1. |
Effects of strained‐layer structures on the threshold current density of AlGaInP/GaInP visible lasers |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 879-880
Jun‐ichi Hashimoto,
Tsukuru Katsuyama,
Jiro Shinkai,
Ichiro Yoshida,
Hideki Hayashi,
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摘要:
We have investigated the effects of strained‐layer structures on the reduction of the threshold current density of AlGaInP/GaInP visible laser diodes. It was found that a remarkable reduction of the threshold current density could be realized by incorporating strained single quantum well structures in their active regions. The minimum threshold current density at room temperature under pulsed conditions is 215 A/cm2, which is by far the lowest value ever reported for AlGaInP/GaInP visible lasers and comparable to those of AlGaAs/GaAs lasers.
ISSN:0003-6951
DOI:10.1063/1.104492
出版商:AIP
年代:1991
数据来源: AIP
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2. |
Dependence of lasing characteristics of quantum well lasers on substrate orientation: Tight‐binding theory |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 881-883
T. Takahashi,
J. N. Schulman,
Y. Arakawa,
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摘要:
Band‐structure analysis using the tight‐binding method indicates that there is a significant dependence of lasing properties of GaAs/AlGaAs quantum well lasers on substrate orientation, which suggests the importance of choosing the substrate orientation carefully for improving lasing properties. These results are mainly due to changes in thein‐planeeffective mass of the heavy hole.
ISSN:0003-6951
DOI:10.1063/1.104466
出版商:AIP
年代:1991
数据来源: AIP
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3. |
Channel waveguides in electro‐optic polymers using a photopolymer cladding technique |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 884-886
Paul R. Ashley,
Thomas A. Tumolillo,
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摘要:
Reported here is a new fabrication technique for forming channel waveguides in organic electro‐optic (EO) polymer materials. The process uses projection printing to directly expose inverted ridge channel patterns in a UV curing optical epoxy cladding layer. This technique is noncontact, requires no post processing, minimizes wall roughness, and can be used with any spin coatable EO polymer. Single‐mode channel waveguides have been demonstrated and characterized as well as phase modulator devices.
ISSN:0003-6951
DOI:10.1063/1.105210
出版商:AIP
年代:1991
数据来源: AIP
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4. |
Optical switching in a resonant tunneling structure |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 887-889
P. England,
J. E. Golub,
L. T. Florez,
J. P. Harbison,
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摘要:
We describe the interaction of light pulses with a GaAs/AlAs resonant tunneling structure. We demonstrate that light with an average power of less than 10 &mgr;W can induce switching, and show that switching is accompanied by a change in the optical absorption. These results suggest a number of new applications for the resonant tunneling structure, including light‐by‐light switching.
ISSN:0003-6951
DOI:10.1063/1.104467
出版商:AIP
年代:1991
数据来源: AIP
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5. |
Coherent beams from high efficiency two‐dimensional surface‐emitting semiconductor laser arrays |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 890-892
P. L. Gourley,
M. E. Warren,
G. R. Hadley,
G. A. Vawter,
T. M. Brennan,
B. E. Hammons,
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摘要:
We have fabricated and operated large two‐dimensional (2D) arrays of phase‐locked surface‐emitting semiconductor lasers. The arrays were fabricated by reactive ion beam etching of epitaxial Fabry–Perot resonators comprising GaAs/AlGaAs quantum wells surrounded by AlAs‐AlGaAs quarter‐wave mirrors. Different arrays corresponding to different pixel size (2–5 &mgr;m) and spacing (1–2 &mgr;m) were produced to investigate evanescent coupling between pixels. The arrays were photopumped so that the array size could be conveniently varied from 1×1, 2×2,... up to 20×20. Except for the 1×1 which emits a circular pattern, all arrays exhibit a well‐defined four‐lobed far‐field pattern in agreement with our theoretical analysis of the optical modes which predicts domination by the 2D out‐of‐phase eigenmode. As a consequence this pattern can be understood with simple Fraunhofer diffraction theory. The angular spread of the lobes, determined by the periodicity of the array elements, is 10° for the array with element size/spacing of 4/1 &mgr;m. The widths of the lobes are 6.7° for the 2×2 and narrow to 3.2° with increasing number of pixels in the array. The array exhibits a sharp onset for lasing, operation on a single longitudinal mode, and a linewidth which narrows to ∼1 A˚ with increasing array size. The differential power efficiency is as high as 70%. These observations provide further impetus and guidance for the development of 2D laser diode arrays.
