|
21. |
Preparation and properties of hydrogenated amorphous silicon films by glow discharge decomposition of silane in cascade reactors |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 991-993
P. N. Dixit,
R. Bhattacharya,
O. S. Panwar,
V. V. Shah,
Preview
|
PDF (230KB)
|
|
摘要:
A novel and economical method for the preparation of the hydrogenated amorphous silicon films by glow discharge composition of silane in two reactors connected in cascade is presented. Whereas the films obtained from the first reactor have nearly the same dark and photoconductivity as reported in literature, those from the second reactor exhibit four orders less dark conductivity and one order less photoconductivity for the same deposition conditions.
ISSN:0003-6951
DOI:10.1063/1.94623
出版商:AIP
年代:1984
数据来源: AIP
|
22. |
Single crystalline Si islands on an amorphous insulating layer recrystallized by an indirect laser heating technique for three‐dimensional integrated circuits |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 994-996
R. Mukai,
N. Sasaki,
T. Iwai,
S. Kawamura,
M. Nakano,
Preview
|
PDF (221KB)
|
|
摘要:
A new laser recrystallizing technique for producing single crystalline Si islands on an amorphous insulating layer has been developed. Si islands are recrystallized by indirect Ar ion laser heating utilizing a Si cap. This technique is an effective recrystallizing method for fabricating three‐dimensional integrated circuits. During recrystallization, this technique easily and stably produces a desired temperature profile to eliminate grain boundaries in recrystallized Si islands; the interior of the Si islands is kept cooler than the periphery and crystal growth begins from the interior. This desired temperature profile is realized because an Ar ion laser power is absorbed in the Si cap and heat flow takes place to the Si islands laterally as well as vertically from the heated Si cap through a separation cap. Damage to the underlying layer is not observed, which suggests that the laser beam power is cut in the Si cap. No grain boundaries are observed in more than 90% of the Si islands recrystallized with such an arrangement that laser beam traces include Si islands; the size of the islands is 20×60 &mgr;m. Field effect mobility of 460 cm2/Vs is obtained for Si on insulator/metal‐oxide‐semiconductor field‐effect transistors fabricated in the recrystallized Si islands with this technique.
ISSN:0003-6951
DOI:10.1063/1.94624
出版商:AIP
年代:1984
数据来源: AIP
|
23. |
Observation of Hg diffusion in CdTe by means of 40‐MeV O5+ion backscattering |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 996-998
K. Takita,
K. Murakami,
H. Otake,
K. Masuda,
S. Seki,
H. Kudo,
Preview
|
PDF (204KB)
|
|
摘要:
The diffusion profile of Hg in CdTe crystals was observed by means of heavy ion (40 MeV O5+) backscattering. The near‐surface region of CdTe immersed in Hg was investigated up to 1.4 &mgr;m from the surface. The observed Hg profile indicated that the concentration of Hg atom at the surface reached 4×1020cm−3and the distribution was interpreted by a simple diffusion model. Temperature dependence of the diffusion coefficient was determined to beD=5×103 exp[(−2.0±0.3) eV/kT] (cm2/s). In the case of CdTe immersed in Hg which contained a small amount of Cd, it was found that Hg diffusion did not occur. These experimental facts suggest that the rate of Hg diffusion is controlled by the diffusion of a Cd vacancy which is introduced by the outdiffusion of Cd atoms from CdTe crystals.
ISSN:0003-6951
DOI:10.1063/1.94595
出版商:AIP
年代:1984
数据来源: AIP
|
24. |
Nonlinear carrier dynamics in GaxIn1−xAsyP1−ycompounds |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 999-1001
E. Wintner,
E. P. Ippen,
Preview
|
PDF (245KB)
|
|
摘要:
The nonlinear recovery dynamics of optically excited carriers in thin layer samples of GaInAsP (1.3 &mgr;m, 1.55 &mgr;m) and GaInAs (1.65 &mgr;m) have been studied by picosecond optical pump‐probe measurements of absorption bleaching using pulses at 1.06 &mgr;m for both pump and probe. An evaluation of the data was performed by a careful computer model which takes into account the temporal development of the carrier density and absorption, the spatial averaging of the bleaching, and a convolution with the probe beam. The effective Auger coefficients, determined as curve fitting parameters, were found to beA(1.3 &mgr;m)=1.5×10−29cm6/s,A(1.55 &mgr;m) =7.5×10−29cm6/s, andA(1.65 &mgr;m)=9.8×10−29cm6/s.
ISSN:0003-6951
DOI:10.1063/1.94596
出版商:AIP
年代:1984
数据来源: AIP
|
25. |
Schottky‐barrier height of ideal metal contacts to GaAs |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 1002-1004
J. R. Waldrop,
Preview
|
PDF (235KB)
|
|
摘要:
The Schottky‐barrier height &fgr;Bof ideal (no interfacial oxide) contacts to GaAs has been measured for a diverse group of eleven metals, Cu, Pd, Ag, Au, Al, Ti, Pb, Bi, Ni, Cr, and Fe, by using current‐voltage and capacitance‐voltage techniques. The contacts were formed by metal evaporation in ultrahigh vacuum onto clean (100) surfaces of bothn‐type andp‐type GaAs. Forn‐type contacts &fgr;Branged from 0.96 to 0.72 eV, in the metal order listed above; forp‐type contacts &fgr;Branged from 0.45 to 0.62 eV. No simple correlation was found between &fgr;Band metal work function nor between &fgr;Band the chemical reactivity at the metal‐GaAs interface.
