41. |
Beam target interaction during growth of YBa2Cu3O7−xby the laser ablation technique |
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Applied Physics Letters,
Volume 59,
Issue 17,
1991,
Page 2186-2188
A. Cohen,
P. Allenspacher,
M. M. Brieger,
I. Jeuck,
H. Opower,
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摘要:
It was proven by powder x‐ray diffractometry and by energy dispersive x‐ray analysis (EDX) that after ablation of the ceramic YBa2Cu3O7−xtarget by the excimer laser pulses the original composition of the target remained unchanged. The depth of ablation was measured as a function of the energy density of the laser beam. The absorption coefficient for ablation, in case of ceramic material with a density of 5.4 g/cm3, was &agr;=4.45×104cm−1and the minimum energy density was 2.5 J/cm2. The temperature that the ablated material was subjected to, in the energy range of 2.5–3.4 J/cm2, did not exceed 970 °C.<l >
ISSN:0003-6951
DOI:10.1063/1.106068
出版商:AIP
年代:1991
数据来源: AIP
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42. |
High‐speed magnetization reversal near the compensation temperature of amorphous GdTbFe |
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Applied Physics Letters,
Volume 59,
Issue 17,
1991,
Page 2189-2191
M. Aeschlimann,
A. Vaterlaus,
M. Lutz,
M. Stampanoni,
F. Meier,
H. C. Siegmann,
S. Klahn,
P. Hansen,
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摘要:
Using spin‐polarized photoemission with a pulsed laser as light source, it is shown that the time for a thermally induced magnetization reversal depends critically on the temperature of the sample. For amorphous GdTbFe the time is shorter (longer) than the duration of the 16 ns laser pulses if the initial temperature is below (above) the compensation temperature.
ISSN:0003-6951
DOI:10.1063/1.106069
出版商:AIP
年代:1991
数据来源: AIP
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43. |
50 nm linewidth platinum sidewall lithography by effusive‐source metal precursor chemical deposition and ion‐assisted etching |
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Applied Physics Letters,
Volume 59,
Issue 17,
1991,
Page 2192-2194
David S. Y. Hsu,
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摘要:
Vertical platinum sidewall structures 50 nm thick and 700 nm tall have been fabricated by Pt deposition from the thermal decomposition of tetrakis‐(trifluorophosphine)‐platinum using an effusive gas source followed by ion‐assisted etching. Scanning electron microscope micrographs show that the sidewalls have high uniformity, very fine grains, and very sharp contours, demonstrating a high degree of conformal deposition. Scanning Auger microscopy confirms the presence of platinum only in the sidewalls. X‐ray photoelectron spectroscopy analysis of the as‐deposited platinum film reveals no detectable impurity and Scotch tape test shows good bonding of the film. The method is suitable to large‐scale processing.
ISSN:0003-6951
DOI:10.1063/1.106070
出版商:AIP
年代:1991
数据来源: AIP
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