1. |
Effect of nonlinear gain reduction on semiconductor laser wavelength chirping |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 613-615
T. L. Koch,
R. A. Linke,
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摘要:
A simple wavelength chirping formula is presented which includes small nonlinearities in the net gain such as spectral hole burning. The two dominant terms are a laser‐structure‐independent derivative or ‘‘transient’’ chirp and a structure‐dependent ‘‘adiabatic’’ chirp, each with distinctly different lightwave system consequences. The two chirp contributions are indirectly related through their mutual association with relaxation oscillations. Time‐resolved spectral measurements on a number of different laser structures support the results.
ISSN:0003-6951
DOI:10.1063/1.96770
出版商:AIP
年代:1986
数据来源: AIP
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2. |
Frequency locking, quasiperiodicity, and chaos in modulated self‐pulsing semiconductor lasers |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 616-618
H. G. Winful,
Y. C. Chen,
J. M. Liu,
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摘要:
A transition to chaos via quasiperiodicity is observed in the output of a directly modulated self‐pulsing semiconductor laser. By sweeping the frequency and amplitude of the current modulation, several frequency‐locked states (Arnol’d tongues) are mapped out directly. Good agreement with the predictions of a rate equation model is obtained.
ISSN:0003-6951
DOI:10.1063/1.96771
出版商:AIP
年代:1986
数据来源: AIP
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3. |
High resolution infrared diode laser spectroscopy for isotope analysis—Measurement of isotopic carbon monoxide |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 619-621
Peter S. Lee,
Richard F. Majkowski,
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摘要:
A tunable infrared diode laser spectroscopic system for stable isotope analysis has been developed. The system uses (1) a tunable single mode PbTe/PbEuSeTe diode laser and (2) a sample cell with dual path length matched to the expected order of relative isotopic spectral intensities. Because of the unique features of such a system, isotopic molecules with similar mass and vastly different concentrations can readily be detected and measured. The principle and operation of the system are described, and the relative abundance of isotopic carbon monoxide12C16O,12C17O,12C18O has been measured for the first time by a tunable diode laser system.
ISSN:0003-6951
DOI:10.1063/1.96722
出版商:AIP
年代:1986
数据来源: AIP
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4. |
Tunable single pass gain in titanium‐activated lithium germanium oxide |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 622-623
G. M. Loiacono,
M. F. Shone,
G. Mizell,
Richard C. Powell,
G. J. Quarles,
B. Elouadi,
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摘要:
Laser‐pumped single pass gain measurements were made on crystals of titanium‐activated lithium germanium oxide between about 388 and 524 nm. Gain was observed throughout this spectral region with a peak cross section of about 1.7×10−19cm2near 450 nm.
ISSN:0003-6951
DOI:10.1063/1.96723
出版商:AIP
年代:1986
数据来源: AIP
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5. |
Optical properties of thin nematic liquid crystal cells |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 624-626
Shin‐Tson Wu,
Uzi Efron,
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摘要:
Optical properties of thin liquid crystal cells are found to deviate significantly from those of thick cells. Results on the liquid crystal thickness dependent phase retardation, effective birefringence, and decay time of thin E‐7 cells are presented. A simple model which is based on the partially disordered surface layers is developed to explain the observed phenomena. The concept of virtually inactive surface layers is introduced.
ISSN:0003-6951
DOI:10.1063/1.96724
出版商:AIP
年代:1986
数据来源: AIP
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6. |
Point defect kinetics and dopant diffusion during silicon oxidation |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 627-629
D. Mathiot,
J. C. Pfister,
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摘要:
Using a full calculation including all the couplings between the dopants and the point defects, we show that the transient effect observed at short times for the influence of oxidation on dopant diffusion in Si cannot be explained by the existence of an energy barrier to the recombination of interstitials and vacancies. We suggest that this transient is due to a transient in the self‐interstitial injection, due to high strains at the early stage of the oxidation, which can relax later through the viscoelastic flow of the oxide.
ISSN:0003-6951
DOI:10.1063/1.96725
出版商:AIP
年代:1986
数据来源: AIP
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7. |
Polydiacetylene single crystal thin films |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 630-631
J. Berrehar,
C. Lapersonne‐Meyer,
M. Schott,
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摘要:
A method for obtaining single crystal thin films of polydiacetylenes using electron irradiation is described. Film thickness can be controlled by adjusting the incident electron energy. Typical thicknesses between 100 and 2000 A˚ for a sample surface of a few tenths of cm2are easily obtained. Such films may find application in nonlinear optics.
ISSN:0003-6951
DOI:10.1063/1.96726
出版商:AIP
年代:1986
数据来源: AIP
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8. |
Reversible neutralization of boron acceptors by hydrogen in Pd‐SiO2‐Si capacitors |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 632-634
T. L. Fare,
I. Lundstrom,
J. N. Zemel,
A. Feygenson,
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摘要:
A palladium metal‐silicon dioxide‐silicon (Pd‐MOS) capacitor is used to study the reversible injection and extraction of atomic hydrogen from ap‐type implanted boron layer on ann‐type (1016phosphorus/cm3) substrate. 0.70±0.03 of the boron acceptors are deactivated by the hydrogen atoms diffusing from the Pd‐SiO2interface, on through the SiO2and on into the silicon surface region. It is established that the atomic hydrogen can diffuse through a 10‐nm‐thick thermal SiO2film. The isothermal uptake and release of atomic hydrogen in the silicon surface are demonstrated. The hydrogen data offer evidence that the boron acceptors and the phosphorus donors form a neutral complex during the processing of the ion implanted boron layer.
ISSN:0003-6951
DOI:10.1063/1.96727
出版商:AIP
年代:1986
数据来源: AIP
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9. |
Control of a natural permeable CoSi2base transistor |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 635-637
R. T. Tung,
A. F. J. Levi,
J. M. Gibson,
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摘要:
We report results on the fabrication of a natural permeable base transistor in a Si/CoSi2/Si heterostructure using molecular beam epitaxy (MBE). No photolithography is required, the transistor action being controlled by MBE growth conditions through the density and size of natural openings in the silicide base. The electrical characteristics of devices processed from such heterostructures are intimately related to the presence of these openings. Common base current gains in the range 0.01–0.95 have been observed and correlated with the size and density of the openings.
ISSN:0003-6951
DOI:10.1063/1.96728
出版商:AIP
年代:1986
数据来源: AIP
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10. |
Photosensitive capacitance‐voltage characteristics of molecular beam epitaxially grown GaAs/AlGaAs/GaAs heterostructures |
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Applied Physics Letters,
Volume 48,
Issue 10,
1986,
Page 638-640
Q‐D. Qian,
M. R. Melloch,
J. A. Cooper,
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摘要:
We report photosensitive capacitance‐voltage characteristics ofn+‐GaAs/Al0.3Ga0.7As/p‐GaAs heterostructures grown by molecular beam epitaxy. Inversion layers are observed due to minority charge retention in the triangular potential well at the AlGaAs/p‐GaAs interface. Details of the device structure and experimental evaluation utilizing capacitance‐voltage and current‐voltage techniques are presented.
ISSN:0003-6951
DOI:10.1063/1.96729
出版商:AIP
年代:1986
数据来源: AIP
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