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71. |
Master fabrication for optical‐data disks using reactive ion‐beam etching |
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Journal of Applied Physics,
Volume 58,
Issue 8,
1985,
Page 3255-3257
H. P. Graf,
M. A. Bo¨sch,
E. Good,
H. R. Haller,
W. Hubbard,
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摘要:
A new mastering process for optical‐data disks is described. The master disk consists of a glass substrate covered with an indium‐oxide film. Reactive ion‐beam etching with CCl4is used to selectively etch the information pits into the indium‐oxide layer. Pits with tapered walls are obtained by controlled erosion of the etch mask. This technique allows a better control of the pit shape than the conventional mastering process. Moreover, several metal copies can be made from the same master while conventional masters are destroyed after the first copy is made.
ISSN:0021-8979
DOI:10.1063/1.335783
出版商:AIP
年代:1985
数据来源: AIP
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72. |
PtSi contact metallurgy: Effect of silicide formation process |
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Journal of Applied Physics,
Volume 58,
Issue 8,
1985,
Page 3258-3261
Chin‐An Chang,
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摘要:
PtSi films have been formed by different formation processes using sputtered Pt. Two annealing sequences are compared: a single‐temperature annealing at 550 °C and a three‐temperature annealing at 200–300–550 °C; and three annealing gases are compared: forming gas, nitrogen, and oxygen. Silicide films formed using the single‐temperature process all show incomplete reaction between Pt and Si, leaving a protective surface oxide layer of poor quality, which extends rather deeply into the PtSi film and is completely etched off byaquaregia. The silicide films formed by the three‐temperature process in forming gas, however, show a complete reaction between Pt and Si, and a thin surface oxide layer with excellent protection of the PtSi layer from the subsequentaquaregiaetching often needed for device fabrication.
ISSN:0021-8979
DOI:10.1063/1.335784
出版商:AIP
年代:1985
数据来源: AIP
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73. |
Improvements of electrical and optical properties of InAlAs grown by molecular beam epitaxy |
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Journal of Applied Physics,
Volume 58,
Issue 8,
1985,
Page 3262-3264
Yuichi Kawamura,
Kiichi Nakashima,
Hajime Asahi,
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摘要:
Great improvement in the electrical and optical properties of molecular‐beam‐epitaxy‐grown InAlAs was obtained by using InP buffer layers and high substrate temperatures of 555 °C. Undoped InAlAs layers arentype and the highest room temperature electron mobility is as high as 5100 cm2/V s with a carrier concentration of 1×1015cm−3. The room‐temperature photoluminescence spectrum has a sharp edge emission with a spectral half‐width as narrow as 42 meV.
ISSN:0021-8979
DOI:10.1063/1.335785
出版商:AIP
年代:1985
数据来源: AIP
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74. |
Lamb‐wave electroacoustic voltage sensor |
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Journal of Applied Physics,
Volume 58,
Issue 8,
1985,
Page 3265-3267
A. Palma,
L. Palmieri,
G. Socino,
E. Verona,
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摘要:
The effect of a bias electric field on the phase velocity of Lamb waves propagating in a piezoelectric plate has been investigated in order to develop an electroacoustic voltage sensor. Experiments were performed onYXandYZLiNbO3Lamb‐wave delay lines, used as the stabilizing element in the feedback loop of an oscillator, by measuring the fractional frequency change produced by a bias electric field normal to the plate surfaces. The results obtained have shown that Lamb‐wave sensors can exhibit a higher sensitivity and a better linearity than the corresponding Rayleigh‐wave devices.
ISSN:0021-8979
DOI:10.1063/1.335786
出版商:AIP
年代:1985
数据来源: AIP
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