51. |
Effect of Temperature and Air Humidity on the Photostimulated Exoelectron Emission from Oxide Films on Aluminum |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2393-2394
Tadeusz Lewowski,
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ISSN:0021-8979
DOI:10.1063/1.1728970
出版商:AIP
年代:1962
数据来源: AIP
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52. |
Hall Effect in Single‐Crystal TiC |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2394-2395
John Piper,
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ISSN:0021-8979
DOI:10.1063/1.1728972
出版商:AIP
年代:1962
数据来源: AIP
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53. |
A Method for Measuring the Thickness of Epitaxial Silicon Films |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2395-2396
William C. Dash,
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ISSN:0021-8979
DOI:10.1063/1.1728973
出版商:AIP
年代:1962
数据来源: AIP
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54. |
Structure in the Excess Current Region of Gallium Arsenide Tunnel Diodes |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2396-2397
R. W. Hamaker,
H. F. Quinn,
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ISSN:0021-8979
DOI:10.1063/1.1728974
出版商:AIP
年代:1962
数据来源: AIP
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55. |
Very Low Offset Hall Probe |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2397-2397
H. Roth,
W. D. Straub,
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ISSN:0021-8979
DOI:10.1063/1.1728975
出版商:AIP
年代:1962
数据来源: AIP
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56. |
A Method for the Study of Nonuniform Conservative Linear Systems |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2398-2399
M. C. Pease,
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ISSN:0021-8979
DOI:10.1063/1.1728978
出版商:AIP
年代:1962
数据来源: AIP
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57. |
Erratum: Diffusion of Au and Cu in a Temperature Gradient |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2399-2399
C. J. Meechan,
Guy W. Lehman,
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ISSN:0021-8979
DOI:10.1063/1.1728979
出版商:AIP
年代:1962
数据来源: AIP
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58. |
Erratum: Growth from the Melt. III. Dendritic Growth |
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Journal of Applied Physics,
Volume 33,
Issue 7,
1962,
Page 2400-2400
G. F. Bolling,
W. A. Tiller,
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ISSN:0021-8979
DOI:10.1063/1.1728980
出版商:AIP
年代:1962
数据来源: AIP
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