摘要:

Thin films of a photosensitive material based on polymethyl methacrylate have been fabricated on glass substrates. By illumination with light of a photoresist illuminator (300–450 nm) the material can be etched out in the illuminated areas. Film thicknessdchanges from, e.g., 12 to 4 &mgr;m after 20‐min illumination. Simultaneously the refractive indexndecreases by 2×10−2. Additional annealing treatment causes little further development ofnanddpatterns. Spatial resolution is limited by lithographic technique and is smaller than 1 &mgr;m.

ISSN:0003-6951    

DOI:10.1063/1.95006

出版商:AIP    

年代:1984

数据来源: AIP

摘要:

A new effect which allows direct formation of thin metal films of controlled morphology is described. Patterns of glass‐ceramic opal are developed in photosensitive glass samples by UV irradiation and heat treatment. The samples are then ion exchanged in molten salt baths containing Ag+or Cu+ions. On subsequent firing in a hydrogen atmosphere, continuous films with typical thin metal films properties grow on the opal regions of the samples. Discontinuous films, characterized by activated resistivities and switching, grow on the glassy regions.

ISSN:0003-6951    

DOI:10.1063/1.95007

出版商:AIP    

年代:1984

数据来源: AIP