1. |
Ridge waveguide AlGaAs/GaAs distributed feedback lasers with multiple quantum well structure |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1767-1769
S. Noda,
K. Kojima,
K. Mitsunaga,
K. Kyuma,
K. Hamanaka,
T. Nakayama,
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摘要:
Ridge waveguide AlGaAs/GaAs distributed feedback lasers with multiple quantum well structure were fabricated for the first time. The threshold current of 28 mA, which is the lowest ever reported among AlGaAs/GaAs distributed feedback lasers, was obtained at room temperature. Stable single longitudinal and transverse mode oscillation was observed over the wide temperature range. The dynamic linewidth was also measured and it was five to six times smaller than that of a double heterostructure distributed feedback laser.
ISSN:0003-6951
DOI:10.1063/1.96779
出版商:AIP
年代:1986
数据来源: AIP
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2. |
In‐phase locking in diffraction‐coupled phased‐array diode lasers |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1770-1772
Shyh Wang,
Jaroslava Z. Wilcox,
Michael Jansen,
Jane J. Yang,
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摘要:
Design criteria are presented for strong in‐phase coupling of diffraction‐coupled phased‐array diode lasers. Theoretical predictions are confirmed by our experimental observations of double‐lobe and single‐lobe far‐field patterns.
ISSN:0003-6951
DOI:10.1063/1.96780
出版商:AIP
年代:1986
数据来源: AIP
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3. |
Measurement of excited‐state densities during high‐current operation of a hydrogen thyratron using laser‐induced fluorescence |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1773-1775
D. A. Erwin,
M. A. Gundersen,
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摘要:
The population of then=2 level of atomic hydrogen and the collisional relaxation rates of then=3 andn=4 levels during the conductive phase in the positive column of a high‐current ( J∼100–400 A/cm2) pulse in a hydrogen thyratron were measured. These results demonstrate laser‐induced fluorescence to be a usefulinsitudiagnostic for high‐current switch plasmas.
ISSN:0003-6951
DOI:10.1063/1.96781
出版商:AIP
年代:1986
数据来源: AIP
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4. |
Influence of the circuit impedance on an electron beam controlled diffuse discharge with a negative differential conductivity |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1776-1778
G. Schaefer,
K. H. Schoenbach,
M. Kristiansen,
B. E. Strickland,
R. A. Korzekwa,
G. Z. Hutcheson,
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摘要:
The use of attaching gases in an externally sustained diffuse discharge opening switch with a low attachment rate at low values ofE/Nand a high attachment rate at high values ofE/Nallows the discharge to operate with low losses in the closed switch phase and to achieve fast opening after the sustainment source is turned off. Such an attacher generates aJ‐E/Ncharacteristic with a negative differential conductivity in an intermediateE/Nrange. Such a characteristic obstructs the closing process of the discharge if it is operated in a high impedance system. Experiments demonstrating these effects are presented for electron beam sustained discharges in mixtures of argon and C2F6.
ISSN:0003-6951
DOI:10.1063/1.96782
出版商:AIP
年代:1986
数据来源: AIP
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5. |
Reformulation of atom location by channeling enhanced microanalysis |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1779-1779
E. Goo,
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摘要:
The current formulation for atom location by channeling enhanced microanalysis requires three characteristic x‐ray spectra and is overdefined [J. C. H. Spence and J. Tafto, J. Microscopy130, 147 (1983)]. A formulation is presented where only two characteristic x‐ray spectra are needed to determine the distribution of substitutional impurity atoms in a layered compound.
ISSN:0003-6951
DOI:10.1063/1.96783
出版商:AIP
年代:1986
数据来源: AIP
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6. |
Observation of double light pulses in thin‐film ZnS:Mn electroluminescent devices |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1780-1782
E. Bringuier,
A. Geoffroy,
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摘要:
Thin‐film ZnS:Mn electroluminescent devices can exhibit, under pulsed electrical excitation, a double light pulse, as has been previously observed in other phosphors. We specify the conditions under which this phenomenon appears and relate it to the basic mechanism of carrier emission in the active layer.
ISSN:0003-6951
DOI:10.1063/1.96784
出版商:AIP
年代:1986
数据来源: AIP
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7. |
Chemical etching for the evaluation of hydrogenated amorphous silicon films |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1783-1784
T. L. Chu,
Shirley S. Chu,
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摘要:
Chemical etching using a 1:5:40 HF‐HNO3‐CH3COOH solution has been used for the evaluation of hydrogenated amorphous silicon (a‐Si:H) films. The dissolution rate ofa‐Si@B:H films and the structural features brought out by etching have revealed significant differences in the properties ofa‐Si:H films deposited in hydrogen and helium atmospheres. Unintentionally contaminateda‐Si@B:H films have also been found to show considerably higher dissolution rate than intrinsic films, and the dissolution rate measurements may be used to optimize the deposition conditions.
ISSN:0003-6951
DOI:10.1063/1.96785
出版商:AIP
年代:1986
数据来源: AIP
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8. |
Self‐aligned polycrystalline silicon thin‐film transistors by laser implantation |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1785-1786
P. Coxon,
M. Lloyd,
P. Migliorato,
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摘要:
Polycrystalline silicon thin‐film transistors have been fabricated using photochemical doping with phosphorus from the gas phase by ultraviolet laser. The results obtained show the technique to be a viable alternative to ion implantation for applications such as three‐dimensional very large scale integrated circuits.
ISSN:0003-6951
DOI:10.1063/1.96786
出版商:AIP
年代:1986
数据来源: AIP
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9. |
Growth of GaAs by switched laser metalorganic vapor phase epitaxy |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1787-1789
Atsutoshi Doi,
Yoshinobu Aoyagi,
Susumu Namba,
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摘要:
Crystal growth of GaAs by switched laser metalorganic vapor phase epitaxy (SL MOVPE) is reported. This growth technique is achieved by combining laser MOVPE and atomic layer epitaxy. The growth process in SL MOVPE can be explained by a model which assumes that trimethylgallium adsorbed on the crystal surface is decomposed in a photocatalytic reaction and that the decomposition rate depends on the surface species present on the substrate.
ISSN:0003-6951
DOI:10.1063/1.96787
出版商:AIP
年代:1986
数据来源: AIP
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10. |
Low‐temperature deposition of low resistivity ZnSe films by reactive sputtering |
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Applied Physics Letters,
Volume 48,
Issue 26,
1986,
Page 1790-1792
R. J. Stirn,
A. Nouhi,
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摘要:
Low resistivity semiconducting films of ZnSe have been deposited at temperatures as low as 120 °C using dc magnetron co‐sputtering of Zn and In (dopant) targets in a reactive atmosphere of H2Se/Ar. Yellowish transparent films of ZnSe on glass and conductive transparent oxide‐coated glass substrates were obtained having a room‐temperature resistivity as low as 20 &OHgr; cm. Atomic absorption analysis showed a Zn to Se ratio of 49.8:49.0 and In concentration of about 1% for the reactively sputter‐deposited ZnSe:In films on glass. Optical absorption/transmission measurements yielded an energy band gap of about 2.65 eV at room temperature. X‐ray diffraction results indicated highly oriented polycrystalline films on glass with thecaxis parallel to the plane of the film.
ISSN:0003-6951
DOI:10.1063/1.96788
出版商:AIP
年代:1986
数据来源: AIP
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