摘要:

Measurements on 22 different conductor samples, and numerical calculations based on Chambers’ kinetic formulation show conclusive evidence for the existence of a substantial size effect on the longitudinal resistivity of multifilamentary superconducting wires in the normal state. This may have important consequences for the design of such conductors.

ISSN:0003-6951    

DOI:10.1063/1.94043

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

A new superconducting transistor has been investigated, both theoretically and experimentally. The device has a current gain of 10 and an estimated power‐delay product of 90 aJ. It is shown that in principle, the gain of the device is limited only by its length. Possible applications include analog amplification and digital logic.

ISSN:0003-6951    

DOI:10.1063/1.94044

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

Numerical integration of the perturbed sine‐Gordon equation describing a long overlap‐geometry Josephson junction in a magnetic field indicates a branched structure of the first Fiske step. The major portion of the step corresponds to a simply periodic fluxon oscillation whereas the branches are characterized by subharmonic generation.

ISSN:0003-6951    

DOI:10.1063/1.94045

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

We present an experimental investigation of our earlier theoretical predictions regarding the signal‐to‐noise ratio for magneto‐optic readout from quadrilayer structures in a differential detection scheme. Using quadrilayer structures employing amorphous Tb‐Fe alloys as the magnetic material, quartz as the dielectric material, and aluminum as the reflecting material, we show that the signal enhancement predicted for quadrilayers occurs even when the numerical aperture of the readout system is large, a crucial result for their effectiveness in magneto‐optic storage applications. We also show that the signal‐to‐noise ratios measured are in quantitative agreement with theory.

ISSN:0003-6951    

DOI:10.1063/1.94046

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

An extension of superparamagnetic superposition analysis is used to show a crystallite size effect on the magnetic moment density of nickel dispersed on silica. A clear effect on room‐temperature moment density is seen for samples with crystallites much less than 3 nm in radius.

ISSN:0003-6951    

DOI:10.1063/1.94047

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

Electron holography was employed for experiments involving a high‐density magnetic recording, in which it was possible to directly observe streams of magnetic flux. The magnetic flux distribution in recorded films, and the maximum packing density in high‐coercivity evaporated cobalt film were investigated. With magnetic longitudinal recording the resultant highest density was 170 000 bits per inch. This experiment has proven that electron holography is useful for the study of magnetic recording.

ISSN:0003-6951    

DOI:10.1063/1.94048

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

We have used a fluorescence technique to make a noncontact surface‐temperature measurement on a thin film of glass resin as it is etched away in a reactive‐ion‐etching chamber. The glass resin is heavily doped with a fluorescent material whose fluorescence lifetime is temperature dependent. The fluorescence is excited and collected through a remote optical fiber, and the lifetime is measured using a phase‐shift technique. The calibration reproducibility of this measurement is about ±1 °C. The fluorescent glass‐resin film could be used as an underlayer for monitoring the etching of overlying oxides, photoresists, or patterned metallizations, or a photoresist itself could be doped with the fluorescer. This demonstration opens up the possibility of surface temperature measurement in a wide variety of harsh environments.

ISSN:0003-6951    

DOI:10.1063/1.94049

出版商:AIP    

年代:1983

数据来源: AIP

摘要:

We describe a new approach to the lithography of thin films and thin‐film devices. Instead of fully exposing a pattern in, for example, electron beam or ion beam lithography, only the outlines of individual features in the pattern are exposed, leaving the completion of the features to a later processing step which is novel in concept but compatible with conventional processing. This approach can potentially reduce exposure time considerably, reduce proximity effects in the exposure process and reduce electron damage to the substrate. As a specific example we describe a process applicable to electron beam fabrication of chrome master masks for photolithography.

ISSN:0003-6951    

DOI:10.1063/1.94050

出版商:AIP    

年代:1983

数据来源: AIP

ISSN:0003-6951    

DOI:10.1063/1.94116

出版商:AIP    

年代:1983

数据来源: AIP