摘要:

Line and dot patterns with about a 100 nm period are exposed on poly‐methyl methacrylate (PMMA) resist by electron holographic lithography with a W⟨100⟩ thermal field emission (TFE) gun and an electron biprism. Subsequent atomic force microscope (AFM) observation has confirmed that both patterns are successfully fabricated. This technique allows one to produce nanoscale periodic patterns simultaneously, whose spacing could be, in principle, comparable to a lattice spacing. ©1995 American Institute of Physics. 

ISSN:0003-6951    

DOI:10.1063/1.113646

出版商:AIP    

年代:1995

数据来源: AIP

摘要:

We demonstrate the use of microcantilevers coated with ultraviolet cross‐linking polymers as optical radiation dosimeters. Upon exposure to radiation, a treated cantilever bends due to stress and its resonance frequency increases due to stiffening. These phenomena can be used to develop sensitive radiation dosimeters which respond to radiation affecting the mechanical properties of the selected coating.

ISSN:0003-6951    

DOI:10.1063/1.113647

出版商:AIP    

年代:1995

数据来源: AIP

ISSN:0003-6951    

DOI:10.1063/1.114225

出版商:AIP    

年代:1995

数据来源: AIP