Journal of Applied Physics


ISSN: 0021-8979        年代:1974
当前卷期:Volume 45  issue 5     [ 查看所有卷期 ]

年代:1974
 
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41. Near‐ultraviolet emission spectrum from an intense relativistic electron‐beam discharge
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2163-2167

P. S. P. Wei,   W. M. Leavens,   J. L. Adamski,  

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42. Mode control in GaAs large‐cavity double‐heterostructure lasers
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2168-2173

B. W. Hakki,   C. J. Hwang,  

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43. Late‐time gain of the CF3I iodine photodissociation laser
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2174-2179

R. E. Palmer,   M. A. Gusinow,  

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44. Photodetection by light‐induced barrier modulation in Cu‐diffused Au&sngbnd;CdS diodes
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2180-2190

G. Lubberts,   B. C. Burkey,   H. K. Bu¨cher,   E. L. Wolf,  

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45. Nitrogen concentration in GaP measured by optical absorption and by proton‐induced nuclear reactions
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2191-2200

E. C. Lightowlers,   J. C. North,   O. G. Lorimor,  

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46. Influence of stoichiometry on the metal‐semiconductor transition in vanadium dioxide
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2201-2206

C. H. Griffiths,   H. K. Eastwood,  

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47. Electron‐beam‐irradiated discharges considered for initiating high‐pressure pulsed chemical lasers
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2207-2218

R. Hofland,   M. L. Lundquist,   A. Ching,   J. S. Whittier,  

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48. Phase modulation nonlinearity of double‐heterostructurep‐njunction diode light modulators
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2219-2228

L. O. Wilson,   F. K. Reinhart,  

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49. Geometrical properties of random particles and the extraction of photons from electroluminescent diodes
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2229-2253

W. B. Joyce,   R. Z. Bachrach,   R. W. Dixon,   D. A. Sealer,  

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50. Determination of Fermi‐level effect on Si‐site distribution in GaAs : Si
  Journal of Applied Physics,   Volume  45,   Issue  5,   1974,   Page  2254-2257

J. K. Kung,   W. G. Spitzer,  

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