41. |
Bistability of donor‐hydrogen complexes in silicon: A mechanism for debonding |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1773-1775
S. K. Estreicher,
C. H. Seager,
R. A. Anderson,
Preview
|
PDF (432KB)
|
|
摘要:
The {D,H}+complex in silicon, with D=P or As, is studied near theabinitioHartree–Fock level. The results show that the transitions between {D,H}0and {D,H}+involve a drastic change in the equilibrium geometry and electronic structure of the complex. The implications of these results on the observed dependence of the debonding rates on majority‐ and minority‐carrier concentrations for both As and P donors are discussed.
ISSN:0003-6951
DOI:10.1063/1.106196
出版商:AIP
年代:1991
数据来源: AIP
|
42. |
Blue Stark shifts in (InAs)1−x(GaSb)x‐AlSb superlattices |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1776-1778
K. B. Wong,
M. Jaros,
Preview
|
PDF (449KB)
|
|
摘要:
We demonstrate that the electronic structure of (InAs)1−x(GaSb)x‐AlSb superlattices can be engineered so that the application of an external electric fieldincreasesthe superlattice gap. We find that such a blue Stark shift can only be achieved in thin layer superlattices.
ISSN:0003-6951
DOI:10.1063/1.106197
出版商:AIP
年代:1991
数据来源: AIP
|
43. |
Anomalous electrical behavior related to the formation of TeAsV−Gadefect complexes in laser mixed Au/Te/Au/GaAs structures |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1779-1781
K. Wuyts,
J. Watte´,
R. E. Silverans,
M. Van Hove,
M. Van Rossum,
Preview
|
PDF (403KB)
|
|
摘要:
The ohmic contact formation mechanism in pulsed laser beam mixed Au/Te/Au/GaAs structures has been investigated by129I Mo¨ssbauer spectroscopy. Low‐resistance, ohmic contact structures, on bothn‐ andp‐type GaAs, were found to be correlated to the formation of a high density of defect complexes consisting of tellurium atoms quasi‐substitutional on arsenic sites with a gallium vacancy in the first neighbor shell. Correspondingly, the ohmic conduction is suggested to occur according to the amorphous heterojunction model, i.e., by a multi‐step recombination‐tunneling process.
ISSN:0003-6951
DOI:10.1063/1.106198
出版商:AIP
年代:1991
数据来源: AIP
|
44. |
Ferroelectric bismuth titanate/superconductor (Y‐Ba‐Cu‐O) thin‐film heterostructures on silicon |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1782-1784
R. Ramesh,
A. Inam,
B. Wilkens,
W. K. Chan,
T. Sands,
J. M. Tarascon,
D. K. Fork,
T. H. Geballe,
J. Evans,
J. Bullington,
Preview
|
PDF (397KB)
|
|
摘要:
The growth by pulsed‐laser deposition ofc‐axis‐oriented bismuth titanate (BTO)/YBa2Cu3O7(YBCO) superconductor heterostructures on [001]‐oriented Si with epitaxial yttria‐stabilized ZrO2as a buffer layer is reported. X‐ray‐diffraction studies of the heterostructures show that all the layers grow in thec‐axis orientation, with a rocking angle of 1.0°–1.2° for the bismuth titanate layer and 0.6°–0.8° for the YBCO layer. Rutherford backscattering ion channeling yields of 28% at the surface have been obtained. Transmission electron microscopy of cross‐sectioned samples reveal that the BTO layer has a significant density of translational boundaries that propagate at 45° to the film surface. The BTO film exhibits ferroelectric hysteresis and a dielectric constant in the range of 180–200.
ISSN:0003-6951
DOI:10.1063/1.106199
出版商:AIP
年代:1991
数据来源: AIP
|
45. |
Superconducting YBa2Cu3O7−&dgr;thin films on Si (100) substrates with CoSi2buffer layers by aninsitupulsed laser evaporation method |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1785-1787
Ashok Kumar,
J. Narayan,
Preview
|
PDF (462KB)
|
|
摘要:
We have prepared high‐qualityc‐axis oriented superconducting YBa2Cu3O7−&dgr;thin films on Si (100) substrates with CoSi2buffer layers byinsitupulsed laser ablation processing. The films were characterized by x‐ray diffraction, four‐point ac electrical resistivity, scanning electron microscopy (SEM), and transmission electron microscopy (TEM) techniques. YBa2Cu3O7−&dgr;films were found to be textured withcaxis perpendicular to the substrate. A plot of normalized resistance against temperature exhibited a metallic behavior followed by an onset superconducting transition at 91 K with zero resistance temperature (Tc0) of 83 K. Cross‐sectioned TEM results showed quite smooth interface between CoSi2and Si with little interdiffusion; however, a reacted zone was observed between CoSi2and YBa2Cu3O7−&dgr;layers.
