Journal of Applied Physics


ISSN: 0021-8979        年代:1986
当前卷期:Volume 59  issue 3     [ 查看所有卷期 ]

年代:1986
 
     Volume 59  issue 1   
     Volume 59  issue 2   
     Volume 59  issue 3
     Volume 59  issue 4   
     Volume 59  issue 5   
     Volume 59  issue 6   
     Volume 59  issue 7   
     Volume 59  issue 8   
     Volume 59  issue 9   
     Volume 59  issue 10   
     Volume 59  issue 11   
     Volume 59  issue 12   
     Volume 60  issue 1   
     Volume 60  issue 2   
     Volume 60  issue 3   
     Volume 60  issue 4   
     Volume 60  issue 5   
     Volume 60  issue 6   
     Volume 60  issue 7   
     Volume 60  issue 8   
     Volume 60  issue 9   
     Volume 60  issue 10   
     Volume 60  issue 11   
     Volume 60  issue 12   
41. Reaction of atomic and molecular chlorine with aluminum
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  940-947

D. A. Danner,   D. W. Hess,  

Preview   |   PDF (741KB)

42. Photochromic silver complex oxide thin films synthesized by anodic oxidation
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  948-950

Takushi Hirono,   Tomoaki Yamada,   Toshihiro Nishi,  

Preview   |   PDF (243KB)

43. Analysis of the short‐circuit current of a polycrystalline solar cell with excitation by a gated electron beam
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  951-957

A. Romanowski,   D. B. Wittry,   J. M. Tsaur,  

Preview   |   PDF (434KB)

44. Activity coefficient calculations for the Hg and Cd components in a tellurium‐rich (Hg,Cd)Te liquid‐phase‐epitaxy growth solution containing Hg and Cd
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  958-960

H. R. Vydyanath,  

Preview   |   PDF (256KB)

45. Self‐temperature‐control plane heaters by graphite‐polyethylene glycol mixed systems
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  960-962

T. Kimura,   S. Yasuda,  

Preview   |   PDF (234KB)

46. Influence of transmission resonance on carrier collection in a semiconductor quantum well
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  962-964

Yasuhito Zohta,  

Preview   |   PDF (262KB)

47. Theory of high‐field transport of holes in Al0.45Ga0.55As
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  964-966

Kevin Brennan,   Karl Hess,  

Preview   |   PDF (266KB)

48. Surface segregation during reactive etching of GaAs and InP
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  967-969

M. S. Ameen,   T. M. Mayer,  

Preview   |   PDF (272KB)

49. Suppression of higher‐order thickness modes in magnetostatic forward volume wave delay lines
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  970-972

S. N. Bajpai,  

Preview   |   PDF (263KB)

50. Distribution of nitrogen and defects in SiOxNy/Si structures formed by the thermal nitridation of SiO2/Si
  Journal of Applied Physics,   Volume  59,   Issue  3,   1986,   Page  972-975

R. P. Vasquez,   A. Madhukar,   F. J. Grunthaner,   M. L. Naiman,  

Preview   |   PDF (402KB)

首页 上一页 下一页 尾页 第5页 共59条