Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena


ISSN: 0734-211X        年代:1991
当前卷期:Volume 9  issue 5     [ 查看所有卷期 ]

年代:1991
 
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21. Off‐angle emission characteristics of liquid Au–Si–Be ion sources
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2578-2581

H. Arimoto,   T. Fujii,   M. Komuro,  

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22. Microdroplet generation in liquid metal ion sources
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2582-2587

V. V. Vladimirov,   V. E. Badan,   V. N. Gorshkov,   L. G. Grechko,   I. A. Soloshenko,  

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23. Impurity‐induced mechanism of periodic structures excitation on solidifying melt surface
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2588-2592

V. V. Vladimirov,   M. D. Gabovich,   I. A. Soloshenko,   V. A. Khomich,   V. V. Tsyolko,  

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24. Energy distribution measurement of a gallium liquid metal ion source modulated at high frequency by a focused laser beam
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2593-2595

Li Zhou,   Fred Holmes,   Jon Orloff,  

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25. Microprobe of helium ions
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2596-2601

T. Itakura,   K. Horiuchi,   N. Nakayama,  

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26. A method for calculating the current density of charged particle beams and the effect of finite source size and spherical and chromatic aberrations on the focusing characteristics
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2602-2608

M. Sato,   J. Orloff,  

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27. Experimental study of a focused ion beam probe size and comparison with theory
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2609-2612

J. Orloff,   J.‐Z. Li,   M. Sato,  

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28. A focused ion beam system with a retarding mode objective lens
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2613-2616

H. Sawaragi,   H. Kasahara,   R. Mimura,   W. Thompson,   M. Hassel Shearer,  

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29. Synthesis of electron and ion optical columns
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2617-2621

M. Szilagyi,  

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30. High‐resolution focused ion beam lithography
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  9,   Issue  5,   1991,   Page  2622-2632

Shinji Matsui,   Yoshikatsu Kojima,   Yukinori Ochiai,   Toshiyuki Honda,  

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