1. |
Phase gratings in Fe3+‐doped triglycine sulphate single crystals recorded in the ultraviolet spectral region |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2367-2369
G. Montemezzani,
J. Fousek,
P. Gu¨nter,
J. Stankowska,
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摘要:
Phase gratings have been recorded in ferroelectric triglycine sulphate crystals doped with iron by interference of two ultraviolet laser beams in the 350 nm wavelength range. The recording sensitivity increases with temperature and a diffraction efficiency exceeding 60% has been reached in a 5.5‐mm‐thick crystal after several hours of writing with intensities of 0.1 W/cm2. The photoinduced refractive index changes are anisotropic. The recording mechanism is not connected with the photorefractive effect and is believed to be due to the redistribution of hydrogen bonds leading to structural and refractive index modifications.
ISSN:0003-6951
DOI:10.1063/1.102917
出版商:AIP
年代:1990
数据来源: AIP
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2. |
Soft x‐ray lasing and its spatial characteristics in a lithium‐like silicon plasma |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2370-2372
Zhi‐zhan Xu,
Pin‐zhong Fan,
Zheng‐quan Zhang,
Shi‐shen Chen,
Li‐huang Lin,
Pei‐xiang Lu,
Xiao‐fang Wang,
An‐di Qian,
Jia‐jin Yu,
Lan Sun,
Min‐chun Wu,
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摘要:
Experimental study of soft x‐ray laser carried out on the LF12 Laser Facility of SIOM (Shanghai Institute of Optics and Fine Mechanics) is reported. Soft x‐ray amplifications were observed in lithium‐like silicon ions by line‐focused laser irradiation of slab targets. Based on the time‐integrated measurements, the gain coefficients are 1.5 and 1.4 cm−1for the 5f–3d(88.9 A˚) and the 5d–3p(87.3 A˚) transitions of lithium‐like silicon ions, respectively. In addition, the spatial characteristics of the laser lines are also presented.
ISSN:0003-6951
DOI:10.1063/1.102918
出版商:AIP
年代:1990
数据来源: AIP
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3. |
Repeatability dependence of phase‐change optical disks on morphology of protective layers |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2373-2375
R. Chiba,
H. Yamazaki,
S. Yagi,
S. Fujimori,
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摘要:
The surface or the Si3N4‐sputtered protective layer of phase change optical recording media was observed with a scanning tunneling microscope. We found the morphology of the protective layer can be controlled by changing the sputtering gas conditions and that overwrite cycle repeatability strongly depends on it. As the Ar gas pressure in the sputtering chamber is decreased, the protective layers become denser and have a flatter surface, and the repeatability is improved from 3×103to 5×105. The media sensitivity also depends on the morphology of the protective layers. The causes of media deterioration after a large number of overwrite cycles are discussed
ISSN:0003-6951
DOI:10.1063/1.102919
出版商:AIP
年代:1990
数据来源: AIP
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4. |
Insitureflectivity monitoring of antireflection coatings on semiconductor laser facets through facet loss induced forward voltage changes |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2376-2378
Jean Landreau,
Hisao Nakajima,
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摘要:
Insitufully electrical monitoring of the reflectivity of antireflection coatings on semiconductor laser facets is experimentally demonstrated. The operating principle consists of detecting changes in the forward voltage drop induced by the modification of facet reflectivity of a constant current‐driven semiconductor laser. This technique allows one to detect the optimum thickness giving the lowest reflectivity without optical measurement. A reflectivity as low as 1×10−4was currently obtained with electron beam deposited SiOxfilms on 1.5 &mgr;m buried ridge stripe lasers.
ISSN:0003-6951
DOI:10.1063/1.102920
出版商:AIP
年代:1990
数据来源: AIP
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5. |
Quantum size effects on photoluminescence in ultrafine Si particles |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2379-2380
H. Takagi,
H. Ogawa,
Y. Yamazaki,
A. Ishizaki,
T. Nakagiri,
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摘要:
Visible photoluminescence was observed in ultrafine Si particles at room temperature. Transmission electron microscopy revealed that Si microcrystallites were embedded in a Si oxide matrix for the sample which emitted the light. The emission energy depended on crystallite size in the range from 2.8 to 5 nm. The inverse relation between emission energy and the square of the crystallite size indicates that carrier confinement in the Si microcrystallites causes this photoluminescence phenomenon.
