|
21. |
Hardness measurement of thin films: Separation from composite hardness |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1402-1404
J. L. He,
W. Z. Li,
H. D. Li,
Preview
|
PDF (91KB)
|
|
摘要:
A composite hardness model based on the function of depth weight factor is presented. The model can be applied to determine the characteristic hardness of surface coatings which are too thin for the hardness to be directly measured. Its application requires only composite hardness data obtained from coated specimens by conventional microhardness measurement. DLC, TiN, and Cu films on substrates of glass, silicon, and AISI 52100 steel were used to verify this composite hardness model. It proved valid for a variety of cases. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117595
出版商:AIP
年代:1996
数据来源: AIP
|
22. |
Optimization of pyroelectricity in the smectic‐C*phase of a liquid‐crystalline terpolymer |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1405-1407
R. E. Geer,
J. Naciri,
B. R. Ratna,
R. Shashidhar,
Preview
|
PDF (93KB)
|
|
摘要:
The dynamic pyroelectric response in the smectic‐C*(SmC*) phase of a novel class of polysiloxane terpolymers is reported. In these terpolymers methyl groups and two distinct types of mesogenic side chains are attached to the siloxane backbone. Our investigations reveal that the magnitude and temperature dependence of the pyroelectric signal, as well as the temperature range of the SmC*phase, can be controlled by varying the relative side‐chain composition. This permits optimization of the pyroelectric properties over a temperature range extending to subambient. Specifically, the pyroelectric coefficientpcan be made very nearly temperature independent, and the ratiop/&egr;′ extremely high, making these materials suitable for uncooled infrared detectors. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117596
出版商:AIP
年代:1996
数据来源: AIP
|
23. |
Dependence of generation and structures of stacking faults on growing surface stoichiometries in ZnSe/GaAs |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1408-1410
L. H. Kuo,
K. Kimura,
S. Miwa,
T. Yasuda,
T. Yao,
Preview
|
PDF (105KB)
|
|
摘要:
Thin ZnSe films were grown by molecular beam epitaxy on Zn exposed (2×4) As‐stabilized surfaces of GaAs epilayers under varied beam flux ratios. A very low density of faulted defects in the range of ∼ 104/cm2was generated in samples grown under a condition with a mixture of both (2×1) and weakc(2×2) surface reconstructions at the initial stages of growth. However, an asymmetric distribution on the densities of extrinsic cation‐ and anion‐terminated Shockley‐type stacking faults were generated, respectively, in samples grown under Zn‐ and Se‐rich surface stoichiometries. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117597
出版商:AIP
年代:1996
数据来源: AIP
|
24. |
Evidence of interface trap creation by hot‐electrons in AlGaAs/GaAs high electron mobility transistors |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1411-1413
Gaudenzio Meneghesso,
Alessandro Paccagnella,
Youcef Haddab,
Claudio Canali,
Enrico Zanoni,
Preview
|
PDF (91KB)
|
|
摘要:
We report on the hot‐electrons induced degradation in AlGaAs/GaAs high electron mobility transistors (HEMTs), consisting of a decrease in the drain current and an increase in the parasitic drain resistance. The amount of the degradation is proportional to the impact‐ionization rate which is related to the electron energy. Transconductance dispersion measurements and drain current deep level transient spectroscopy (DLTS) have been used to identify interface traps which are located at the AlGaAs/GaAs interface in the gate‐drain access region and are the causes of the observed degradation. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117598
出版商:AIP
年代:1996
数据来源: AIP
|
25. |
Recombination dynamics of excitons and biexcitons in a hexagonal GaN epitaxial layer |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1414-1416
Yoichi Kawakami,
Zhi Gang Peng,
Yukio Narukawa,
Shizuo Fujita,
Shigeo Fujita,
Shuji Nakamura,
Preview
|
PDF (92KB)
|
|
摘要:
Time‐resolved photoluminescence (PL) spectroscopy has been performed at 18 K on excitonic‐related emissions in an unintentionally doped hexagonal GaN epitaxial layer grown by two‐flow metalorganic chemical vapor deposition (TF‐MOCVD). Under low excitation condition, radiative recombination ofAfree exciton (EXA: 3.4921 eV) and neutral shallow‐acceptor bound exciton [(A0s,X): 3.4805 eV] dominated the spectrum. Decay time of (A0s,X) emission is relatively long (585 ps) indicating a small number of non‐radiative centers in the layer. At higher excitation densities, new PL peak appeared at 3.4864 eV and grew superlinearly with excitation densities. These features, combined with their transient behavior, suggest that this new emission band is due to the biexciton recombination. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117599
出版商:AIP
年代:1996
数据来源: AIP
|
26. |
Observation of electrically resettable negative persistent photoconductivity in InAs/AlSb single quantum wells |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1417-1419
Fu‐Cheng Wang,
W. E. Zhang,
C. H. Yang,
M. J. Yang,
B. R. Bennett,
Preview
|
PDF (80KB)
|
|
摘要:
