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41. |
Optimum tunnel barrier in ferromagnetic–insulator–ferromagnetic tunneling structures |
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Applied Physics Letters,
Volume 70,
Issue 22,
1997,
Page 3050-3050
Jagadeesh S. Moodera,
Elizabeth F. Gallagher,
Keziah Robinson,
Janusz Nowak,
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摘要:
Al2O3tunnel barriers I, formed by the oxidization of Al metal of various thicknesses between two ferromagnetic (FM) films were investigated to understand the influence of overlayer metal Al on the junction magnetoresistance (JMR). The optimum thickness of Al was observed to lie in the range of 1–1.6 nm to achieve good JMR in FM–I–FM junctions. Additionally, such junctions can be used to study the magnetic proximity effect in ferromagnet/normal metal bilayer systems. ©1997 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.118168
出版商:AIP
年代:1997
数据来源: AIP
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42. |
Improvement of leakage currents ofPt/(Ba, Sr)TiO3/Ptcapacitors |
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Applied Physics Letters,
Volume 70,
Issue 22,
1997,
Page 3053-3055
Jae-Hyun Joo,
Jeong-Min Seon,
Yoo-Chan Jeon,
Ki-Young Oh,
Jae-Sung Roh,
Jae-Jeong Kim,
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摘要:
Pt/(Ba, Sr)TiO3/Ptcapacitors fabricated by sputtering technique showed abnormally higher leakage current when negative bias was applied to the top electrode. In this letter, two kinds of processes were attempted to reduce high leakage current of Pt/BST/Pt capacitors for dynamic random access memory devices: (1) postannealing underO2atmosphere and (2) adding oxygen into sputtering gas of platinum top electrode. These processes were very effective to reduce the oxygen vacancy in the BST films which are mostly responsible for such a high leakage current. The higher reverse currents were significantly lowered by these processes, so that we could obtain symmetric current versus voltage curves of Pt/BST/Pt capacitors. ©1997 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.118746
出版商:AIP
年代:1997
数据来源: AIP
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