51. |
Capacitance and dielectric constant of Cd1−xMnxTe |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4803-4804
D. Peek,
C. Guerra Vela,
R. J. Sladek,
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摘要:
We have measured the electrical impedance of CdTe and Cd0.55Mn0.45Te crystals at temperatures between 82 and 104 K using frequencies between 20 kHz and 2.0 MHz. From the capacitance results we determined that the dielectric constant was only slightly smaller forx=0.45 than forx=0—a result important for the understanding of electromechanical coupling in Cd1−xMnxTe.
ISSN:0021-8979
DOI:10.1063/1.335502
出版商:AIP
年代:1985
数据来源: AIP
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52. |
Pressure and temperature dependence of the dielectric breakdown of polyethylene used in submarine power cables |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4805-4807
P. Guerin,
Hoang‐the‐Giam,
Bui Ai,
P. Destruel,
L. Deschamps,
J. Perret,
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摘要:
The dielectric strength of low‐density polyethylene is measured under high hydrostatic pressure (25–800 bars) at temperature of 20, 45, and 70 °C. First results show that the breakdown fieldEbdecreases at 20 °C and increases with pressure in the range 45–70 °C for short‐time tests. The significant variations ofEbare noted for 70 °C; for example,Eb=3.2 and 4.48 MV/cm forP=25 and 300 bars, respectively.
ISSN:0021-8979
DOI:10.1063/1.335346
出版商:AIP
年代:1985
数据来源: AIP
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53. |
Annealing effects on electron drift mobility in hydrogenated amorphous silicon |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4808-4810
Jong‐Hwan Yoon,
Choochon Lee,
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摘要:
Annealing effects on electron drift mobility are investigated using time‐of‐flight photocurrent measurements in hydrogenated amorphous silicon. It is found that at room temperature the electron drift mobility and dispersion parameters decrease as annealing temperature is increased, but mobility activation energy remains unchanged by annealing treatments. These results can be explained by the broadening of exponential band tail due to the annealing process.
ISSN:0021-8979
DOI:10.1063/1.335347
出版商:AIP
年代:1985
数据来源: AIP
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54. |
Correlation between 1/fnoise and interface state density at the Fermi level in field‐effect transistors |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4811-4813
Herman E. Maes,
Sabir H. Usmani,
Guido Groeseneken,
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摘要:
New evidence is given for the validity of the number fluctuation model in explaining the 1/fnoise behavior of field‐effect transistors and for the direct proportionality between the oxide trap density and the interface state density at the Fermi level. This evidence is obtained from the determination of the energy distribution of the interface states in small size metal‐nitride‐oxide‐silicon transistors by the modified charge pumping technique.
ISSN:0021-8979
DOI:10.1063/1.335297
出版商:AIP
年代:1985
数据来源: AIP
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55. |
Models for electron mobility and temperature of two‐dimensional electron gas at low and moderate fields |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4814-4816
H. P. Lee,
D. Vakhshoori,
Y. H. Lo,
Shyh Wang,
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摘要:
A theoretical model of electron temperature and electron mobility as a function of electric field has been formulated for GaAs/AlxGa1−xAs heterostructures. The predicted results from this model agree well with available measurements at low and moderate fields (E>200 V/cm). Furthermore, this model enables us to predict the electron temperature and mobility at high fields which are crucial to the understanding of the potential performance of GaAs/AlxGa1−xAs modulation‐doped field effect transistor and other novel heterostructures.
ISSN:0021-8979
DOI:10.1063/1.335298
出版商:AIP
年代:1985
数据来源: AIP
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56. |
Raman and photoluminescence spectra of GaAs1−xSbx |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4817-4819
R. M. Cohen,
M. J. Cherng,
R. E. Benner,
G. B. Stringfellow,
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摘要:
The first experimental Raman and photoluminescence spectra are presented for the metastable alloy GaAs1−xSbxgrown by organometallic vapor phase epitaxy throughout its miscibility gap extending fromx=0.2 tox=0.75. The phonon peak halfwidths are found to broaden by nearly a factor of 2 over halfwidths found in the binary compounds GaAs and GaSb. Phonon line shapes become more asymmetric in the miscibility gap as the selection rules break down; in addition, a second peak appears for samples grown near the center of the miscibility gap. Line shapes are analyzed and the phonon coherence length is found to be reduced from several hundred angstroms in GaAs to approximately 60 A˚ in samples grown in the miscibility gap. The compositional dependence of the room‐temperature band‐gap energy has been found to closely follow earlier predictions.
ISSN:0021-8979
DOI:10.1063/1.335299
出版商:AIP
年代:1985
数据来源: AIP
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57. |
A numerical analysis of Auger processes inp‐type GaAs |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4820-4822
W. Bardyszewski,
D. Yevick,
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摘要:
We calculate the contributions of pure collision and phonon‐assisted Auger processes within the framework of the Kane model to the nonradiative lifetime ofp‐doped GaAs. Our approach employs refined expressions for the wavefunction overlap integrals. Further, in contrast to previous treatments, our theory correctly describes the temperature dependence of the optical phonon‐assisted Auger processes. Our values for the Auger lifetimes are in good agreement with experimental results.
ISSN:0021-8979
DOI:10.1063/1.335300
出版商:AIP
年代:1985
数据来源: AIP
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58. |
Relation between barrier height and work function in contacts to selenium |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4823-4825
C. H. Champness,
A. Chan,
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摘要:
In Se–Tl, Se–Cd, Se–Au, and Se–Te contacts prepared by evaporation on a crystallized selenium layer, Schottky barrier heights were measured from junction capacitance. These were found to decrease systematically with the work function of the contacting metal. From this variation, the density of interface states was estimated to be about 1014cm−2eV−1, assuming an interfacial layer thickness of 10 A˚. The neutral level of the states was estimated to lie close to the valence band edge.
ISSN:0021-8979
DOI:10.1063/1.335301
出版商:AIP
年代:1985
数据来源: AIP
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59. |
Effects of thermal annealing on Si‐doped GaAs grown by molecular beam epitaxy |
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Journal of Applied Physics,
Volume 57,
Issue 10,
1985,
Page 4826-4827
K. Shinozaki,
M. Mannoh,
Y. Nomura,
M. Mihara,
M. Ishii,
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摘要:
Low‐temperature (∼4 K) photoluminescence has been studied on as‐grown and thermally annealed Si‐doped GaAs grown by molecular beam epitaxy. The peak intensities of the defect‐related emissions, due to the defect‐induced bound exciton (d,X) and the defect complex (d) are decreased by thermal annealing. On the other hand, Hall measurements show that free carrier concentrations are decreased only slightly by thermal annealing.
ISSN:0021-8979
DOI:10.1063/1.335302
出版商:AIP
年代:1985
数据来源: AIP
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