Journal of Applied Physics


ISSN: 0021-8979        年代:1980
当前卷期:Volume 51  issue 6     [ 查看所有卷期 ]

年代:1980
 
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61. Thermomagnetic analysis of intermetallic phases in mischmetal‐cobalt system
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3322-3327

E. M. T. Velu,   E. C. Subbarao,   N. R. Bonda,   D. K. Goel,   K. P. Gupta,   A. K. Majumdar,   T. A. Padmavathi Sankar,   J. Subramanyam,  

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62. Field‐induced magnetic anisotropy of glassy iron‐boron and iron‐boron‐silicon alloys near the eutectic composition
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3328-3329

E. A. Nesbitt,   R. Hasegawa,   R. C. O’Handley,   M. O. Sullivan,  

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63. Exchange energy near singular points or lines
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3330-3332

Amikam Aharoni,  

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64. Magnetocrystalline anisotropy in epitaxially grown (Gd,Tm,Y)3(Fe,Ga)5O12garnet thin films
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3333-3337

A. Gangulee,   R. J. Kobliska,  

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65. Photoelastic studies of three‐dimensional stress field caused by a cylindrical punch
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3338-3342

S. N. G. Chu,   J. C. M. Li,  

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66. Piezoelectric photoacoustic detection: Theory and experiment
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3343-3353

Warren Jackson,   Nabil M. Amer,  

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67. Magneto‐optic Raman scattering of Raman‐inactive phonon polaritons
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3354-3358

D. Heiman,  

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68. Optical properties of integrally colored anodic oxide films on aluminum
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3359-3361

C. G. Granqvist,  

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69. A method for increasing the etch‐rate ratio of oxides to nonoxides in inert‐gas ion milling processes
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3362-3364

U. Gerlach‐Meyer,   J. W. Coburn,   E. Kay,  

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70. X‐ray photoelectron spectroscopy and Auger electron spectroscopy studies of glow discharge Si1−xCx:H films
  Journal of Applied Physics,   Volume  51,   Issue  6,   1980,   Page  3365-3372

Wen‐Yaung Lee,  

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