ISSN:0003-6951
DOI:10.1063/1.102921
出版商:AIP
年代:1990
数据来源: AIP
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6. |
Wavelength and polarization insensitive 3 dB cross‐coupler power dividers by ion exchange in glass |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2381-2383
Christopher P. Hussell,
Ramu V. Ramaswamy,
Ramakant Srivastava,
Janet L. Jackel,
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摘要:
We have fabricated fiber‐compatible, low‐loss, wavelength and polarization insensitive 3 dB 2×2 cross couplers by Ag+‐Na+ion exchange in glass. The couplers were designed using the adiabatic invariance condition for graded‐index channel waveguides. An excellent agreement between theory and experiment is demonstrated.
ISSN:0003-6951
DOI:10.1063/1.102922
出版商:AIP
年代:1990
数据来源: AIP
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7. |
Vertical‐cavity surface‐emitting InGaAs/GaAs lasers with planar lateral definition |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2384-2386
M. Orenstein,
A. C. Von Lehmen,
C. Chang‐Hasnain,
N. G. Stoffel,
J. P. Harbison,
L. T. Florez,
E. Clausen,
J. E. Jewell,
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摘要:
A planarity preserving method for the definition of vertical‐cavity surface‐emitting lasers (VC‐SEL) is described. A strained‐layer InGaAs quantum well VC‐SEL structure was grown and lasers were laterally defined using a tailored deep proton implantation process. In these lasers we obtained low threshold current densities of 1000 A/cm2and efficient cw operation. This method facilitates large‐scale integration of VC‐SEL devices.
ISSN:0003-6951
DOI:10.1063/1.102923
出版商:AIP
年代:1990
数据来源: AIP
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8. |
Avalanche enhancement of optical nonlinearities in semiconductor junctions |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2387-2389
S. M. Horbatuck,
D. F. Prelewitz,
T. G. Brown,
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摘要:
We examine the effects of avalanche processes on several classes of nonlinear optical interactions in semiconductor junctions. A silicon avalanche photodiode (APD) geometry is predicted to provide large enhancements of both the electronic nonlinearity (free‐carrier plasma interaction) as well as the thermal nonlinearity. The thermal nonlinearity at a wavelength &lgr;=1.06 &mgr;m in an APD is examined under normal operating conditions and a nonlinear interaction more than 5000 times that of the unbiased diode is observed.
ISSN:0003-6951
DOI:10.1063/1.102924
出版商:AIP
年代:1990
数据来源: AIP
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9. |
Generation of narrow‐band ultrasound with a long cavity mode‐locked Nd:YAG laser |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2390-2392
J. B. Deaton,
A. D. W. McKie,
J. B. Spicer,
J. W. Wagner,
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摘要:
A passively mode‐locked, flashlamp‐pumped Nd:YAG laser with a cavity length of 11.19 m has been developed to study the noncontact generation of narrow‐band ultrasound. The individual mode‐locked pulses acted as separate sources of ultrasound, producing a train of acoustic pulses with a repetition rate of about 13.4 MHz. The ultrasound was generated in an aluminum sample and remotely detected with a path stabilized Michelson interferometer. The energy in the multiple pulse acoustic signal was confined to a considerably reduced spectral range compared with that in a single pulse.
ISSN:0003-6951
DOI:10.1063/1.102925
出版商:AIP
年代:1990
数据来源: AIP
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10. |
Dependence of GaAs etch rate on the angle of incidence of a hydrogen plasma beam excited by electron cyclotron resonance |
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Applied Physics Letters,
Volume 56,
Issue 24,
1990,
Page 2393-2395
I. Suemune,
A. Kishimoto,
K. Hamaoka,
Y. Honda,
Y. Kan,
M. Yamanishi,
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摘要:
Hydrogen (H) plasma irradiation effect on (100) GaAs surfaces was studied. The etching of GaAs surfaces was found to be effectively ceased after some etch at the initial stage when the plasma beam was incident on the surface at a shallow glancing angle. The etched surface was an atomically flat (100) GaAs surface as previously observed by clear Laue spots in the reflection high‐energy electron diffraction measurement reported by I. Suemune, Y. Kunitsugu, Y. Kan, and M. Yamanishi [Appl. Phys. Lett.55, 760 (1989)]. A physical model for the newly found relation between the etch rate and the surface structure is discussed.
ISSN:0003-6951
DOI:10.1063/1.102926
出版商:AIP
年代:1990
数据来源: AIP
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