Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena


ISSN: 0734-211X        年代:1991
当前卷期:Volume 9  issue 3     [ 查看所有卷期 ]

年代:1991
 
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21. Atmospheric scanning electron microscopy using silicon nitride thin film windows
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1557-1558

E. D. Green,   G. S. Kino,  

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22. High resolution atomic force microscopy potentiometry
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1559-1561

J. M. R. Weaver,   David W. Abraham,  

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23. Semiconductor characterization by scanning force microscope surface photovoltage microscopy
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1562-1565

J. M. R. Weaver,   H. K. Wickramasinghe,  

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24. Underwater scanning tunneling microscopy of organic and biological molecules
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1566-1569

Jianxun Mou,   Wenjun Sun,   Junjue Yan,   W. S. Yang,   Cheng Liu,   Zhonghe Zhai,   Qiang Xu,   Youchang Xie,  

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25. Studies of nucleation and growth morphology of boron‐doped diamond microcrystals by scanning tunneling microscopy
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1570-1576

M. P. Everson,   M. A. Tamor,  

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26. Gold/carbon superfine particles produced in pulsed CO2laser stimulated plasmas
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1577-1595

S. O. Colgate,   C. G. Simon,   S. J. Boggess,   M. Moini,   A. T. D’Agostino,   J. M. Ammons,  

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27. Anisotropic etching of polysilicon in a single‐wafer aluminum etch reactor
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1596-1597

J.‐S. Maa,   H. Gossenberger,   F. DiGeronimo,  

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28. Multiple submicron‐sized Schottky point contacts interconnected by a submicron‐sized airbridge
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1598-1600

P. E. Schmidt,   K. Kosemura,   M. Okada,   N. Yokoyama,  

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29. WNX–Schottky diodes on semiconductor–insulator–semiconductor‐liken‐GaAs/undoped‐AlGaAs/n‐GaAs heterostructures
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1601-1604

Klaus Steiner,   Hitoshi Mikami,   Kazuya Nishihori,   Masami Nagaoka,   Naotaka Uchitomi,  

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30. A mechanical probe for accurate substrate temperature measurements in molecular beam epitaxy
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  3,   1991,   Page  1605-1607

M. J. Ekenstedt,   T. G. Andersson,  

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