Journal of Applied Physics


ISSN: 0021-8979        年代:1985
当前卷期:Volume 58  issue 9     [ 查看所有卷期 ]

年代:1985
 
     Volume 57  issue 1   
     Volume 57  issue 2   
     Volume 57  issue 3   
     Volume 57  issue 4   
     Volume 57  issue 5   
     Volume 57  issue 6   
     Volume 57  issue 7   
     Volume 57  issue 8   
     Volume 57  issue 9   
     Volume 57  issue 10   
     Volume 57  issue 11   
     Volume 57  issue 12   
     Volume 58  issue 1   
     Volume 58  issue 2   
     Volume 58  issue 3   
     Volume 58  issue 4   
     Volume 58  issue 5   
     Volume 58  issue 6   
     Volume 58  issue 7   
     Volume 58  issue 8   
     Volume 58  issue 9
     Volume 58  issue 10   
     Volume 58  issue 11   
     Volume 58  issue 12   
31. SiLcore edge fine structure in an oxidation series of silicon compounds: A comparison of microelectron energy loss spectra with theory
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3463-3469

W. M. Skiff,   R. W. Carpenter,   S. H. Lin,  

Preview   |   PDF (685KB)

32. Relationship between Hall constant and carrier densities in polycrystalline semiconductor film
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3470-3475

M. S. Bennett,  

Preview   |   PDF (407KB)

33. Open‐circuit voltage‐decay behavior inp‐njunction diode at high injection
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3476-3480

R. Gopal,   R. Dwivedi,   S. K. Srivastava,  

Preview   |   PDF (397KB)

34. Effective masses in Sn‐doped Ga1−xAlxAs (x<0.33) determined by the Shubnikov–de Haas effect
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3481-3484

B. El Jani,   P. Gibart,   J. C. Portal,   R. L. Aulombard,  

Preview   |   PDF (291KB)

35. Slow‐relaxation phenomena in photoconductivity for semi‐insulating GaAs
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3485-3493

S. Nojima,  

Preview   |   PDF (819KB)

36. A study of hydrogenated amorphous silicon deposited by hot‐wall glow discharge
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3494-3498

F. Boulitrop,   N. Proust,   J. Magarin˜o,   E. Criton,   J. F. Peray,   M. Dupre,  

Preview   |   PDF (390KB)

37. Two‐dimensional continuum percolation and conduction. II
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3499-3503

Mitsunobu Nakamura,  

Preview   |   PDF (500KB)

38. Influence of rf power on the properties of hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3504-3507

Nobuo Saito,  

Preview   |   PDF (357KB)

39. Quantized electron accumulation layers on ZnO surfaces produced by low‐energy hydrogen‐ion implantation
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3508-3514

G. Yaron,   A. Many,   Y. Goldstein,  

Preview   |   PDF (638KB)

40. Simulation for static and dynamic performance of a superconducting analog‐to‐digital converter
  Journal of Applied Physics,   Volume  58,   Issue  9,   1985,   Page  3515-3518

N. S. Kim,   M. D. Jack,  

Preview   |   PDF (302KB)

首页 上一页 下一页 尾页 第4页 共73条