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31. |
Dense Bi‐Sr‐Ca‐Cu‐O superconducting films prepared by spray pyrolysis |
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Applied Physics Letters,
Volume 54,
Issue 10,
1989,
Page 957-959
H. M. Hsu,
I. Yee,
J. DeLuca,
C. Hilbert,
R. F. Miracky,
L. N. Smith,
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摘要:
Dense oriented superconducting Bi‐Sr‐Ca‐Cu‐O films having zero resistance as high as 100 K have been made using a technique in which spray deposited and pyrolyzed films are densified by either melt quenching or flux sintering. The highestTcfilms were those prepared with PbO as a dopant/flux on MgO substrates. Films without lead doping prepared on both BeO and MgO substrates yielded resistive transitions of 81–83 K. For these latter films, it was demonstrated that a subsequent anneal in argon enhanced theTcto 87 K. The films were characterized by x‐ray diffraction, scanning electron microscopy, and four‐point probe resistance measurements. The critical current density of a film having aTcof 81 K was 4000 A/cm2at 78 K and 14 000 A/cm2at 55K.
ISSN:0003-6951
DOI:10.1063/1.100778
出版商:AIP
年代:1989
数据来源: AIP
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32. |
Detection of surface (∼1 &mgr;m) impurity phases in highTcsuperconductors |
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Applied Physics Letters,
Volume 54,
Issue 10,
1989,
Page 960-962
D. W. Cooke,
M. S. Jahan,
J. L. Smith,
M. A. Maez,
W. L. Hults,
I. D. Raistrick,
D. E. Peterson,
J. A. O’Rourke,
S. A. Richardson,
J. D. Doss,
E. R. Gray,
B. Rusnak,
G. P. Lawrence,
C. Fortgang,
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摘要:
We show that thermally stimulated luminescence is an important method for detecting insulating impurity phases that commonly occur in highTcsuperconductors. The technique is sensitive to impurity phases at <1% level with a probe depth of ∼ 1 &mgr;m, which is the region of interest for many superconductor applications. Samples of Y2O3, Y2BaCuO5, YBa2Cu3O6.2, BaCO3, Ba3CuO4, BaCuO2, and YBa2Cu3Ox(x≊7) were investigated. All but the high quality sintered pellets of YBa2Cu3Oxexhibited relatively intense luminescence. The absence of luminescence, and thus of insulating phases, is correlated with low values of rf surface resistance.
ISSN:0003-6951
DOI:10.1063/1.101419
出版商:AIP
年代:1989
数据来源: AIP
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33. |
Lorentz microscopy on dynamically written domains in GdTbFe |
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Applied Physics Letters,
Volume 54,
Issue 10,
1989,
Page 963-964
F. J. A. M. Greidanus,
B. A. J. Jacobs,
F. J. A. den Broeder,
J. H. M. Spruit,
M. Rosenkranz,
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摘要:
In this letter a new method for the observation of thermomagnetically written domains using Lorentz electron microscopy is discussed. Domains are written in a GdTbFe layer deposited on a specially prepared silicon wafer disk, provided with Si3N4windows. This allows direct observation by Lorentz microscopy of the magnetization patterns dynamically written under recording conditions. It is shown that by locally heating the GdTbFe layer with a continuous laser beam, combined with high‐frequency switching of the magnetic field, very high storage densities can be achieved. Domains with a length of 0.25 &mgr;m in the direction of disk rotation could be written.
ISSN:0003-6951
DOI:10.1063/1.101420
出版商:AIP
年代:1989
数据来源: AIP
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34. |
Dielectric properties of silicon oxynitride films |
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Applied Physics Letters,
Volume 54,
Issue 10,
1989,
Page 965-967
G. A. Niklasson,
T. S. Eriksson,
K. Brantervik,
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摘要:
We have measured the frequency‐dependent complex dielectric permittivity of silicon oxynitride films in the frequency range 10−4–107Hz for temperatures of 290–365 K. The dielectric permittivity displays a conductivity relaxation at low frequencies and gradually goes over to an almost frequency‐independent complex permittivity at high frequencies. The experimental data can be accounted for by assuming that the conductivity relaxation is superimposed on the frequency‐independent contribution to the permittivity. On that premise, the conductivity relaxation and the onset of dc conductivity are in good agreement with calculations by the continuous time random walk model employing a distribution of transition rates pertinent to a fractal time process.
ISSN:0003-6951
DOI:10.1063/1.100779
出版商:AIP
年代:1989
数据来源: AIP
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35. |
Erratum: Reinvestigation of the carbon films prepared by ArF excimer laser‐induced chemical vapor deposition [Appl. Phys. Lett.53, 1812 (1988)] |
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Applied Physics Letters,
Volume 54,
Issue 10,
1989,
Page 968-968
Katsuki Kitahama,
Kazuhiko Hirata,
Hirohide Nakamatsu,
Shichio Kawai,
Naoji Fujimori,
Takahiro Imai,
Hiroshi Yoshino,
Akira Doi,
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PDF (44KB)
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ISSN:0003-6951
DOI:10.1063/1.101380
出版商:AIP
年代:1989
数据来源: AIP
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