101. |
Monte Carlo simulation of channeling tails formation under heavy‐dose ion bombardment |
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Journal of Applied Physics,
Volume 57,
Issue 6,
1985,
Page 2337-2339
A. M. Mazzone,
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摘要:
This work presents a Monte Carlo simulation of the ion distribution and of the damage growth in phosphorous‐implanted silicon. The calculation shows that channeling tails may form at doses well above the threshold for the formation of a continuous amorphous layer.
ISSN:0021-8979
DOI:10.1063/1.334340
出版商:AIP
年代:1985
数据来源: AIP
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102. |
Elastic stiffness and thermal expansion coefficient of boron nitride films |
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Journal of Applied Physics,
Volume 57,
Issue 6,
1985,
Page 2340-2342
D. S. Williams,
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摘要:
The temperature‐dependent stress of boron‐nitride (BN) films deposited by low‐pressure chemical vapor deposition was measured using an optically leveraged laser apparatus. The measurements were used to calculate values ofE/1−&ngr; and &agr; for BN as a function of the NH3/B2H6ratio. Values ofE/1‐&ngr;&bartil;1×1012dynes/cm2and &agr;&bartil;5×10−6 °K−1were obtained independent of the NH3/B2H6ratio. The intrinsic‐stress and the thermal‐stress contributions to the room‐temperature stress were estimated for different substrates and the values were used to rationalize the strong dependence of the room temperature stress on chemical vapor deposition processing variables.
ISSN:0021-8979
DOI:10.1063/1.334341
出版商:AIP
年代:1985
数据来源: AIP
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103. |
Crystal and magnetic structure of Pr2Fe14B and Dy2Fe14B |
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Journal of Applied Physics,
Volume 57,
Issue 6,
1985,
Page 2343-2345
J. F. Herbst,
W. B. Yelon,
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摘要:
Rietveld analyses of neutron powder diffraction data on Pr2Fe14B and Dy2Fe14B are reported. Both phases form the Nd2Fe14B tetragonal crystal structure (P42/mnm). At 77 and 293 K our analyses indicate that all magnetic moments in each compound are collinear with thecaxis. The rare‐earth moments in Pr2Fe14B are parallel to the Fe moments (ferromagnetic) and are antiparallel in Dy2Fe14B (ferrimagnetic).
ISSN:0021-8979
DOI:10.1063/1.334342
出版商:AIP
年代:1985
数据来源: AIP
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104. |
Erratum: Measurement of electron mobility in epitaxial heavily phosphorus‐doped silicon [J. Appl. Phys.56, 2250 (1984)] |
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Journal of Applied Physics,
Volume 57,
Issue 6,
1985,
Page 2346-2346
Jesu´s A. del Alamo,
Richard M. Swanson,
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ISSN:0021-8979
DOI:10.1063/1.335508
出版商:AIP
年代:1985
数据来源: AIP
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