Journal of Applied Physics


ISSN: 0021-8979        年代:1971
当前卷期:Volume 42  issue 2     [ 查看所有卷期 ]

年代:1971
 
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31. Mo¨ssbauer Characteristics of &egr;, &khgr;, and &thgr; Iron Carbides
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  687-695

Z. Mathalone,   M. Ron,   J. Pipman,   S. Niedzwiedz,  

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32. Charge Transport and Photoconductivity in Amorphous Arsenic Trisulfide Films
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  696-703

S. W. Ing,   J. H. Neyhart,   F. Schmidlin,  

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33. Growth Rates and Stability Limits for Beam‐Plasma Interaction
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  704-713

S. A. Self,   M. M. Shoucri,   F. W. Crawford,  

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34. Electron Transmission Measurements for Al, Sn, and Au Targets at Electron Bombarding Energies of 1.0 and 2.5 MeV
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  714-721

D. H. Rester,   J. H. Derrickson,  

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35. NewS= 1 EPR Center in Irradiated Diamond
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  722-724

Y. M. Kim,   G. D. Watkins,  

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36. Electrical Conduction in Ferromagnetic Metal Oxide Junctions
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  725-729

R. K. Smeltzer,  

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37. Analysis of Impurity Distribution in Homoepitaxialnonn+Films of GaAs which Contain High‐Resistivity Regions
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  729-739

J. V. DiLorenzo,   R. B. Marcus,   R. Lewis,  

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38. I. Luminescence and Free Carrier Decay Times in Semiconductors Containing Isoelectronic Traps
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  739-746

J. D. Cuthbert,  

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39. II. Auger Electron Conductivity in Silicon
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  747-752

J. D. Cuthbert,  

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40. Ultraviolet‐Enhanced Oxidation of Silicon
  Journal of Applied Physics,   Volume  42,   Issue  2,   1971,   Page  752-756

Ruben Oren,   Sorab K. Ghandhi,  

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