The mechanism of the negative persistent photoconductivity (NPPC) in InAs/AlSb single quantum wells is discussed. The molecular beam epitaxy grown single InAs quantum well sample is made into Hall bars with the substrate as the backgate. Using the newly designed buffer, the gate bias can deplete or enhance the two‐dimensional electrons in the InAs quantum well without substantial gate leakage current. Based on the 4.2 K magnetoresistance data, and the fact that the trapped electrons can be redistributed by gate bias, we conclude that the NPPC effect at low temperatures is a result of the capture of photoexcited electrons by ordinary, deep donors in AlSb. Numerical modeling using physical assumptions can quantitatively explain our experimental observation, and the calculated AlSb donor energy is 0.41±0.05 eV above the AlSb valence band maximum, with 4×1016/cm3to 1017/cm3in concentration. The previously discussedDX‐center‐like characteristic of deep levels in AlSb, i.e., lattice‐relaxation with a relatively high activation energy, is not evidenced in this work. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117600
出版商:AIP
年代:1996
数据来源: AIP
|
27. |
Photoluminescence characterization of the quantum well structure and influence of optical illumination on the electrical performance of AlGaN/GaN modulation‐doped field‐effect transistors |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1420-1422
S. N. Mohammad,
Z.‐F. Fan,
A. Salvador,
O. Aktas,
A. E. Botchkarev,
W. Kim,
Hadis Morkoc¸,
Preview
|
PDF (72KB)
|
|
摘要:
Electrical characteristics of high performance GaN modulation‐doped field‐effect transistors (MODFETs) grown by reactive molecular beam epitaxy method are studied experimentally both in dark and under white light illumination. The maximum measured drain‐source current is 626 mA/mm in dark and 695 mA/mm under illumination, which saturates at a relatively low drain‐source voltageVDS. The transconductance increases with decreasing gate length reaching a value of 210 mS/mm in dark and 222 mS/mm under illumination for devices with a gate length ofLG=1.5&mgr;m. Breakdown voltages of about 90 V have also been exhibited by devices with gate lengthLG=1.5 &mgr;m and drain‐gate distanceLDG=1 &mgr;m. To our knowledge, these are the best values obtained so far from GaN MODFETs which we attribute to the suppression of leakage currents and improved materials structure of the devices. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117601
出版商:AIP
年代:1996
数据来源: AIP
|
28. |
Dependence of threshold current density on the energy‐band offsets in Zn1−uCduSe/ZnSzSe1−z/Zn1−xMgxSySe1−yseparate‐confinement heterostructures lasers |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1423-1425
Khalid Shahzad,
Maarten Buijs,
Preview
|
PDF (95KB)
|
|
摘要:
We use a theoretical model of semiconductor lasers to calculate threshold current density (Jth), optical gain (g), and spontaneous emission rate (rsp) as a function of the two heterojunction band offsets between Zn1−uCduSe(well)/ZnSzSe1−z(guiding) layers and ZnSzSe1−z(guiding)/ Zn1−xMgxSySe1−y(cladding) layers. We find that for the conduction‐band offset between the well and the guiding layers ranging from ∼0.55&Dgr;Egto ∼0.75&Dgr;Eg(&Dgr;Egbeing the energy band‐gap difference), there is very little change inJth,g,rsp. Furthermore, these three quantities are very weakly dependent on the conduction‐band offset between the guiding and the cladding layers ranging from 0.2&Dgr;Egto 0.5&Dgr;Eg. However, if the offset between the well and the guiding layers is increased from ∼0.75&Dgr;Egto ∼0.8&Dgr;Eg, the calculations indicate a sharp drop inJth,g, andrsp. We explain this behavior as due to the unbinding of the ground‐state light‐hole subband as the valence band offset is reduced. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117602
出版商:AIP
年代:1996
数据来源: AIP
|
29. |
ICl/Ar electron cyclotron resonance plasma etching of III–V nitrides |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1426-1428
C. B. Vartuli,
S. J. Pearton,
J. W. Lee,
J. Hong,
J. D. MacKenzie,
C. R. Abernathy,
R. J. Shul,
Preview
|
PDF (170KB)
|
|
摘要:
Electron cyclotron resonance plasma etch rates for GaN, InN, InAlN, AlN, and InGaN were measured for a new plasma chemistry, ICl/Ar. The effects of gas chemistry, microwave and rf power on the etch rates for these materials were examined. InN proved to be the most sensitive to the plasma composition and ion density. The GaN, InN, and InGaN etch rates reached ∼13 000, 11 500, and ∼7000 A˚/min, respectively, at 250 W rf (−275 V dc) and 1000 W microwave power. The etched surface of GaN was found to be smooth, with no significant preferential loss of N from the surface at low rf powers, and no significant residue on the surface after etching. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117603
出版商:AIP
年代:1996
数据来源: AIP
|
30. |
Passivation of GaAs surface by sulfur glow discharge |
|
Applied Physics Letters,
Volume 69,
Issue 10,
1996,
Page 1429-1431
Xiaoyuan Hou,
Xiying Chen,
Zheshen Li,
Xunmin Ding,
Xun Wang,
Preview
|
PDF (60KB)
|
|
摘要:
A new sulfur passivation technique, the sulfur vapor glow discharge, has been developed to form a thick sulfide layer on GaAs surface. By using Auger electron spectroscopy and x‐ray photoelectron spectroscopy measurements, the main composition of the passivation layer is found to be gallium sulfide without the existence of unstable As–S bonds. The stability of the passivation effect is demonstrated by the nondecaying behavior of the photoluminescence intensity of the GaAs passivation surface under the illumination of the laser beam with very high intensity. ©1996 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.117604
出版商:AIP
年代:1996
数据来源: AIP
|
|