitable for use with planar output lasers, e.g., diode lasers. Now optoacoustic spectroscopy can be extended to include the effects of low temperatures, electric fields, and magnetic field effects.
ISSN:0003-6951
DOI:10.1063/1.89242
出版商:AIP
年代:1977
数据来源: AIP
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12. |
Optically pumped cell for novel visible decay of inhomogeneous magnetic field or of rf frequency spectrum |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 580-582
A. C. Tam,
W. Happer,
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摘要:
We have constructed a simple laser‐pumped device for a visible and real‐time display of an inhomogeneous magnetic field in three dimensions. Photographic records of such displays in the form of constant‐field contours spaced 5 mG apart are presented. Our device is capable of high spatial resolution, and we have observed contour lines as sharp as 0.02 cm full width. Such real‐time high‐resolution contours cannot be obtained by conventional point‐by‐point mapping. Our device can also be used as an unconventional rf frequency spectrum analyzer.
ISSN:0003-6951
DOI:10.1063/1.89243
出版商:AIP
年代:1977
数据来源: AIP
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13. |
Tunable uv generation in KB5O8⋅4H2O to 1966 A˚ |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 583-584
K. Kato,
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摘要:
Efficient generation of tunable uv radiation to 1966 A˚ has been achieved by type‐1 frequency mixing of the outputs of the fourth harmonic of a Nd : YAG laser and a near‐infrared dye laser pumped by the second harmonic of the same Nd : YAG laser. A peak power as high as 40 kW with an average power of 2 mW was obtained at 1966 A˚.
ISSN:0003-6951
DOI:10.1063/1.89244
出版商:AIP
年代:1977
数据来源: AIP
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14. |
Semiconductor lasers with integrated interferometric reflectors |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 585-587
D. R. Scifres,
W. Streifer,
R. D. Burnham,
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摘要:
A new integrated interferometric reflector (IIR) is demonstrated in an optically pumped GaAs waveguide laser. It is shown that the laser can be wavelength tuned over 30 A˚ by very small changes in the refractive index of one IIR branch.
ISSN:0003-6951
DOI:10.1063/1.89245
出版商:AIP
年代:1977
数据来源: AIP
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15. |
Backside‐illuminated InAs1−xSbx‐InAs narrow‐band photodetectors |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 587-589
D. T. Cheung,
A. M. Andrews,
E. R. Gertner,
G. M. Williams,
J. E. Clarke,
J. G. Pasko,
J. T. Longo,
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摘要:
High‐performance backside‐illuminated photodiodes have been fabricated for the first time from InAs1−xSbx‐InAs heterostructures prepared by liquid‐phase‐epitaxy technique. The peak wavelength can be tuned compositionally from 3.1 to over 7.0 &mgr;m at 77 K. The half‐width of the spectral responses as narrow as 1760 A˚ (at 4.0 &mgr;m) have been achieved. Internal quantum efficiencies of 90% and zero‐bias‐resistance–area products of 2×107&OHgr; cm2have been obtained at 77 K.
ISSN:0003-6951
DOI:10.1063/1.89246
出版商:AIP
年代:1977
数据来源: AIP
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16. |
Leaky‐mode buried‐heterostructure AlGaAs injection lasers |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 590-591
Takashi Kajimura,
Kazutoshi Saito,
Noriyuki Shige,
Ryoichi Ito,
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摘要:
Leaky‐mode buried‐heterostructure injection lasers are fabricated and operated successfully under pulse bias at room temperature. The lasers consist of a thin active layer confined by paralleln‐ andp‐AlxGa1−xAs layers with a high mole fraction of AlAs (x=0.4) and perpendicularp−‐AlyGa1−yAs layers with a low mole fraction of AlAs (y=0.25). It is shown that most of the laser power can be coupled out into the low‐loss perpendicular layers and emitted from the end facets, resulting in highly collimated beams with a beam divergence of about 1°.
ISSN:0003-6951
DOI:10.1063/1.89247
出版商:AIP
年代:1977
数据来源: AIP
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17. |
Information‐storage device using surface diodes |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 592-594
C. G. Kirkpatrick,
G. E. Possin,
J. F. Norton,
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摘要:
A concept for a high‐density memory‐storage device is described. Information is recorded as small implantedp+(orn+) diodes, formed by a focused ion beam, on then+(orp+) surface of a large‐area diode and read by a focused electron beam. Preliminary experimental results using ion implantation through an aperture mask to simulate a focused ion beam, and a scanning electron microscope for readout, demonstrate better than 0.5‐&mgr; bit spacing. Evaluation indicates that 1010bits/cm2storage density is possible, with ≳10 Mbits/sec write/read rates, and access times <30 &mgr;sec to 1011‐bit data fields.
ISSN:0003-6951
DOI:10.1063/1.89248
出版商:AIP
年代:1977
数据来源: AIP
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18. |
A new acceptor level in indium‐doped silicon |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 594-596
R. Baron,
M. H. Young,
J. K. Neeland,
O. J. Marsh,
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摘要:
A new acceptor level located 0.111±0.002 eV from the valence band with a peak photoionization cross section of (1.4±0.6) ×10−16cm2has been observed in indium‐doped silicon. Its presence is revealed both by the low‐temperature slope of Hall measurements versus temperature and by the spectral response of the photoconductivity. The concentration of this 0.111‐eV level is strongly correlated with the concentration of indium, suggesting that an In complex is responsible for this center.
ISSN:0003-6951
DOI:10.1063/1.89249
出版商:AIP
年代:1977
数据来源: AIP
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19. |
On the establishment of an inversion layer inp‐ andn‐type silicon substrates under conditions of high oxide fields |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 597-598
P. M. Solomon,
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摘要:
It has been observed that an inversion layer cannot form in ap‐type silicon substrate when the Fowler‐Nordheim tunneling current into the oxide exceeds the minority generation current in the depletion layer. On the other hand, forn‐type substrates, the formation of the inversion layer is unaffected by the oxide current.
ISSN:0003-6951
DOI:10.1063/1.89250
出版商:AIP
年代:1977
数据来源: AIP
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20. |
The distribution of gold and oxygen in solid phase epitaxy Si films |
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Applied Physics Letters,
Volume 30,
Issue 11,
1977,
Page 598-600
A. Christou,
J. E. Davey,
H. M. Day,
H. B. Dietrich,
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摘要:
Silicon films deposited on Au/Si layers at deposition temperatures at or above 380 °C are single crystal, while Si films deposited on Si with a native oxide are amorphous up to 500 °C and ordered polycrystalline above 500 °C. The initial gold (300 A˚) deposit migrates to the growing epitaxy surface where it nucleates in clusters. RBS and AES analysis indicated that 0.1 at.% gold remains distributed throughout the epitaxial film.
ISSN:0003-6951
DOI:10.1063/1.89251
出版商:AIP
年代:1977
数据来源: AIP
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