Journal of Applied Physics


ISSN: 0021-8979        年代:1995
当前卷期:Volume 78  issue 5     [ 查看所有卷期 ]

年代:1995
 
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101. Overcoming the effect of chain disorder on the Seebeck coefficient of Ln1−xCaxBa2Cu2.9Ga0.1O6+z(Ln=Nd,Dy) by substitution of Ca(0<x≤0.2)
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3523-3524

I. Zelenay,   E. Chavira,   R. Suryanarayanan,  

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102. Laser‐energy dependence of optical emission from radicals and atoms in laser‐induced chemical‐vapor deposition of SiC
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3525-3527

Toru Mizunami,   Naotake Toyama,   Takahiro Sakaguchi,  

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103. The effect of interaction between supported Au clusters on the conductance resonance
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3528-3530

Xiaoshuang Chen,   Jijun Zhao,   Fengqi Liu,   Qing Sun,   Guanghou Wang,  

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104. Nanometric crystallization of Fe73.5Cu1Nb3Si13.5B9by laser annealing
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3531-3533

Luciano Lanotte,   Vincenzo Iannotti,  

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105. Interdiffusion behavior inn‐doped and undoped GaInAs/AlGaInAs multiple‐quantum‐well structures grown by molecular‐beam epitaxy
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3534-3536

V. Hofsa¨ss,   J. Kuhn,   H. Schweizer,   H. Hillmer,   R. Lo¨sch,   W. Schlapp,  

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106. The frequency and temperature dependence of noise in YBa2Cu3O7multijunction flux‐flow amplifiers
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3537-3539

J. C. Macfarlane,   L. Hao,   J. Kuznik,   C. M. Pegrum,  

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107. Diamond deposition on tungsten wires by cyclic thermal plasma chemical vapor deposition
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3540-3542

Huaqing Yin,   Keisuke Eguchi,   Toyonobu Yoshida,  

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108. Continuous‐wave operation and tuning characteristics of Nd:LuAlO3at 1083 nm for3He and4He optical pumping
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3543-3545

E. F. Stephens,   R. Vandiver,   Padetha Tin,   M. R. Kokta,  

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109. Growth of Zn &dgr;‐doped AlxGa1−xAs by low pressure metal organic vapor phase epitaxy
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3546-3548

G. Li,   M. Petravic´,   C. Jagadish,  

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110. Erratum: ‘‘Electronic passivation of GaAs surfaces by electrodeposition of organic molecules containing reactive sulfur’’ [J. Appl. Phys.77, 1582 (1995)]
  Journal of Applied Physics,   Volume  78,   Issue  5,   1995,   Page  3549-3549

K. Asai,   T. Miyashita,   K. Ishigure,   S. Fukatsu,  

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