| 31. |
Electron Diffraction Evidence for the Existence of Microstress in Evaporated Metal Films |
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Journal of Applied Physics,
Volume 23,
Issue 1,
1952,
Page 150-151
Eber K. Halteman,
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摘要:
The line broadening in electron diffraction powder patterns from evaporated nickel films has been investigated. The pure diffraction broadening was found to vary with the Bragg angle in agreement with a microstress theory of broadening rather than with a particle size mechanism. The Fourier transform of the pure diffraction broadening has been determined and also found to be in agreement with a microstress mechanism.
ISSN:0021-8979
DOI:10.1063/1.1701963
出版商:AIP
年代:1952
数据来源: AIP
|
| 32. |
The Effect of Pressure on Scintillation Phosphors |
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Journal of Applied Physics,
Volume 23,
Issue 1,
1952,
Page 152-153
A. J. Reinsch,
H. G. Drickamer,
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ISSN:0021-8979
DOI:10.1063/1.1701965
出版商:AIP
年代:1952
数据来源: AIP
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| 33. |
Direct Printing of Shadowed Electron Micrographs |
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Journal of Applied Physics,
Volume 23,
Issue 1,
1952,
Page 153-154
R. M. Fisher,
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ISSN:0021-8979
DOI:10.1063/1.1701966
出版商:AIP
年代:1952
数据来源: AIP
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| 34. |
A Physical Theory of Rubber Reinforcement |
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Journal of Applied Physics,
Volume 23,
Issue 1,
1952,
Page 154-155
A. M. Bueche,
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ISSN:0021-8979
DOI:10.1063/1.1701968
出版商:AIP
年代:1952
数据来源: AIP
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| 35. |
PROGRAM: Proceedings of the Electron Microscope Society of America |
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Journal of Applied Physics,
Volume 23,
Issue 1,
1952,
Page 156-164
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PDF (926KB)
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ISSN:0021-8979
DOI:10.1063/1.1701969
出版商:AIP
年代:1952
数据来源: AIP
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Volume 23 issue 1