1. |
Photon avalanche upconversion laser at 644 nm |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1083-1085
M. E. Koch,
A. W. Kueny,
W. E. Case,
Preview
|
PDF (302KB)
|
|
摘要:
We have obtained efficient laser action from Pr‐doped LaCl3using a novel pumping method. Pump energy is coupled into the crystal through Pr ions in an excited state rather than the ground state. Excited‐state absorption is made possible by a regenerative feedback process (the photon avalanche) utilizing cross relaxation to convert the energy of a single ion in a high‐lying state into energy shared by multiple lower lying state ions.
ISSN:0003-6951
DOI:10.1063/1.103328
出版商:AIP
年代:1990
数据来源: AIP
|
2. |
Photorefractive self‐defocusing |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1086-1088
Mordechai Segev,
Yoav Ophir,
Baruch Fischer,
Preview
|
PDF (391KB)
|
|
摘要:
Self‐defocusing of a Gaussian light beam in a bulk photorefractive BaTiO3crystal is demonstrated. This is a low light intensity process which results from the coupling and power transfer between the spatial frequency components of the beam. We use this effect in photorefractive waveguide structure for all‐optical switching with very low light powers.
ISSN:0003-6951
DOI:10.1063/1.103329
出版商:AIP
年代:1990
数据来源: AIP
|
3. |
Band‐edge photorefractive effect in semiconductors |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1089-1091
Afshin Partovi,
Alan Kost,
Elsa M. Garmire,
George C. Valley,
Marvin B. Klein,
Preview
|
PDF (407KB)
|
|
摘要:
We report here for the first time, two‐beam coupling energy transfer using the Franz–Keldysh electrorefractive effect in photorefractive semiconductors. A large beam coupling gain coefficient (&Ggr;=2.8 cm−1) exceeding the absorption coefficient (&agr;=2.0 cm−1) is obtained in undoped semi‐insulating GaAs using the new photorefractive process. The new photorefractive process differs from conventional photorefractivity in that the direction of energy transfer is dictated by the direction of an externally applied electric field. Using a moving grating technique and combining the electrorefractive grating with the conventional electro‐optic grating, a very large gain &Ggr;=16.3 cm−1(&agr;=3 cm−1, crystal lengthl=4mm) resulting in net amplification by more than a factor of 200 has been demonstrated.
ISSN:0003-6951
DOI:10.1063/1.102576
出版商:AIP
年代:1990
数据来源: AIP
|
4. |
Operation of anX‐band dielectric Cherenkov maser amplifier |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1092-1094
E. Garate,
H. Kosai,
K. Evans,
A. Fisher,
R. Cherry,
W. Main,
Preview
|
PDF (283KB)
|
|
摘要:
A dielectric Cherenkov maser has operated as an amplifier at a frequency of 9.8 GHz. The amplifier consisted of an electron beam interacting with the TM01mode of a cylindrical, dielectric lined waveguide with the rf input provided by a tunable (9–10 GHz), 10 kW magnetron. The dielectric constant of the liner was 10 with inner and outer radii of 1.0 and 1.27 cm, respectively. At electron beam voltage and current of 190 kV and 90 A, respectively, the measured power gain of the amplifier was 11 dB over a 21 cm interaction length with a pulse length of approximately 1 &mgr;s.
ISSN:0003-6951
DOI:10.1063/1.102577
出版商:AIP
年代:1990
数据来源: AIP
|
5. |
Multielectrode quantum well laser for digital switching |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1095-1097
A. F. J. Levi,
R. N. Nottenburg,
R. A. Nordin,
T. Tanbun‐Ek,
R. A. Logan,
Preview
|
PDF (274KB)
|
|
摘要:
A multielectrode laser can be used to perform digital logic functions and threshold detection. In addition, the intrinsic gain in these devices allows control of lasing light output without using conventional high‐current electrical switches. Device potential is illustrated by demonstrating logicalandoperation (demultiplexing) at 1.5 Gbit s−1with a bit error rate of <10−11s−1.
