Journal of Applied Physics


ISSN: 0021-8979        年代:1980
当前卷期:Volume 51  issue 1     [ 查看所有卷期 ]

年代:1980
 
     Volume 51  issue 1
     Volume 51  issue 2   
     Volume 51  issue 3   
     Volume 51  issue 4   
     Volume 51  issue 5   
     Volume 51  issue 6   
     Volume 51  issue 7   
     Volume 51  issue 8   
     Volume 51  issue 9   
     Volume 51  issue 10   
     Volume 51  issue 11   
     Volume 51  issue 12   
31. Spectroscopy and atomic physics of highly ionized Cr, Fe, and Ni for tokamak plasmas
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  190-201

U. Feldman,   G. A. Doschek,   Chung‐Chieh Cheng,   A. K. Bhatia,  

Preview   |   PDF (710KB)

32. Efficient production of hot plasmas through multiple‐wire implosion in transmission line generators
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  202-205

H. W. Bloomberg,  

Preview   |   PDF (290KB)

33. Experimentally determined absorption for spherical‐shell targets
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  206-209

Stephen B. Segall,  

Preview   |   PDF (260KB)

34. Necessary conditions for the homogeneous formation of pulsed avalanche discharges at high gas pressures
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  210-222

Jeffrey I. Levatter,   Shao‐Chi Lin,  

Preview   |   PDF (1164KB)

35. Spatial distribution of plasma in a transverse‐discharge supersonic nitrogen stream
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  223-236

M. Garcia,  

Preview   |   PDF (1042KB)

36. Interaction of CO2laser radiation with a denseZ‐pinch plasma
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  237-241

C. R. Neufeld,  

Preview   |   PDF (443KB)

37. A mathematical model for calculating effects of back corona in wire‐duct electrostatic precipitators
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  242-256

Phil A. Lawless,   Leslie E. Sparks,  

Preview   |   PDF (953KB)

38. On cyclotron waves in a bounded magnetoplasma
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  257-261

S. K. Das,   J. Basu,  

Preview   |   PDF (378KB)

39. Electrical properties of Si implanted with As through SiO2films
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  262-268

T. Hirao,   G. Fuse,   K. Inoue,   S. Takayanagi,   Y. Yaegashi,   S. Ichikawa,   T. Izumi,  

Preview   |   PDF (518KB)

40. Surface‐ and inner‐microdefects in annealed silicon wafer containing oxygen
  Journal of Applied Physics,   Volume  51,   Issue  1,   1980,   Page  269-273

Fumio Shimura,   Hideki Tsuya,   Tsutomu Kawamura,  

Preview   |   PDF (507KB)

首页 上一页 下一页 尾页 第4页 共132条