Journal of Applied Physics


ISSN: 0021-8979        年代:1985
当前卷期:Volume 57  issue 9     [ 查看所有卷期 ]

年代:1985
 
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11. Microwave spectroscopic measurement of the electron density in a planar discharge: Relation to reactive‐ion etching of silicon oxide
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4386-4390

C. A. M. de Vries,   A. J. van Roosmalen,   G. C. C. Puylaert,  

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12. Collective acceleration of laser‐produced ions
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4391-4395

J. T. Cremer,   W. W. Destler,  

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13. A pulsed thermoelastic analysis of photothermal surface displacements in layered materials
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4396-4405

G. Rousset,   L. Bertrand,   P. Cielo,  

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14. Theory for shot noise in submicron semiconductor diodes using two‐point correlations of noise sources
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4406-4408

A. Chatterjee,   P. Das,  

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15. Solar thermophotovoltaics: An assessment
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4409-4414

W. Spirkl,   H. Ries,  

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16. Enhanced high‐field current carrying capacities and pinning behavior of NbTi‐based superconducting alloys
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4415-4420

H. Wada,   K. Itoh,   K. Tachikawa,   Y. Yamada,   S. Murase,  

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17. Theory of photopyroelectric spectroscopy of solids
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4421-4430

Andreas Mandelis,   Martin M. Zver,  

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18. Optical absorption measurements in a new composite material by combined photoacoustic and beam transmission techniques
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4431-4436

C. L. Cesar,   C. A. S. Lima,   N. F. Leite,   H. Vargas,   A. F. Rubira,   F. Galembeck,  

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19. Measurement of the deuterium concentration profile in a deuterium‐exchanged LiNbO3crystal
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4437-4440

C. E. Rice,   J. L. Jackel,   W. L. Brown,  

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20. A model for the plasma‐activated chemical vapor deposition process
  Journal of Applied Physics,   Volume  57,   Issue  9,   1985,   Page  4441-4446

Fredy Weling,  

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