ISSN:0003-6951
DOI:10.1063/1.104468
出版商:AIP
年代:1991
数据来源: AIP
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6. |
Quantitative evaluation of elastic properties of LiTaO3crystals by line‐focus‐beam acoustic microscopy |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 893-895
J. Kushibiki,
H. Takahashi,
T. Kobayashi,
N. Chubachi,
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摘要:
The line‐focus‐beam acoustic microscope system is applied to investigate the elastic properties of LiTaO3. Elastic inhomogeneities are detected quantitatively as a significant variation of leaky surface acoustic wave (LSAW) velocities inX‐112.2°YLiTaO3wafers. Large changes, about 2.5%, in LSAW velocities are observed in some wafers, which correspond to a difference between the velocities for single and multidomains. One of the causes is found to be in the poling process during wafer fabrication.
ISSN:0003-6951
DOI:10.1063/1.105217
出版商:AIP
年代:1991
数据来源: AIP
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7. |
Low radio frequency biased electron cyclotron resonance plasma etching |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 896-898
Seiji Samukawa,
Tomohiko Toyosato,
Etsuo Wani,
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摘要:
A radio frequency (rf) biased electron cyclotron resonance (ECR) plasma etching technology has been developed to realize an efficient ion acceleration in high density and uniform ECR plasma for accurate Al‐Si‐Cu alloy film etching. In this technology, the substrate is located at the ECR position (875 G position) and the etching is carried out with a 400 kHz rf bias power. This Al‐Si‐Cu etching technology achieves a high etching rate (more than 5000 A/min), excellent etching uniformity (within ±5%), highly anisotropic etching, and Cu residue‐free etching in only Cl2gas plasma. These etching characteristics are accomplished by the combination of the dense and uniform ECR plasma generation at the ECR position with the efficient accelerated ion flux at the ECR position by using 400 kHz rf bias.
ISSN:0003-6951
DOI:10.1063/1.104469
出版商:AIP
年代:1991
数据来源: AIP
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8. |
Sideband development in a high‐power traveling‐wave tube microwave amplifier |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 899-901
D. Shiffler,
J. D. Ivers,
G. S. Kerslick,
J. A. Nation,
L. Schachter,
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摘要:
The work presented describes the characteristics of single stage and severed high‐efficiency, high‐power traveling‐wave tube amplifiers operating inXband at 8.76 GHz. Average amplified output powers of 210 MW have been achieved at 24% efficiency. At high output power levels (≳100 MW) sidebands develop increasing the average radiated power to over 400 MW with a microwave conversion efficiency of over 45%. In single frequency operation phase stability to within ±8° has been demonstrated.
ISSN:0003-6951
DOI:10.1063/1.104470
出版商:AIP
年代:1991
数据来源: AIP
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9. |
Possibility of a new phase transition in 7×7 structure on clean Si(111) surfaces |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 902-904
Akitoshi Ishizaka,
Takahisa Doi,
Masakazu Ichikawa,
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摘要:
Temperature dependences of reflection high‐energy electron diffraction intensities are measured for Si(111)‐7×7 clean surfaces. The temperature dependences of diffraction intensities for both 7×7 super spots and specular spots change above 830 K. These show the possibility of two states in the 7×7 structure. The high‐temperature phase of the 7×7 structure is stable up to 1090 K, following the well known phase transition between 7×7 and 1×1 structures.
ISSN:0003-6951
DOI:10.1063/1.104471
出版商:AIP
年代:1991
数据来源: AIP
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10. |
Thermal stability of PtSi contact to GexSi1−x |
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Applied Physics Letters,
Volume 58,
Issue 9,
1991,
Page 905-907
Q. Z. Hong,
J. G. Zhu,
C. B. Carter,
J. W. Mayer,
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摘要:
Thermal stability of PtSi contact to epitaxial Ge0.5Si0.5/(100)Si has been investigated. The PtSi layer remained structurally and morphologically intact on the epitaxial Ge‐Si alloy at temperatures around 650 °C. When annealed at higher temperatures, PtSi penetrated locally into the alloy, although no chemical reaction was observed. The observed stability of PtSi is explained on the basis of a ternary Pt‐Ge‐Si equilibrium phase diagram. Other choices of contact compounds on Ge‐Si alloys are also discussed.
ISSN:0003-6951
DOI:10.1063/1.104472
出版商:AIP
年代:1991
数据来源: AIP
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