摘要:

A scanning interference electron microscope (SIEM) has been developed for periodical nanostructure fabrication. This system can produce electron interference fringes with a period from 2 nm to several tens of micrometers. Fabrications of periodical nanostructures with 23 to 170 nm periods have been demonstrated by transferring the electron interference fringe onto the semiconductor surfaces. ©1995 American Institute of Physics.

ISSN:0003-6951    

DOI:10.1063/1.113698

出版商:AIP    

年代:1995

数据来源: AIP