ISSN:0003-6951
DOI:10.1063/1.102578
出版商:AIP
年代:1990
数据来源: AIP
|
6. |
Dynamic etch mask technique for fabricating tapered semiconductor optical waveguides and other structures |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1098-1100
A. Shahar,
W. J. Tomlinson,
A. Yi‐Yan,
M. Seto,
R. J. Deri,
Preview
|
PDF (310KB)
|
|
摘要:
Using a novel dynamic etch mask technique and wet chemical etchants, we have produced semiconductor structures with tapered thicknesses, with horizontal slope angles as small as 0.9°. With this technique we have fabricated GaAs/GaAlAs rib optical waveguides in which the etch depth tapered from 0.2 to 1.0 &mgr;m over a distance of 50 &mgr;m, resulting in a 2× change in mode size, with an excess taper loss of less than 0.2 dB. The technique is capable of producing tapers in different orientations, at arbitrary locations on a sample, and appears to be useful for a wide variety of materials systems and devices.
ISSN:0003-6951
DOI:10.1063/1.102579
出版商:AIP
年代:1990
数据来源: AIP
|
7. |
Thermal equilibrium behavior in inhomogeneous, undoped amorphous silicon |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1101-1103
Jin Jang,
Seung Kyu Lee,
Jae Boong Kim,
Hye Yong Chu,
Choochon Lee,
Preview
|
PDF (336KB)
|
|
摘要:
We report a new thermal equilibrium behavior in inhomogeneous, undoped amorphous silicon. The room‐temperature conductivity increases by two orders of magnitude compared with the annealed value just after fast cooling from above 180 °C. The decay of the excess conductivity follows (time)−1behavior, which is independent of the temperature. We suggest a possible explanation based on the material inhomogeneity.
ISSN:0003-6951
DOI:10.1063/1.102580
出版商:AIP
年代:1990
数据来源: AIP
|
8. |
Anomalous inductive effect in selenium Schottky diodes |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1104-1106
C. H. Champness,
W. R. Clark,
Preview
|
PDF (230KB)
|
|
摘要:
A region of anomalous negative capacitance has been observed with forward bias in Se‐Tl Schottky evaporated layer structures. The effect, which is more prevalent in diodes with lower series resistance, is due to an inductive contribution to the impedance that is believed to arise from high‐level injection of minority electrons into the bulk selenium.
ISSN:0003-6951
DOI:10.1063/1.102581
出版商:AIP
年代:1990
数据来源: AIP
|
9. |
Selective heteroepitaxial growth of Si1−xGexusing gas source molecular beam epitaxy |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1107-1109
Hiroyuki Hirayama,
Masayuki Hiroi,
Kazuhisa Koyama,
Toru Tatsumi,
Preview
|
PDF (344KB)
|
|
摘要:
Si1−xGexheteroepitaxial layers have been grown on Si(100) surfaces by gas source molecular beam epitaxy. Si2H6and GeH4were used as the Si and Ge source gases, respectively. The Ge mole fractionxin the grown film was found to be controlled by the GeH4flow rate. The growth rate decreased gradually with increasing GeH4flow rate. Selective epitaxial growth of Si1−xGexusing a SiO2mark on a Si(100) substrate was successfully achieved.
ISSN:0003-6951
DOI:10.1063/1.102582
出版商:AIP
年代:1990
数据来源: AIP
|
10. |
Linewidth of free excitons in quantum wells: Contribution by alloy disorder scattering |
|
Applied Physics Letters,
Volume 56,
Issue 12,
1990,
Page 1110-1112
P. K. Basu,
Preview
|
PDF (263KB)
|
|
摘要:
A theory is developed for the luminescence linewidth in a quantum well made of ternaries when the two‐dimensionally free excitons undergo alloy disorder scattering. The expression for linewidth shows aL−1dependence on the well widthLfor infinite barrier height. For thin wells leakage of wave function into the barrier is considered. A comparison between the experimental data and the present values points out the dominant role of alloy disorder scattering. For wells thinner than 40 A˚ the calculated values decrease with decreasing well width, indicating the importance of surface roughness scattering.
ISSN:0003-6951
DOI:10.1063/1.102583
出版商:AIP
年代:1990
数据来源: AIP
|