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41. |
A source of hyperthermal neutrals for materials processing |
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Applied Physics Letters,
Volume 71,
Issue 7,
1997,
Page 980-982
M. J. Goeckner,
T. K. Bennett,
S. A. Cohen,
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摘要:
In this letter, we describe a unique method of producing hyperthermal neutrals for material processing. The hyperthermal neutrals are produced by accelerating ions across a sheath from a plasma onto a surface. On impact, the ions are neutralized and reflected with∼50&percent;of their incident energy. These neutrals then bounce off of additional surfaces prior to impacting the target. This unique multiple bounce system was developed for the following reasons: to reduce contamination from sputtered surface material, improve beam uniformity, and reduce UV radiation in the beam path. As a test of this method, we built a prototype beam source and used it to ash photoresist at rates up to 0.022 &mgr;m/min. These rates are consistent with a predicted neutral beam flux,2×1014 cm−2 s−1.In addition, a simple model is used to indicate that this method is capable of producing economically acceptable ash rates. Comparisons with other neutral-beam production methods are made. ©1997 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.119706
出版商:AIP
年代:1997
数据来源: AIP
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42. |
Single-crystal Si field emitter fabricated by anodization |
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Applied Physics Letters,
Volume 71,
Issue 7,
1997,
Page 983-985
Katsuya Higa,
Kiyoaki Nishii,
Tanemasa Asano,
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摘要:
A process for fabrication of field emitter arrays using anodization of single-crystal Si is demonstrated, when anodization is carried out in the dark on Si havingn/pjunctions, porous Si is preferentially formed in thep-type region. A needlelike tip structure can be formed beneath the unanodizedn-type Si layer, since the anodization proceeds almost isotropically. The porous region can be easily oxidized and selectively removed by chemical etching. The shape of emitter can be controlled by changing the dimension of then/pjunction and varying the resistivity ofp-type region. Fabrication of an emitter array and its field emission characteristic are reported. ©1997 American Institute of Physics.
ISSN:0003-6951
DOI:10.1063/1.119707
出版商:AIP
年代:1997
数据来源: AIP
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43. |
Erratum: “Distributed feedback quantum cascade lasers” [Appl. Phys. Lett.70, 2670 (1997)] |
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Applied Physics Letters,
Volume 71,
Issue 7,
1997,
Page 986-986
Je´ro⁁me Faist,
Claire Gmachl,
Federico Capasso,
Carlo Sirtori,
Deborah L. Sivco,
James N. Baillargeon,
Alfred Y. Cho,
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ISSN:0003-6951
DOI:10.1063/1.120561
出版商:AIP
年代:1997
数据来源: AIP
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