ISSN:0003-6951
DOI:10.1063/1.94599
出版商:AIP
年代:1984
数据来源: AIP
|
26. |
Triple ion implantation technique for formation of shallownpnbipolar transistor structures in silicon |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 1005-1007
B‐Y. Tsaur,
J. D. Woodhouse,
Preview
|
PDF (246KB)
|
|
摘要:
Shallow‐emitter, narrow‐basenpnbipolar transistor structures have been obtained by implantation of B+and As+ions into amorphous Si layers formed by the prior implantation of Si+ions. Thermal annealing results in recrystallization of the amorphous layers by solid phase epitaxy and activation of the implanted dopant atoms. Emitter‐base junction depths and base widths of ∼0.10 &mgr;m, as determined by secondary ion mass spectroscopy analysis, have been achieved both for single‐crystal Si samples and for samples with poly‐Si emitter contacts. Transmission electron microscopy shows that the recrystallized layers are almost free of defects near the emitter‐base and base‐collector junctions. Discrete bipolar transistors with good electrical characteristics have been fabricated using this technique.
ISSN:0003-6951
DOI:10.1063/1.94600
出版商:AIP
年代:1984
数据来源: AIP
|
27. |
Miniature SQUID susceptometer |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 1008-1010
M. B. Ketchen,
T. Kopley,
H. Ling,
Preview
|
PDF (244KB)
|
|
摘要:
We present a new dc superconducting quantum interference device (SQUID) configured as a susceptometer for the study of the magnetic properties of small (<10 &mgr;m) particles and thin‐film samples. The SQUID consists of two series pick‐up loops wound in opposite sense over a hole in the groundplane and connected to remotely located tunnel junctions by low inductance transmission lines. An integrated field coil with provision for balance allows application of a magnetic field of 0–30 G to a sample positioned in either pick‐up loop. For an applied field of 5 G the device having an intrinsic energy sensitivity of ∼25 h is able to resolve the superconducting transition of a 5‐&mgr;m tin particle with a signal‐to‐noise ratio of ∼106.
ISSN:0003-6951
DOI:10.1063/1.94601
出版商:AIP
年代:1984
数据来源: AIP
|
28. |
Device fabrication by nanolithography and electroplating for magnetic flux quantization measurements |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 1011-1013
E. Kratschmer,
A. Erko,
V. T. Petrashov,
H. Beneking,
Preview
|
PDF (184KB)
|
|
摘要:
100‐keVe‐beam lithography and electroplating of gold have been used to fabricate a device for the measurement of quantum changes in magnetic flux. The structure is defined in a 200‐nm‐thick layer of a copolymer of methyl methacrylate and methacrylic acid (PMMA/MAA) on top of a Si wafer covered by 150 nm of Si3N4. The device is a square frame of 2×2 &mgr;m2and 100‐nm linewidth. Gold was electroplated to a thickness of 100 nm. This technique allows the fabrication of high resolution, high aspect ratio gold structures.
ISSN:0003-6951
DOI:10.1063/1.94602
出版商:AIP
年代:1984
数据来源: AIP
|
29. |
Demonstration of a new electrothermal thruster concept |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 1014-1016
S. Whitehair,
J. Asmussen,
S. Nakanishi,
Preview
|
PDF (228KB)
|
|
摘要:
The design and test of a microwave electrothermal thruster are described. The device, which employs a coaxial microwave discharge, was tested in nitrogen gas with 200–600 W of 2.45‐GHz input power. Experimental measurements of thrust, specific impulse, and energy efficiency are presented for different flow and discharge pressures. Measured energy efficiencies varied between 30%–60% and the performance compared favorably with other electrothermal thrusters operating in nitrogen gas. The experimental performance demonstrated the feasibility of the concept.
ISSN:0003-6951
DOI:10.1063/1.94603
出版商:AIP
年代:1984
数据来源: AIP
|
30. |
Intensity‐dependent photobleaching in thin polymer films by excimer laser: Lithographic implications |
|
Applied Physics Letters,
Volume 44,
Issue 10,
1984,
Page 1016-1018
James R. Sheats,
Preview
|
PDF (196KB)
|
|
摘要:
Strongly intensity‐dependent photobleaching was observed in polymethyl methacrylate films doped with acridine and irradiated by a KrF laser. The transmission of low intensity pulses (<2 MW/cm2) increased from <0.01% to 60% as the intensity of a single prior bleaching pulse increased from 3 to 4 MW/cm2. The implications of this result for image enhancement in excimer laser projection photolithography are discussed: features in the region of 0.2–0.3 &mgr;m may be printable by such techniques.
ISSN:0003-6951
DOI:10.1063/1.94604
出版商:AIP
年代:1984
数据来源: AIP
|
|