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41. |
Perpendicular giant magnetoresistance of NiFe/Cu multilayered nanowires |
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Applied Physics Letters,
Volume 70,
Issue 3,
1997,
Page 396-398
S. Dubois,
C. Marchal,
J. M. Beuken,
L. Piraux,
J. L. Duvail,
A. Fert,
J. M. George,
J. L. Maurice,
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摘要:
We have prepared by electrodepositionNi80Fe20/Cumultilayered nanowires into the pores of polymer membranes and performed giant magnetoresistance (GMR) measurements in the current perpendicular to the layer planes geometry. GMR ratios as high as 80&percent; have been obtained at 4.2 K. Two types of structure have been studied: conventionalNi80Fe20/Cumultilayers and multilayers composed ofNi80Fe20/Cu/Ni80Fe20trilayers magnetically isolated by long Cu rods. ©1997 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.118385
出版商:AIP
年代:1997
数据来源: AIP
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42. |
X-ray photoelectron spectroscopy study ofAl/Ta2O5andTa2O5/Alburied interfaces |
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Applied Physics Letters,
Volume 70,
Issue 3,
1997,
Page 399-401
K. Chen,
G. R. Yang,
M. Nielsen,
T. M. Lu,
E. J. Rymaszewski,
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摘要:
Buried interfaces of thinAl/Ta2O5andTa2O5/Alfilms were studied using the x-ray photoelectron spectroscopy technique. The peak decomposition technique was employed to identify the composition and chemical states at the interface region. It was observed that there is an “intermixing layer” at theAl/Ta2O5interface, whereTa2O5has been reduced to lower binding energy states due to the reaction of Al withTa2O5during deposition. On the other hand, theTa2O5/Alinterface is relatively stable, consisting ofTa2O5andAl2O3interfacial layers. Based on a uniform multilayer structure model, the thickness of the interfacial layers was estimated by using the relative photoelectron intensities. ©1997 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.118386
出版商:AIP
年代:1997
数据来源: AIP
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