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21. |
p‐njunction diodes in InP and In1−xGaxAsyP1−yfabricated by beryllium‐ion implantation |
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Applied Physics Letters,
Volume 34,
Issue 3,
1979,
Page 229-231
C. A. Armiento,
J. P. Donnelly,
S. H. Groves,
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摘要:
Mesa and planar InPp‐njunction diodes have been fabricated by beryllium‐ion implantation. These devices exhibit abrupt reverse‐bias breakdowns and low leakage currents. Similar mesa diodes have been produced in In1−xGaxAsyP1−y(Eg≈1.0 eV). Diodes operated in the punch‐through mode exhibited uniform breakdown over the area of the device, without any apparent edge effects.
ISSN:0003-6951
DOI:10.1063/1.90740
出版商:AIP
年代:1979
数据来源: AIP
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22. |
RED display structures having dynamic hysteresis characteristics |
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Applied Physics Letters,
Volume 34,
Issue 3,
1979,
Page 232-234
L. G. Van Uitert,
I. Camlibel,
R. M. DeLaRue,
T. R. Kyle,
R. Pawelek,
S. Singh,
H. J. Stocker,
G. J. Zydzik,
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摘要:
Display structures based on reversible electrodeposition (RED) in organic solvent based electrolytes containing tetra‐alkyl ammonium iodide, ammonium iodide, and silver iodide have been studied. Cells were made up with these electrolytes together with a mixed opacifier containing a semiconducting oxide (such as impure TiO2) and an insulator (such as a very fine zeolite powder). The cells develop bistable characteristics which permit operation with good contrast (between deep burgundy and white) at drive voltages of less than 2 V while operating at 0.5 Hz. Contrast ratio, optical density, efficiency, and memory time were measured. Probable mechanisms for the development of bistable characteristics and the nature of the deposits are discussed.
ISSN:0003-6951
DOI:10.1063/1.90748
出版商:AIP
年代:1979
数据来源: AIP
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23. |
Electronic density of states in discharge‐produced amorphous silicon |
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Applied Physics Letters,
Volume 34,
Issue 3,
1979,
Page 234-236
M. Hirose,
T. Suzuki,
G. H. Do¨hler,
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摘要:
The localized state density distribution in the mobility gap of glow‐discharge amorphous silicon has been determined from capacitance‐voltage characteristics for metal/oxide/amorphous silicon (MOS) structures. This new method provides a smooth distribution of localized states throughout the mobility gap. The density of states increases from a minimum of the order of 1016cm−3 eV−1near midgap to more than 1018–1019cm−3 eV−1within 0.2 eV of the band edges.
ISSN:0003-6951
DOI:10.1063/1.90749
出版商:AIP
年代:1979
数据来源: AIP
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24. |
Application of selective chemical reaction concept for controlling the properties of oxides on GaAs |
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Applied Physics Letters,
Volume 34,
Issue 3,
1979,
Page 237-238
R. P. H. Chang,
J. J. Coleman,
A. J. Polak,
L. C. Feldman,
C. C. Chang,
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摘要:
We demonstrate how GaAs can be selectively oxidized in a plasma to control the physical and chemical properties of the oxides. Electrical measurements indicate that charged traps can be removed.
ISSN:0003-6951
DOI:10.1063/1.90750
出版商:AIP
年代:1979
数据来源: AIP
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25. |
Direct observation of two‐dimensional lattice mismatch parallel to the interfacial boundary between the LPE Ga0.65Al0.35As layer and the GaAs substrate |
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Applied Physics Letters,
Volume 34,
Issue 3,
1979,
Page 239-240
Shih‐Lin Chang,
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PDF (125KB)
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摘要:
Previously unreported two‐dimensional lattice mismatch in planes parallel to the interfacial boundary between the (001) Ga0.65Al0.35As epitaxial layer and the GaAs substrate has been observed by utilizing a four‐beam, (000), (400), (220), and (22¯0), simultaneous Borrmann diffraction of x rays. The shifts of the reflection bands of the layer from the reflection lines of the substrate indicate that shear stresses exist in 〈100〉 and 〈010〉 directions and that the corresponding strains vary continuously along the thickness direction of the epilayer.
ISSN:0003-6951
DOI:10.1063/1.90751
出版商:AIP
年代:1979
数据来源: AIP
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26. |
Mechanical properties ofinsitumultifilamentary Nb3Sn superconducting wires |
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Applied Physics Letters,
Volume 34,
Issue 3,
1979,
Page 241-243
S. Foner,
R. Roberge,
E. J. McNiff,
B. B. Schwartz,
J. L. Fihey,
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摘要:
The mechanical properties ofinsituCu–36 wt&percent; Nb–xwt&percent; Sn superconducting wires are presented where 5<x<20 wt&percent; Sn. For highx, no degradation of critical currentJcis observed for stresses &sgr; up to 700 MPa (∼100 ksi) and a maximumJcoccurs at &sgr;≃450 MPa. Strains of ∼0.6–0.9&percent; are measured at 300 and 77 K for 450 MPa, and ∼1.5–2&percent; for 700 MPa. Cyclic stress data are consistent with a prestress model for composite materials.
ISSN:0003-6951
DOI:10.1063/1.90752
出版商:AIP
年代:1979
数据来源: AIP
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