Journal of Applied Physics


ISSN: 0021-8979        年代:1983
当前卷期:Volume 54  issue 3     [ 查看所有卷期 ]

年代:1983
 
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51. Magnetic properties and growth conditions of manganese‐containing iron garnet films for magnetic bubbles
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1519-1527

D. J. Breed,   A. B. Voermans,   P. Q. J. Nederpel,   B. A. H. van Bakel,  

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52. Dielectric behavior of red HgI2under direct bias
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1528-1531

Jorge L. Regolini,   Jose´ Saura,  

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53. Dielectric breakdown of polyethylene in divergent field: Role of dissolved gases and electroluminescence
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1532-1539

C. Laurent,   C. Mayoux,   S. Noel,  

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54. Polarization reversal associated with rotation of chain molecules in &bgr;‐phase polyvinylidene fluoride
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1540-1546

T. Furukawa,   M. Date,   G. E. Johnson,  

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55. Optical and elastic properties of AgTlSe
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1547-1551

P. R. Newman,   M. D. Ewbank,   H. Kuwamoto,   P. E. D. Morgan,   E. Ehrenfreund,  

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56. Laser‐addressed liquid crystal light valve with dichroic dye added as a laser beam absorber
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1552-1558

Tetsuo Urabe,   Kunihiko Arai,   Akio Ohkoshi,  

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57. An enhanced sensitivity null ellipsometry technique for studying films on substrates: Application to silicon nitride on gallium arsenide
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1559-1569

Samuel A. Alterovitz,   George H. Bu‐Abbud,   John A. Woollam,   David C. Liu,  

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58. Drilling with NdYAG, NdYAP, and Nd glass lasers
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1570-1573

Lars Lindgren,   Sven‐Olov Roos,  

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59. Diffusion of beryllium into GaAs during liquid phase epitaxial growth ofp‐Ga0.2Al0.8As
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1574-1578

Kazuya Masu,   Makoto Konagai,   Kiyoshi Takahashi,  

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60. Model calculations for accelerated As ion doping of Si during molecular beam epitaxy
  Journal of Applied Physics,   Volume  54,   Issue  3,   1983,   Page  1579-1582

G. Bajor,   J. E. Greene,  

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