Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena


ISSN: 0734-211X        年代:1989
当前卷期:Volume 7  issue 4     [ 查看所有卷期 ]

年代:1989
 
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71. The influence of interfacial roughness on parallel transport at oxide–semiconductor and heterojunction interfaces
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  7,   Issue  4,   1989,   Page  1035-1040

S. M. Goodnick,   J. E. Lary,   R. Owen,   O. Sri,   C. W. Wilmsen,  

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72. Hot‐electron magnetospectroscopy in resonant tunneling devices: A probe of conduction‐band anisotropy
  Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena,   Volume  7,   Issue  4,   1989,   Page  1041-1044

O. H. Hughes,   M. Henini,   E. S. Alves,   M. L. Leadbeater,   L. Eaves,   M. Davies,   M. Heath,  

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