ISSN:0003-6951
DOI:10.1063/1.106200
出版商:AIP
年代:1991
数据来源: AIP
|
46. |
Experimental evidence of magnetostatic soliton propagation at microwave frequencies |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1788-1789
M. Dragoman,
D. Georgescu,
Preview
|
PDF (284KB)
|
|
摘要:
The experimental results of magnetostatic soliton propagation at microwave frequencies are compared with a numerical nonlinear model. Despite the conclusions of the experimental results, it is shown that the output power behavior as a function of the input power represents the main signature of the soliton existence in the magnetic films.
ISSN:0003-6951
DOI:10.1063/1.106201
出版商:AIP
年代:1991
数据来源: AIP
|
47. |
Excimer‐laser‐induced sub‐0.5‐&mgr;m patterning of WO3thin films |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1790-1792
M. Rothschild,
A. R. Forte,
Preview
|
PDF (496KB)
|
|
摘要:
Amorphous WO3thin films have been deposited in a plasma‐enhanced chemical vapor deposition system, and were patterned with a 193‐nm excimer laser (one pulse, 10–25 mJ/cm2). Negative‐tone, sub‐0.5‐&mgr;m lines and spaces were obtained following dry development in a low‐power CF4plasma. The mechanism for laser‐induced etch selectivity was studied with angle‐resolved x‐ray photoelectron spectroscopy. It was inferred from the fluorine photoelectron spectra that the laser induces atomic rearrangements that impede the etch process initiated by fluorine‐containing radicals. A possible interpretation is that the rearrangements, which may be partially thermally activated, reduce the volume of the microvoids present in WO3.
ISSN:0003-6951
DOI:10.1063/1.106202
出版商:AIP
年代:1991
数据来源: AIP
|
48. |
Etching of aluminum film by hydrogen atoms |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1793-1795
M. Hara,
K. Domen,
T. Onishi,
H. Nozoye,
Preview
|
PDF (315KB)
|
|
摘要:
The reaction between hydrogen atoms and an ultrathin aluminum film (2 monolayer) on a Mo(111) substrate was studied by thermal desorption (TD) and Auger electron spectroscopy (AES). Through TD experiments for the hydrogen precovered aluminum films, desorption of aluminum hydride was observed at 370 K. It was confirmed that 1/3 monolayer of aluminum was desorbed as aluminum hydrides after a TD experiment for the aluminum film on which hydrogen was preadsorbed to a full monolayer coverage. The aluminum film was continuously etched at 410 K by a steady flow of hydrogen atoms. These results indicate the potential capability of hydrogen atoms as a selective etchant for aluminum.
ISSN:0003-6951
DOI:10.1063/1.106203
出版商:AIP
年代:1991
数据来源: AIP
|
49. |
Response to ‘‘Comment on ‘Photoluminescence study of sulfide layers onp‐tynpe InP’ ’’ |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1796-1797
R. Leonelli,
C. S. Sundararaman,
J. F. Currie,
Preview
|
PDF (213KB)
|
|
ISSN:0003-6951
DOI:10.1063/1.106205
出版商:AIP
年代:1991
数据来源: AIP
|
50. |
Erratum: Simplified scattering coefficient expressions for a spherical particle located on the propagation axis of a fifth‐order Gaussian beam [Appl. Phys. Lett.55, 2709 (1989)] |
|
Applied Physics Letters,
Volume 59,
Issue 14,
1991,
Page 1798-1798
Scott A. Schaub,
John P. Barton,
Dennis R. Alexander,
Preview
|
PDF (49KB)
|
|
ISSN:0003-6951
DOI:10.1063/1.106368
出版商:AIP
年代:1991
数据来源: AIP
|