Journal of Applied Physics


ISSN: 0021-8979        年代:1982
当前卷期:Volume 53  issue 6     [ 查看所有卷期 ]

年代:1982
 
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31. A comparison of spectroscopic and Thomson scattering measurements of electron densities and temperatures in a transient expanding plasma flow
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4130-4135

J. E. Heidrich,   B. A. Jacoby,   T. M. York,   J. W. Robinson,  

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32. Studies of the anode region of a high‐intensity argon arc
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4136-4145

N. Sanders,   K. Etemadi,   K. C. Hsu,   E. Pfender,  

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33. Microstructure and light emission of ac thin‐film electroluminescent devices
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4146-4151

H. Venghaus,   D. Theis,   H. Oppolzer,   S. Schild,  

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34. Quantitative methods for microgeometric modeling
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4152-4165

C. Lin,   M. H. Cohen,  

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35. A study of thin silicon dioxide films using infrared absorption techniques
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4166-4172

I. W. Boyd,   J. I. B. Wilson,  

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36. Changes in capacitance of amorphous Se:As alloy films during structural relaxation below the glass transition temperature
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4173-4179

M. Abkowitz,   D. F. Pochan,   J. M. Pochan,  

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37. Field evaporation events as Markov chains: A time‐of‐flight atom‐probe study of iridium, Pt‐Rh alloys, and metallic glasses
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4180-4188

T. T. Tsong,   S. B. McLane,   M. Ahmad,   C. S. Wu,  

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38. A comparison of initial damage rates due to electron and neutron irradiations measured by internal friction techniques. III. Neutron energy dependence (67 keV to 1 MeV)
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4189-4192

J. A. Goldstone,   D. M. Parkin,   H. M. Simpson,  

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39. A molecular dynamics simulation study of the influence of the lattice atom potential function upon atom ejection processes
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4193-4201

Don E. Harrison,   Roger P. Webb,  

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40. Effects of humidity on stress in thin silicon dioxide films
  Journal of Applied Physics,   Volume  53,   Issue  6,   1982,   Page  4202-4207

I. Blech,   U. Cohen,  

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