摘要:

The temperature of a thin photoresist layer on a silicon wafer was measuredinsituduring dry etching by using a silver halide optical fiber noncontact thermometer. A two‐bandpass radiometer was constructed to reduce errors arising from geometrical factors and emissivity changes. Such a system may be used to monitor surface temperatures during dry processing of semiconductors and to prevent overheating that may cause damage, such as cross linking of photoresists. ©1996 American Institute of Physics.

ISSN:0003-6951    

DOI:10.1063/1.116191

出版商:AIP    

年代:1996

数据来源: AIP

摘要:

We describe a technique for creating a thin polystyrene film containing a periodic array of cylindrical holes, with a hole size of approximately 13 nm and a lattice constant of 27 nm. The starting material is a polystyrene‐polybutadiene diblock copolymer, which self‐assembles into a hexagonally packed array of polybutadiene cylinders embedded in a polystyrene matrix. A technique described previously is used to orient the cylinders normal to the plane of the film. The polybutadiene domains are then removed by reaction with ozone, which attacks the double bonds in the polybutadiene backbone. Films of this type could potentially be used as templates for nanolithography on a scale not readily accessed by other techniques. ©1996 American Institute of Physics.

ISSN:0003-6951    

DOI:10.1063/1.116192

出版商:AIP    

年代:1996

数据来源: AIP

ISSN:0003-6951    

DOI:10.1063/1.116193

出版商:AIP    

年代:1996

数据来源: AIP

ISSN:0003-6951    

DOI:10.1063/1.116194

出版商:AIP    

年代:1996

数据来源: AIP

ISSN:0003-6951    

DOI:10.1063/1.116792

出版商:AIP    

年代:1996

数据来源: AIP